Resin Resistivity

The most successful of these products contain high ratios of VP to DMAEMA and are partially quatemized with diethyl sulfate (Polyquaternium 11) (142—144). They afford very hard, clear, lustrous, nonflaking films on the hair that are easily removed by shampooing. More recendy, copolymers with methyl vinyl imidazoliiim chloride (Polyquaternium 16) (145) or MAPTAC (methacrylamidopropyltrimethyl ammonium chloride) (Polyquaternium 28) have been introduced. Replacement of the ester group in DMAEMA with an amide analog as in Polyquaternium 28 results in a resin resistant to alkaline hydrolysis and hence greater utility in alkaline permanent-wave and bleach formulations (see Quaternary ammonium compounds). 

Glass-reinforced polyester is the most widely used reinforced-resin system. A wide choice of polyester resins is available. The bisphenol resins resist strong acids as well as alkahne solutions. The size range is 2 through 12 in the temperature range is shown in Table 10-17. Diameters are not standardized. Adhesive-cemented socket joints and hand-lay-up reinforced butt joints are used. For the latter, reinforcement consists of layers of glass cloth saturated with adhesive cement. 

Harz-reserve,/. (Calico) resin resist. -r3hre,/. resin duct, -saft, m. resinous j uice. -aalbe, /. (Pharm.) rosin cerate, -salz, n. resinate. harzsauer, a. of or combined with a resinic acid, resinate of. 

Wachsglanz, m. waxy luster, wachsglknzend, a. of waxy luster. Wachs-handel, m. wax trade, -harzreserve, /. wax-resin resist, -kerzchen, n. wax match, -kerze,/. wax candle, -kitt, m. wax cement ... 

Good quality steel is used and electrozinc is preferred for washing machines. Steel is pretreated with iron phosphate for economy electrozinc with a fine crystal zinc phosphate. No primer is normally used 25-40/im of finish is applied direct to metal. The required properties are best obtained with a thermosetting acrylic or polyester/melamine-formaldehyde finish. Self-reactive acrylics are usually preferred these resins contain about 15 Vo 7V-butoxymethyl acrylamide (CH2=CH —CO —NH —CHj—O —C4H,) monomer and cure in a manner similar to butylated melamine-formaldehyde resins. Resistance or anti-corrosive properties may be upgraded by the inclusion of small amounts of epoxy resin. Application is usually by electrostatic spray application from disc or bell. Shapes are complex enough to require convected hot-air curing. Schedules of 20 min at 150-175°C are... 

Figure 2 shows the exposure characteristics for azide-styrene resin resist film with an azide concentration from 10 to 40 wt% (based on the styrene resin weight) and Figure 3 shows the contrast of the resist films as a function of the azide concentration. Development was done with a 60s immersion in 0.83% TMAH solution. The styrene resin matrix alone has been found to be a negative deep UV resist. However, rather low contrast (1.48) and low sensitivity (2.5 J/cm2) are observed. The contrast and the sensitivity of the styrene resin is remarkedly increased by adding the azide, as shown in Figures 2 and 3. 

When the concentration of the azide exceeds 30 wt%, sensitivity decreases (Figure 2) and the contrast becomes worse (Figure 3). This is due to the increase of the optical density of the resist. Large optical density prevents the light from penetrating into the resist (3,11). Also, the resist thickness remainig after development is maximum at the 30 wt% azide concentration (Figure 2). From these results, it was concluded that the azide-styrene resin resist which contains 30 wt%... 

Figure 2. Effect of azide concentration on exposure characteristics for azide-styrene resin resist of 1.0 micron film thickness.

Acid generation in photoresist films add photogeneration vs. dose, 3233/ acid present after irradiation, 32,34r add present before irradiation, 32 quantum yield, 3234 Acid hardening resin resists cross-linking adivation energy determination, 87,89 cross-linking chemistry, 87 determination of acid generated, 87-88 effect of postexposure bake temperature and time, 87... 

The thermal stability of these materials was examined by thermogravimetric analysis (TGA) and IR spectroscopy. As anticipated from their structures, the thermal properties of these polymers are far superior to those found in a typical diazoketone/phenolic resin resist. TGA (in air) of the material depicted in Scheme II shows that the polymer does not change in weight up to a temperature of 300°C. 

Products made from FEP resins resist the effects of weather, extreme heat, and UV radiation. This subject is covered in more detail in Chapter 7. 

Polyester and Vinyl Ester Mortars These two mortars, of which there are many types, are suitable for a pH range of about 0-11 and a continuous service temperature of 225°-230°F. The two related resins, which complement the epoxy resins, resist dilute and concentrated acids and weak alkalies. Their resistance to acid bleaches such as chlorine dioxide and to oxidizing acids such as nitric and chromic is superior to that of other resinous mortars, and they are excellent in acetic acid and related esters. However, polyester and vinyl ester mortars are the poorest resin mortars in other organic chemical exposures including solvents in general. Such mortars are widely used in paper mills and are suitable with acid brick or ceramic tile in the lower temperature zones of mildly acidic utility FGD systems. 

Dry Etch Resistance. Polyvinylnaphthalene and its derivatives were reported to be highly resistant to dry etching ( 9 ). Under Ar ion milling or CCl sputter etching conditions, etch rates for poly(2-vinylnaphthalene) were found to be about two-thirds of those for polystyrene or novolak resin resists. To find relationships between etch resistance and chemical structure, etch rate measurements for various metal-free polymers were made under Ar or C>2 ion beam incidence. It was found that the etch rate under ion bombardment depends linearly on N/(Nc -N0), where N denotes the total number of atoms in a monomer unit, Nc and N0 are the number of carbon atoms and the number of oxygen atoms in a monomer unit, respectively ( ). The dependence on "N/(NC-N0) factor" indicates that... 

Reiser, Photoactive Polymers The Science and Technology of Resists, pp. 38 39, John Wiley Sons, Hoboken, NJ (1989) N.J. Turro, Modern Molecular Photochemistry, Benjamin Cummings, Menlo Park, CA (1978) S. Nonogaki, M. Hashimoto, T. Iwayanagi, and H. Shiraishi, Azide pheno lie resin resists sensitive to visible light, Proc. SPIE 539, 189 (1985) M. Hashimoto, T. Iwayanagi, H. Shiraishi, and S. Nonogaki, Photochemistry of azide phenolic resin photoresists, presented at Tech. Pap., Photopolym. Conf. SPE, Ellenville, NY, Oct. 1985. 

Phthalic laminating Isophthalic corrosion-resin resistant resin... 

Resistance to Oil and Organic Solvents EVAL resins resist oils and organic solvents, making them particularly suitable for packaging oily foods, edible oils, mineral oils, agricultural pesticides, and organic solvents.bi fi... 

Chem. Descrip. n-Butyl acrylate polymer Uses Plasticizer for coatings raw materials and compounding plastics Features Soft, tacky resin resist, to light, aging, saponification solv.-free high vise. 

Polystyrylpyridine (PSP) n. A thermosetting resin, resistant to high temperatures, formed by condensation of 2,4,6-tri-methylpyridine and 1,4-benzyldialdehyde, and a useful matrix for carbon-fiber composites. 

There are eight other thixotropic resins resistant to less aggressive chemicals within this series, with variations from the above as follo ws. Gel times are typical relative to resin activity, accelerator and catalyst as applicable - see manufacturer s datasheets. Some HDT s (I) may be slightly lower than shown, c in all cases is 1100-1300. 

Phenolic Phenol formaldehyde resin resistance Good chemical resistance Tendency for... 

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