Electron surface analysis

With the exception of the scanning probe microscopies, most surface analysis teclmiques involve scattering of one type or another, as illustrated in figure A1.7.11. A particle is incident onto a surface, and its interaction with the surface either causes a change to the particles energy and/or trajectory, or the interaction induces the emission of a secondary particle(s). The particles that interact with the surface can be electrons, ions, photons or even heat. An analysis of the mass, energy and/or trajectory of the emitted particles, or the dependence of the emitted particle yield on a property of the incident particles, is used to infer infomiation about the surface. Although these probes are indirect, they do provide reliable infomiation about the surface composition and structure. 

Energetic particles interacting can also modify the structure and/or stimulate chemical processes on a surface. Absorbed particles excite electronic and/or vibrational (phonon) states in the near-surface region. Some surface scientists investigate the fiindamental details of particle-surface interactions, while others are concerned about monitormg the changes to the surface induced by such interactions. Because of the importance of these interactions, the physics involved in both surface analysis and surface modification are discussed in this section. 

Photoelectron spectroscopy provides a direct measure of the filled density of states of a solid. The kinetic energy distribution of the electrons that are emitted via the photoelectric effect when a sample is exposed to a monocluomatic ultraviolet (UV) or x-ray beam yields a photoelectron spectrum. Photoelectron spectroscopy not only provides the atomic composition, but also infonnation conceming the chemical enviromnent of the atoms in the near-surface region. Thus, it is probably the most popular and usefiil surface analysis teclmique. There are a number of fonus of photoelectron spectroscopy in conuuon use. 

Analysis of Surface Elemental Composition. A very important class of surface analysis methods derives from the desire to understand what elements reside at the surface or in the near-surface region of a material. The most common techniques used for deterrnination of elemental composition are the electron spectroscopies in which electrons or x-rays are used to stimulate either electron or x-ray emission from the atoms in the surface (or near-surface region) of the sample. These electrons or x-rays are emitted with energies characteristic of the energy levels of the atoms from which they came, and therefore, contain elemental information about the surface. Only the most important electron spectroscopies will be discussed here, although an array of techniques based on either the excitation of surfaces with or the collection of electrons from the surface have been developed for the elucidation of specific information about surfaces and interfaces. 

Electron Microprobe A.na.Iysis, Electron microprobe analysis (ema) is a technique based on x-ray fluorescence from atoms in the near-surface region of a material stimulated by a focused beam of high energy electrons (7—9,30). Essentially, this method is based on electron-induced x-ray emission as opposed to x-ray-induced x-ray emission, which forms the basis of conventional x-ray fluorescence (xrf) spectroscopy (31). The microprobe form of this x-ray fluorescence spectroscopy was first developed by Castaing in 1951 (32), and today is a mature technique. Primary beam electrons with energies of 10—30 keV are used and sample the material to a depth on the order of 1 pm. X-rays from all elements with the exception of H, He, and Li can be detected. 

In Surface Analysis by Laser Ionization (SALI), a probe beam such as an ion beam, electron beam, or laser is directed onto a surfiice to remove a sample of material. An untuned, high-intensity laser beam passes parallel and close to but above the sur-fiice. The laser has sufficient intensity to induce a high degree of nonresonant, and hence nonselective, photoionization of the vaporized sample of material within the laser beam. The nonselectively ionized sample is then subjected to mass spectral analysis to determine the nature of the unknown species. SALI spectra accurately reflect the surface composition, and the use of time-of-flight mass spectrometers provides fast, efficient and extremely sensitive analysis. 

For a review of how defects manifest themselves in a LEED experiment, see M. Henzler. In Electron Spectroscopy for Surface Analysis. (H. I. Ibach, ed.) Springer, Berlin, 1977. 

In other articles in this section, a method of analysis is described called Secondary Ion Mass Spectrometry (SIMS), in which material is sputtered from a surface using an ion beam and the minor components that are ejected as positive or negative ions are analyzed by a mass spectrometer. Over the past few years, methods that post-ion-ize the major neutral components ejected from surfaces under ion-beam or laser bombardment have been introduced because of the improved quantitative aspects obtainable by analyzing the major ejected channel. These techniques include SALI, Sputter-Initiated Resonance Ionization Spectroscopy (SIRIS), and Sputtered Neutral Mass Spectrometry (SNMS) or electron-gas post-ionization. Post-ionization techniques for surface analysis have received widespread interest because of their increased sensitivity, compared to more traditional surface analysis techniques, such as X-Ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES), and their more reliable quantitation, compared to SIMS. 

J. P. Watts An Introduetion to Surface Analysis by Electron Spectroscopy, Oxford University Press, Oxford 1990. 

Surface analysis has made enormous contributions to the field of adhesion science. It enabled investigators to probe fundamental aspects of adhesion such as the composition of anodic oxides on metals, the surface composition of polymers that have been pretreated by etching, the nature of reactions occurring at the interface between a primer and a substrate or between a primer and an adhesive, and the orientation of molecules adsorbed onto substrates. Surface analysis has also enabled adhesion scientists to determine the mechanisms responsible for failure of adhesive bonds, especially after exposure to aggressive environments. The objective of this chapter is to review the principals of surface analysis techniques including attenuated total reflection (ATR) and reflection-absorption (RAIR) infrared spectroscopy. X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and secondary ion mass spectrometry (SIMS) and to present examples of the application of each technique to important problems in adhesion science. 

The interface properties can usually be independently measured by a number of spectroscopic and surface analysis techniques such as secondary ion mass spectroscopy (SIMS), X-ray photoelectron spectroscopy (XPS), specular neutron reflection (SNR), forward recoil spectroscopy (FRES), scanning electron microscopy (SEM) and transmission electron microscopy (TEM), infrared (IR) and several other methods. Theoretical and computer simulation methods can also be used to evaluate H t). Thus, we assume for each interface that we have the ability to measure H t) at different times and that the function is well defined in terms of microscopic properties. 

The most widely used techniques for surface analysis are Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), secondary ion mass spectroscopy (SIMS), Raman and infrared spectroscopy, and contact angle measurement. Some of these techniques have the ability to determine the composition of the outermost atomic layers, although each technique possesses its own special advantages and disadvantages. 

Other techniques utilize various types of radiation for the investigation of polymer surfaces (Fig. 2). X-ray photoelectron spectroscopy (XPS) has been known in surface analysis for approximately 23 years and is widely applied for the analysis of the chemical composition of polymer surfaces. It is more commonly referred to as electron spectroscopy for chemical analysis (ESCA) [22]. It is a very widespread technique for surface analysis since a wide range of information can be obtained. The surface is exposed to monochromatic X-rays from e.g. a rotating anode generator or a synchrotron source and the energy spectrum of electrons emitted... 

Further structural information is available from physical methods of surface analysis such as scanning electron microscopy (SEM), X-ray photoelectron or Auger electron spectroscopy (XPS), or secondary-ion mass spectrometry (SIMS), and transmission or reflectance IR and UV/VIS spectroscopy. The application of both electroanalytical and surface spectroscopic methods has been thoroughly reviewed and appropriate methods are given in most of the references of this chapter. 

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