Processing methods pulsed-laser deposition

Other coating processes involving fluoridated apatite have been investigated to improve the long-term adhesion and promote osteointegration of cementless titanium-based metal implants pulsed laser deposition, electron beam deposition and ion beam sputter deposition techniques, and sol-gel methods, for example. They lead to fluor-containing calcium phosphates (apatites in most cases) with different compositions and crystallinity states. 

For their rich potential in various applications described in the previous section, the synthesis and assembly of various ZnO micro and nanostructures have been extensively explored using both gas-phase and solution-based approaches. The most commonly used gas-phase growth approaches for synthesizing ZnO structures at the nanometer and micrometer scale include physical vapor deposition (40, 41), pulsed laser deposition (42), chemical vapor deposition (43), metal-organic chemical vapor deposition (44), vapor-liquid-solid epitaxial mechanisms (24, 28, 29, 45), and epitaxial electrodeposition (46). In solution-based synthesis approaches, growth methods such as hydrothermal decomposition processes (47, 48) and homogeneous precipitation of ZnO in aqueous solutions (49-51) were pursued. 

Many techniques have been developed for the synthesis of nanoparticles, such as solid-state reactions [5-14], molten salt synthesis [15-21], hydrothermal methods [22-29], sol-gel processing [30-36], co-precipitation [37-46], thermal evaporation [47-50], plasma methods [51-54], chemical vapor deposition [55-60], pulsed laser deposition [61-66], and magnetron sputtering [67-72],... 

Many techniques have been used to prepare ZnO-based thin films and nanostructures, such as CVD, electron beam evaporation (EBE), MBE, pulsed laser deposition (PLD), sol-gel, spray pyrolysis, sputtering, and vapor phase growth. To prepare ZnO films or nanostructures, thermal oxidation of Zn and ZnS in air has also been used [124]. However, as for ZnS nanocrystals, wet methods, in this case wet oxidation, are still important techniques for SC processing [112]. 

Apart from the methods discussed in Sections 5.3.1 to 5.3.5, there are several more methods to prepare LiFeP04, such as the emulsion drying process, coprecipitation method, microwave heating method, solvothermal method, mechanochemical methods, vapor phase deposition, liquid phase oxidation/ reduction, and pulse laser deposition method. 

Plasma-enhanced CVD is a modified CVD method. Source materials are fully reacted in the plasma region and are then deposited on the heated substrate in crystalline form to prepare thin films of oxides. High vacuum is not required, so that an inexpensive vacuum device can be used. The deposition rate is high, and the process is cheap. It is a favorable choice for mass production. Similar to pulse laser deposition, the thickness of the prepared films is in the nanometer range, and their electrochemical performance is good. For example, the prepared amorphous LiMn204 thin film exhibits a specific capacity of 39 iAh/(cm2 pm). After 700 cycles, its capacity fading rate is only 0.04%/cycle. 

The (100) orientation has been found to produce large dielectric constant and high tunability [44,56]. BST films have been successfully fabricated on Pt coated silicon substrates by sputtering [56], chemical vapor deposition (CVD) [57], and pulsed laser deposition (PLD) [58]. Compared to other deposition methods, the sputtering process offers some special characteristics, for example, controlling the Ar/02 ratio and the total (Ar + O2) pressure during the deposition could attain the (100) preferred orientation [56] and adjust the... 

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