Pulsed-laser-deposited film

LiCo02 films obtained by PLD with polycrystalline morphology were successfully used as cathode materials in lithium microbatteries. Typical charge and discharge curves of a Li//LiCo02 cell using pulsed-laser deposited film grown at... 

Ramsey, M. E., Poindexter, E., Pelt, J. S., Marin, J., and Durbin, S. M., Hydrophobic CNx Thin Film Growth by Inductively-coupled RF Plasma Enhanced Pulsed Laser Deposition, Thin Solid Films, Vol. 360, No. 1-2,2000, pp. 82-88. 

Schubert J, Schdning MJ, Schmidt C, Siegert M, Mesters St, Zander W, Kordos P, Liith H, Legin A, Mourzina YG, Seleznev B, Vlasov YG (1999) Chalcogenide-based thin film sensors prepared by pulsed laser deposition technique. Appl Phys A Mater Sci Process 69 803-805... 

H.S. Kwok, X.W. Sun, and D.H. Kim, Pulsed laser deposited crystalline ultrathin indium tin oxide films and their conduction mechanisms, Thin Solid Films, 335 299-302, 1998. 

The pulsed laser deposition (PLD) technique is widely used for inorganic materials but is beconting increasingly employed for the preparation of thin films of polymers... 

OtherCells Several other cells with zinc as an active material have been studied in recent years. The zinc-containing compounds were used as anodes in lithium-ion batteries [353-355]. One such compound is nanocrystalline ZnFe204 and AgxZnFe204 (x = 0.16, 0.37, and 0.50) [355], which have been prepared as thin films, by reactive pulsed laser deposition. Especially good performance in the battery of the Ago.3yZnFe204 film electrode has been shown. 

Hontsu, S., T. Matsumoto, J. Ishii, M. Nakamori, H. Tabata, and T. Kawai, Electrical properties of hydroxyapatite thin films grown by pulsed laser deposition. Thin Sol. Films, 295, 214-217 (1997). 

LAPS was introduced by Sato et al. [155]. The detection of heavy metal ions by thin films of chalcogenide-glass membranes using the pulsed laser deposition method (PLD) was reported by Mourzina et al. [156]. The PLD technique was also introduced to evaporate A1203 as a pH-sensitive material for LAPS devices [157]. The first practical application of the above-described LAPS card was demonstrated by Kloock et al. for a comparative study of Cd-sensitive chalcogenide glasses for ISFETs, LAPS and pISEs (ion-selective electrodes) [158]. 

Y. Mourzina, T. Yoshinobu, J. Schubert, H. Liith, H. Iwasaki and M.J. Schoning, Ion-selective light-addressable potentiometric sensor (LAPS) with chalcogenide thin film prepared by pulsed laser deposition, Sens. Actuators B Chem., 80(2) (2001) 136-140. 

M. Schoning, Y.G. Mourzina, J. Schubert, W. Zander, A. Legin, Y.G. Vlasov and H. Luth, Pulsed laser deposition—an innovative technique for preparing inorganic thin films, Electroanalysis, 13(8-9) (2001) 727-732. 

J. Talton, G. Hochhaus, J. Fitz-Gerald, and R. Singh. Pulsed laser deposited polymer films onto pulmonary dry powders for improved drug delivery. MRS 1998 Fall Meeting, Boston, 1998, p. 597. 

The preparation of c-axis aligned or even epitaxial RNi2B2C thin films has been performed using both, pulsed laser deposition (PLD Cimberle et al., 1997 Hase et al., 1997) and magnetron sputtering technique (Arisawa et al., 1994 Andreone... 

RE-TM-based films. - The deposition techniques (sputtering or PLD - pulsed laser deposition) have been used successfully to prepare SmCo5 and Nd2Fel4B nanoparticles [38, 39]. After room temperature deposition, the nanoparticles are amorphous. The desired crystal structure and magnetic properties are obtained through application of a post-deposition annealing treatment. Due to the high reactivity of the materials, this constitutes a non trivial task. 

The corresponding magnetic properties of the films range from BHmm = 195 kJ/m3 (with ju0Mr = 1 T and fi0Hc = 3.2 T) to BHmax = 352 kJ/m3 (with HoM, = 1.35 T and fioHc = 0.8 T). High deposition rates have also been reported for pulsed laser deposition but over small surface areas only (1 cm2)... 

ZnO thin films can be prepared by a variety of techniques such as magnetron sputtering, chemical vapor deposition, pulsed-laser deposition, molecular beam epitaxy, spray-pyrolysis, and (electro-)chemical deposition [24,74]. In this book, sputtering (Chap. 5), chemical vapor deposition (Chap. 6), and pulsed-laser deposition (Chap. 7) are described in detail, since these methods lead to the best ZnO films concerning high conductivity and transparency. The first two methods allow also large area depositions making them the industrially most advanced deposition techniques for ZnO. ZnO films easily crystallize, which is different for instance compared with ITO films that can... 

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