Pulsed-laser deposition technique

Schubert J, Schdning MJ, Schmidt C, Siegert M, Mesters St, Zander W, Kordos P, Liith H, Legin A, Mourzina YG, Seleznev B, Vlasov YG (1999) Chalcogenide-based thin film sensors prepared by pulsed laser deposition technique. Appl Phys A Mater Sci Process 69 803-805... 

Electrodeposition or pulsed-laser deposition techniques are additional possibilities for forming thin mesostructured films. These techniques have mainly been applied to non-silica mesostructured films such as niobia or platinum, but also hexagonally oriented mesoporous silica films were prepared by pulsed-laser deposition. ... 

Greer JA, Tabat MD (1995) Large-Area Pulsed Laser Deposition Technique and Application. J. vac. sd. technol. A13 1175-1181. 

Orgiani, P., Ciancio, R., Galdi, A., Amoruso, S., and Maritato, L. (2010) Physical properties of Lao.yBao.sMnOs- complex oxide thin films grown by pulsed laser deposition technique. AppL Phys. Lett., 96, 032501. 

Schou, J. (2009) Physical aspects of the pulsed laser deposition technique the stoichiometric transfer of material from target to film. Appl. Surf. Set, 255, 5191-5198. 

Musgraves J. D., Carlie N., Hu J., Petit L., Agarwal A., Kimerling L. C., and Richardson K. A., Comparison of the optical, thermal and structural properties of Ge-Sb-S thin films deposited using thermal evaporation and pulsed laser deposition techniques, Acta Mater., 59, 5032-5039 (2011). 

The approaches used for preparation of inorganic nanomaterials can be divided into two broad categories solution-phase colloidal synthesis and gas-phase synthesis. Metal and semiconductor nanoparticles are usually synthesized via solution-phase colloidal techniques,4,913 whereas high-temperature gas-phase processes like chemical vapor deposition (CVD), pulsed laser deposition (PLD), and vapor transfer are widely used for synthesis of high-quality semiconductor nanowires and carbon nanotubes.6,7 Such division reflects only the current research bias, as promising routes to metallic nanoparticles are also available based on vapor condensation14 and colloidal syntheses of high-quality semiconductor nanowires.15... 

Pulsed field gel electrophoresis, 9 746 Pulsed flashlamps, 14 619 Pulsed laser deposition chamber, 24 739 Pulsed laser deposition (PLD), 24 738-743 advancement of, 24 739 as an alternative deposition technique, 24 742-743... 

Figure 6.17. Scheme, according to Roman etal. (1997), of the deposition of nano-laminate coatings via the pulsed laser ablation technique. 1 Vacuum, chamber, 2 Ti-6A1-4V substrate holder and heater, 3 deposit (nanometer range), 4 laser-induced plasma, 5 target (TiB2/TiN),... 

The pulsed laser deposition (PLD) technique is widely used for inorganic materials but is beconting increasingly employed for the preparation of thin films of polymers... 

Other coating processes involving fluoridated apatite have been investigated to improve the long-term adhesion and promote osteointegration of cementless titanium-based metal implants pulsed laser deposition, electron beam deposition and ion beam sputter deposition techniques, and sol-gel methods, for example. They lead to fluor-containing calcium phosphates (apatites in most cases) with different compositions and crystallinity states. 

LAPS was introduced by Sato et al. [155]. The detection of heavy metal ions by thin films of chalcogenide-glass membranes using the pulsed laser deposition method (PLD) was reported by Mourzina et al. [156]. The PLD technique was also introduced to evaporate A1203 as a pH-sensitive material for LAPS devices [157]. The first practical application of the above-described LAPS card was demonstrated by Kloock et al. for a comparative study of Cd-sensitive chalcogenide glasses for ISFETs, LAPS and pISEs (ion-selective electrodes) [158]. 

M.J. Schoning, Y.G. Mourzina, J. Schubert, W. Zander, A. Legin, Y.G. Vlasov and H. Luth, Can pulsed laser deposition serve as an advanced technique in fabricating chemical sensors , Sens. Actuators B Chem., 78(1-3)(2001) 273-278. 

The preparation of c-axis aligned or even epitaxial RNi2B2C thin films has been performed using both, pulsed laser deposition (PLD Cimberle et al., 1997 Hase et al., 1997) and magnetron sputtering technique (Arisawa et al., 1994 Andreone... 

RE-TM-based films. - The deposition techniques (sputtering or PLD - pulsed laser deposition) have been used successfully to prepare SmCo5 and Nd2Fel4B nanoparticles [38, 39]. After room temperature deposition, the nanoparticles are amorphous. The desired crystal structure and magnetic properties are obtained through application of a post-deposition annealing treatment. Due to the high reactivity of the materials, this constitutes a non trivial task. 

ZnO thin films can be prepared by a variety of techniques such as magnetron sputtering, chemical vapor deposition, pulsed-laser deposition, molecular beam epitaxy, spray-pyrolysis, and (electro-)chemical deposition [24,74]. In this book, sputtering (Chap. 5), chemical vapor deposition (Chap. 6), and pulsed-laser deposition (Chap. 7) are described in detail, since these methods lead to the best ZnO films concerning high conductivity and transparency. The first two methods allow also large area depositions making them the industrially most advanced deposition techniques for ZnO. ZnO films easily crystallize, which is different for instance compared with ITO films that can... 

Process techniques such as filtered arc [124-126] deposition, or pulsed laser deposition [79,127-130] generate outstanding film properties for a variety of TCO materials. The main feature is that the film formation is achieved with ions instead of using mostly neutral atoms. The state of the art is the pulsed laser deposition of ZnO Al films, where resistivity of 85 pQ cm has been reported at a substrate temperature of 230°C [79]. This result can be attributed to the high doping efficiency because of the suppression of AI2O3 formation when ionized species are used for film formation. 

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