Surface analysis Rutherford backscatter spectroscopy

Rutherford Backscattering Spectroscopy (RBS) is an established technique for analysis of inorganic materials. Recently, several applications of RBS on polymer films have been reported however, the effect of ion beams on these surfaces has not been well documented. RBS has been used to determine fluorine distribution in polymers. Since ion beam irradiation of polymers can induce chemical changes, instrumental parameters need to be optimized to minimize damage. 

SIMS Is more sensitive than the other common surface or Interface analysis techniques of Auger X-ray Photoelectron Spectroscopy Rutherford BackscatterIng Spectroscopy or Energy Dispersive X-ray Analysis. Detection limits and background signal levels for a large number of semiconductor materials have been reported under typical operating conditions (Ji). Table I lists the detection limits for a number of dopants used In semiconductors obtained under optimized conditions. 

Quantitative analysis by XPS of the first-row transition metal nitrides ScN(OOl), TiN(OOl), VN(OOl), and CrN(OOl) grown and analyzed in situ is shown in Table 3.4 [12-15, 24—27]. The data show compositions of these films to be quite similar to bulk compositions measured by Rutherford backscattering spectroscopy (RBS). Because XPS is an extremely surface sensitive technique, analyzing as little as the top 10 nm of a sample, the composition of the surface is in most cases altered by exposure to air demonstrating an advantage of being able to do in situ growth/ analysis. This will be discussed in more detail in Sect. 3.14. 

Ions Ion-induced X-ray spectroscopy (IIX) Proton-induced X-ray spectroscopy (PIX) Surface composition by analysis of neutral species and ion-impact radiation (SCANIIR) Glow-discharge optical spectroscopy (GDOS) Ion-neutralization spectroscopy (INS) Ion-induced Auger electron spectroscopy (lAES) Secondary-ion mass spectrometry (SIMS) Ion-scattering spectroscopy (ISS) Rutherford backscatter spectroscopy (RBS)... 

Within the last 5—10 years PIXE, using protons and helium ions, has matured into a well-developed analysis technique with a variety of modes of operation. PIXE can provide quantitative, nondestructive, and fast analysis of essentially all elements. It is an ideal complement to other techniques (e.g., Rutherford backscattering) that are based on the spectroscopy of particles emitted during the interaction of MeV ion beams with the surface regions of materials, because... 

Surface analytical methods — Important ex situ methods for surface analysis are X-Ray Photoelectron Spectroscopy (XPS) UV-Photoelectron Spectroscopy (UPS), Auger Electron Spectroscopy (AES), Ion Scattering Spectroscopy (ISS), Rutherford Backscattering (RBS), Secondary Ion Mass Spectroscopy (SIMS), Scanning Electron Microscopy (SEM), Electron Microprobe Analysis (EMA), Low Energy Electron Diffraction (LEED), and High Energy Electron Diffraction (RHEED). 

L.C. Feldman. Rutherford Backscattering and Nuclear Reaction Analysis. In A.W. Czandema and D.M. Hercules, editors. Ion Spectroscopies for Surface Analysis. Methods of Surface Characterization, Volume 2. Plenum Press, New York, 1991. 

One type of method is an energy analysis of electrons emitted from the surface with Auger-electron-spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), and ultraviolet photoelectron spectroscopy (UPS). A second way is to sputter the surface and analyze the emitted particles by mass spectroscopy. This method is called secondary ion mass spectroscopy (SIMS). A third method is based on the scattering of He ions from the surface and the analysis of the scattering parameters (Rutherford backscattering). 

In-depth analysis of implanted samples has been carried out by RBS (Rutherford backscattering) and SIMS (secondary ion mass spectroscopy). The RBS experiment on (CH) was used by Davenas et al. (54J for the determination of oxygen concentration. Samples implanted with iodine ions ( = lOOkeV.D = 5 x I0 ions/cm") would seem to be less sensitive to oxidation from the air than virgin samples. Two oxidation steps would arise the first step would concern the surface (during the first 4 h of exposure to the air), the other the volume (and would come from redistribution of oxygen atoms, which... 

Depth profiling (characterization) The determination of elemental composition as a function of distance from the surface. The analysis may be destructive (Example sputter profiling using auger electron spectroscopy (AES)) or non-destructive (Example profiling using Rutherford backscattering spectrometry (RBS)). 

Various methods of analyzing surfaces for chanical composition and physical texture. Electron spectroscopy for chemical analysis and Auger analysis [19] are techniqnes that have been used to identily chemical species in thin films. In Rutherford backscattering spectrometry incident He ions are scattered elastically by nuclei. The energy spectrum thus obtained can... 

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