Laser deposition, pulsed

Matsubara et al. [126] used oxygen radical-assisted PLD to grow highly transparent and low-resistivity Al-doped ZnO films at room temperature. A KrF excimer laser (X = 248 nm, 30 ns pulse width, 10 Hz repetition rate) was used for ablation. The oxygen partial pressure during deposition was 0.7-1.4 x 10 Torr, and the applied RF power was 150W. The distance between the target and the substrate was approximately 6 cm. The minimum resistivity of the obtained transparent films was 

Pressure is often quoted in the non-SI units of torr, 1 torr being equivalent to 1 mmHg. The SI unit for pressure is the pascal. Pa. One Pa is equal to one newton per square meter (N/m ). To convert between torr and Pa, simply multiply the pressure in torr by 133.3 to obtain the pressure in Pa (750torr = 10 Pa). 

Fxcimer lasers operating in the UV are the laser of choice for most PLD systems. The operating wavelengths used in commercial systems are shown in Table 28.6. Pulse energies up to 500mJ are used with repetition rates up to several hundred hertz. 

Pulsed-laser deposition offers several advantages over other PVD methods  

Growth of films having complex stoichiometry can be achieved. 

The irradiation source is outside the deposition chamber allowing flexibility. Multiple chambers can 

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DEC coating was first prepared by Aisenberg and Chabot using ion beam deposition in 1971 [2]. At present, PVD, such as ion beam deposition, sputtering deposition, cathodic vacuum arc deposition, pulsed laser deposition, and CVD, like plasma enhanced chemical vapor deposition are the most popular methods to be selected to fabricate DEC coatings. 

Voevodin, A. A., Phelps, A. W., Zabinski, J. S., and Donley, M. S., Friction Induced Phase Transformation of Pulsed Laser Deposited Diamond-like Carbon, Diamond Relat. Mater, Vol. 5,1996, pp. 1264-1269. 

Ramsey, M. E., Poindexter, E., Pelt, J. S., Marin, J., and Durbin, S. M., Hydrophobic CNx Thin Film Growth by Inductively-coupled RF Plasma Enhanced Pulsed Laser Deposition, Thin Solid Films, Vol. 360, No. 1-2,2000, pp. 82-88. 

Schubert J, Schdning MJ, Schmidt C, Siegert M, Mesters St, Zander W, Kordos P, Liith H, Legin A, Mourzina YG, Seleznev B, Vlasov YG (1999) Chalcogenide-based thin film sensors prepared by pulsed laser deposition technique. Appl Phys A Mater Sci Process 69 803-805... 

The approaches used for preparation of inorganic nanomaterials can be divided into two broad categories solution-phase colloidal synthesis and gas-phase synthesis. Metal and semiconductor nanoparticles are usually synthesized via solution-phase colloidal techniques,4,913 whereas high-temperature gas-phase processes like chemical vapor deposition (CVD), pulsed laser deposition (PLD), and vapor transfer are widely used for synthesis of high-quality semiconductor nanowires and carbon nanotubes.6,7 Such division reflects only the current research bias, as promising routes to metallic nanoparticles are also available based on vapor condensation14 and colloidal syntheses of high-quality semiconductor nanowires.15... 

Anode-supported SOFCs with LSGM electrolytes (5-fJ.m thick) and SDC interlayers (2-fim thick) were fabricated by pulsed laser deposition [243],... 

Koep E, Jin C, Haluska M, Das R, Narayan R, Sandhage K et al. Microstructure and electrochemical properties of cathode materials for SOFCs prepared via pulsed laser deposition. J. Power Sources 2006 161 250-255. 

Yang D, Zhang X, Nikumb S, Deces-Petit C, Hui R, Marie R et al. Low temperature solid oxide fuel cells with pulsed laser deposited bi-layer electrolyte. J. Power Sources 2007 164 182-188. 

H.S. Kwok, X.W. Sun, and D.H. Kim, Pulsed laser deposited crystalline ultrathin indium tin oxide films and their conduction mechanisms, Thin Solid Films, 335 299-302, 1998. 

NMR OU PEO Ph PFD PO Q rpm RT SAPO SBA SBU SDA Nuclear magnetic resonance Osaka University Polyethylene oxide Phenyl Pulsed laser deposition Propylene oxide Quinuclidene Revolutions per minute Room temperature Silicoaluminum phosphate Santa Barbara Secondary building unit Structure directing agent... 

Pulsed field gel electrophoresis, 9 746 Pulsed flashlamps, 14 619 Pulsed laser deposition chamber, 24 739 Pulsed laser deposition (PLD), 24 738-743 advancement of, 24 739 as an alternative deposition technique, 24 742-743... 

Cunningham, N., Irissou, E., Lefevre, M., Denis, M. C., Guay, D., and Dodelet, J. P. PEMFC anode with very low Pt loadings using pulsed laser deposition. Electrochemical and Solid-State Letters 2003 6 A125-A128. 

The pulsed laser deposition (PLD) technique is widely used for inorganic materials but is beconting increasingly employed for the preparation of thin films of polymers... 

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