Deposition ion beam

As noted above, amorphous earbon films ean be produeed from earbon-eontaining gas phases (physieal vapour deposition, PVD). They ean also be produced from hydroearbon-eontaining gases (ehemical vapour deposition, CVD). Both PVD and CVD proeesses ean be thermally-aetivated or ean be plasma- and/or eleetrie field-assisted proeesses (e.g., mierowave assisted CVD and ion beam deposition). As a eonsequence a wide range of processes have been developed to form amorphous carbon films and a correspondingly complex nomenclature has evolved [70, 71]. 

DEC coating was first prepared by Aisenberg and Chabot using ion beam deposition in 1971 [2]. At present, PVD, such as ion beam deposition, sputtering deposition, cathodic vacuum arc deposition, pulsed laser deposition, and CVD, like plasma enhanced chemical vapor deposition are the most popular methods to be selected to fabricate DEC coatings. 

In ion beam deposition, hydrocarbon gas such as methane or ethyene is ionized into plasma by an ion source such as the Kaufman source [3]. The hydrocarbon ions are then extracted from the ion source and accelerated to form an ion beam. The ions and the unionized molecules condense on the substrate surface to form DEC coating. However, in this method, ionized ratio of precursor gases could hardly exceed 10 %. In order to obtain a better quality of DEC coatings. 

Up to the present, a number of conventional film preparation methods like PVD, CVD, electro-chemical deposition, etc., have been reported to be used in synthesis of CNx films. Muhl et al. [57] reviewed the works performed worldwide, before the year 1998, on the methods and results of preparing carbon nitride hlms. They divided the preparation techniques into several sections including atmospheric-pressure chemical processes, ion-beam deposition, laser techniques, chemical vapor deposition, and reactive sputtering [57]. The methods used in succeeding research work basically did not... 

Aisenberg, S. and Chabot, R., Ion-beam Deposition of Thin Films of Diamond-like Carbon,"/. Appl. Phys.,Vo. 42,1971, pp. 2953-2958. 

Kimock, F. M. and Knapp, B. J., Commercial Applications of Ion Beam Deposited Diamond-like Carbon (DLC) Coatings," Surf. Coat. Technol, Vol. 56,1993,pp. 273-279. 

In the following paragraphs, reports on XPS studies of a-C N H films are discussed. Most of the work that is discussed is not related to usual plasma deposition, but is related to ion-beam deposition, ion-beam assisted deposition, or other methods, because only a very few wide scope XPS studies on plasma-deposited a-C(N) H films were done up to this moment. Nevertheless, these results bring useful information on the role of hydrogen in the structure of a-C(N) H films. 

Ion Beam Deposition The most commonly used vacuum method for the rapid deposition of films (thin or thick) is sputtering (2M. This can be combined with ion beam techniques in a variety of ways (25) including (Figure 18) ion beam sputter deposition (IBSD) eg of oxide films or of hard carbon (26). In reactive systems the reactive gas is added to the argon ion beam. The properties of the deposited materials are modified substantially by varying the gas composition (Figure 19). 

Table 5.1. Adsorption properties of metal monolayers on metal substrates. The clean substrate properties are also given for comparison. Substrates are ordered by lattice type (fee, bcc, hep, cubic, diamond and rhombic). The structures, nearest neighbor distances and heats of vaporization refer to the bulk material of the substrate or the adsorbate. VD, ID and S stand for vapor deposition, ion beam deposition and surface segregation, respectively. TD, WF and TED stand for thermal desorption, work function measurements and transmission electron diffraction, respectively...

The basic concept of the c-BN nucleation by ion-beam-deposition has been described by Weissmantel et al. in 1980 [197, 198]. Adhesion problems and difficulties in analytical characterization have caused large problems. A breakthrough of nano-cBN coatings and their various applications seems to be possible. 

The methods mostly used for nano-cBN deposition are ion-beam-assisted deposition (IBAD) [199] mass selected ion beam deposition (IBD) [200] ion plating [201] RF- or magnetron sputtering [202] and laser deposition [203] (Fig. 13). 

Ion beam deposition employs an ion bombardment onto the substrate with high energetic nitrogen ions. Boron is vaporized as ions (mostly by an electron beam) and shot onto the substrate together with the nitrogen ions. 

Ion plating and ion beam deposition differ in the use of additional ions (e.g. Ar) for deposition. The process can be divided into three steps [201] ... 

We illustrate the molecular dynamics technique by application to the ion beam deposition technique. Molecular dynamics could be used to investigate the effect of deposition conditions on the microstructure of the growing film. The microstructural characteristics of interest include film roughness and porosity. 

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