Photoactive polymer

A novel type of grafting process was developed using a new photosensitive polymer containing vanadium (V) chelates. These polymers were generally synthesized by the condensation of a VOQ2OH complex and a hydroxy-containing polymer to produce photoactive polymer (red in color) with pendant vanadium (V) chelate. 

A similar type of condensation between a hydroxyl-containing polymer (such as secondary cellulose acetate) with VO(BrC6H4N=CHO CfiH4)2 CUVOL2CI] produces photoactive polymers [68]. When irradiated with UV light in the presence of styrene or MMA, grafted and crosslinked polymers were obtained ... 

The optical and electrochemical properties of porphyrins make these chromophores useful building blocks for the synthesis of electro- and photoactive polymers. Two types of linear polymers have been constructed using the self-assembly approach homo-polymeric assemblies and hetero- or shish kebab polymers. 

Coumarin groups are commonly incorporated into photoactive polymers because of their favorable photochemical characteristics and the ease of integration into the polymer matrix. The addition of the appropriate coumarin moiety into the monomers themselves or as an additive in the polymerization process can result in the polymeric product possessing beneficial visible and ultraviolet light absorption properties. 

S. Richard Turner received his Ph.D. in organic-polymer chemistry from the University of Florida in 1971 and did a year of postdoctoral work at the Institute of Macromolecular Chemistry in Darmstadt, Federal Republic of Germany. Before joining the Kodak Research Laboratories in 1980, he worked in the Xerox Research Laboratories in Webster, New York, and the Exxon Corporate Research Laboratories in Linden, New Jersey. He is currently a Research Associate in the Polymer Science Laboratories at Kodak. His research interests include synthesis and properties of photoactive polymers, ion-containing polymers, and water-soluble polymers. He has over 80 publications and patents in these areas. He is a member of the executive committee of the Division of Polymeric Materials Science and Engineering of the American Chemical Society, where he currently serves as Program Chairman. 

Canada Research Chair on Electroactive and Photoactive Polymers,... 

Rahman GMA, Guldi DM, Cagnoli R, Mucci A, Schenetti L, Vaccari L, Prato M (2005) Combining single-wall carbon nanotubes and photoactive polymers for photoconversion. J Am Chem Soc 127 10051... 

Cao T, Yin W, Webber SE. Poly(2-vinylnaphthalene-alt-maleic acid)-graft-polystyrene as a photoactive polymer micelle and stabilizer for polystyrene latexes. Macromolecules 1994 27 7459-7464. 

All three of these issues can be addressed, to some extent, by understanding and improving the optical, electronic, and stability properties of the photoactive polymer layer in OPV devices. 

Recently, several photoactive polymers have been examined that fit these criteria. They include JV-polyvinylcarbazole (PVK) [101,102], (phenyl-methyljpolysilane (PMPS) [103], and amine-doped polycarbonate [104], All are known hole-transporting polymers. A large number of semiconductor nanoclusters can be doped into these polymers and interact with the polymer and facilitate carrier injection into the polymer [101-104]. Dramatic enhancement in charge generation efficiency has been observed. The availability of these semiconductor nanocluster/polymer composites opens the doorway for exploring transport-related applications. In the following sections, I review their photoconductive properties and discuss possibilities in other related areas. 

Reiser, Photoactive Polymers The Science and Technology of Resists, p. 24, John Wiley Sons, Hoboken, NJ (1989). 

Biltz and J. Eggert, The spectral sensitivity of photographic layers, Trans. Faraday Society, 34, 892 901 908 912 (1928) [cited in A. Reiser, Photoactive Polymers The Science and Technol ogy of Resists, p. 24, John Wiley Sons, Hoboken, NJ (1989)]. 

Reiser, Photoactive Polymers The Science and Technology of Resists, pp. 38 39, John Wiley Sons, Hoboken, NJ (1989) N.J. Turro, Modern Molecular Photochemistry, Benjamin Cummings, Menlo Park, CA (1978) S. Nonogaki, M. Hashimoto, T. Iwayanagi, and H. Shiraishi, Azide pheno lie resin resists sensitive to visible light, Proc. SPIE 539, 189 (1985) M. Hashimoto, T. Iwayanagi, H. Shiraishi, and S. Nonogaki, Photochemistry of azide phenolic resin photoresists, presented at Tech. Pap., Photopolym. Conf. SPE, Ellenville, NY, Oct. 1985. 

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