Development rate monitor

Aqueous Base Dissolution Characteristics. Films of these copolymers were cast on 4" Si wafers and baked at 130°C for 1 minute to remove the casting solvent, ethyl lactate. The film thickness (approximately 1.0 jim) was measured on a Tencor Alphastep. The dissolution rates of these films were then measured by immersion in aqueous tetramethylammonium hydroxide (TMAH) solution (at 23 °C) using a Perkin-Elmer 5900 Development Rate Monitor. The dissolution rates were then measured by immersion in a variety of TMAH solutions of increasing normality (0.14,0.26,0.30,0.60 and 1.0 N). 

Dissolution rate of the polyhydro tyrene films and SiPHS resist films, spin-coated and soft baked on Si wafers, were determined by using a Perkin-Elmer Development Rate Monitor (DRM). 

The organic deposition sources are made of a variety of materials including ceramics (e.g., boron nitride, aluminum oxide, and quartz) or metallic boats (e.g., tantalum or molybdenum). Deposition is carried out in high vacuum at a base pressure of around 10-7 torr. The vacuum conditions under which OLEDs are fabricated are extremely important [41] and evaporation rates, monitored using quartz oscillators, are typically in the range 0.01 0.5 nm/s in research and development tools. In manufacturing, higher rates or multiple sources may be used to reduce tact times. 

Methods of near-field, midfield and ensemble (global) imaging and real-time visualization have been developed for monitoring gas atomization of liquid metals.[327] The primary process sensors and monitors used include high-speed video and infrared imaging systems. The process monitors allowed continuous and detailed observations of the atomization process and enabled measurements of the key parameters necessary for adequate control and optimization of the process. The sensors provided the operators with real-time information on the temperature of nozzle tip, visual characteristics of atomization plume, and gas and metal flow rates. The images can be displayed in real time, offering the potential for more responsive process control. 

A number of techniques have been employed to examine free volume properties of polymers. These include small angle x-ray scattering and neutron diffraction that have been used to determine denisty fluctuations to deduce free volume size distributions [4-7]. Photochromic labelling techniques by site specific probes have been developed to monitor the rate of photoisomerizations of the probes and from this deduce free volume distributions [8-11]. Additional probing methods used to probe voids and defects in materials such as scanning tunneling microscopy (STM) and... 

The increased rate of development for exposed coatings with additives is, however, quite pronounced. This can be seen most easily in the traces from a Perkin Elmer dissolution rate monitor. 

The simple dissolution rate results were obtained using a laser interferometer with a 15 mw/cm He-Ne laser at normal incidence to the wafer surface in the agitated developer bath. The reflected beam was directed by a beam splitter onto a photocell. The photocell output was fed through a Keithly series 500 interface into an IBM-PC. The more complex dissolution data were collected on a Perkin-Elmer dissolution rate monitor using 934 developer at a 1 1 dilution with deionized water at a temperature of 21 C. The stepped exposures were obtained using a calibrated multidensity chrome stepwedge. 

If the development rate by negatively charged developing agent ions is monitored until all the silver halide is reduced, it follows a typical S-shaped curve that has been interpreted as a consequence of autocatalysis caused by the increasing surface area of the developed silver. An alternative interpretation by Gavrik [23] holds that this autocatalysis is a consequence of simpler kinetics and that development is better represented by simple relations where developed silver mass is proportional to development time with an initial induction period and a final exhaustion period when all the silver halide has been reduced. Levenson [24], however, has reaffirmed the autocatalytic view. 

Temperature is a key variable in most analytical processes. In microwave-assisted processes, it plays a prominent role and affects the rate of some reactions, the degradation of thermolabile species and the solubilization of some substances, among others. A number of devices have been developed for monitoring or even controlling the temperature, some of which are commented on in Section 5.3. 

The use of modem analytical methods has led to the determination of the PAHs which are produced in catalytic hydrocrackers. A variety of HPLC-DAD, fluorescence, and UV absorbance methods were developed to determine the occurrence of the PAHs. These PAHs result from a small number of reactions. These are either a new ring forming through two-or four-carbon addition or the condensation of pyrene, coronene, or ovalene. The latter reactions result in very large PAHs which cause process problems because of their low solubilities. Their production rates (and eventual precipitation in the process streams) can be monitored through the use of UV absorbance and fluorescence spectrometries. A synchronous-scanning fluorescence method was developed to monitor the production of dicoronylene during process operation. The results of these analyses can then be used to determine process performance. 

CEM systems have been developed to monitor pollutant gases, such as SO2 and NO, and the so-called diluent gases, CO2 and O2, present in the exhaust gas streams of combustion sources. Systems have also been developed to monitor flue-gas opacity. A system is defined as the total equipment required for the determination of flue gas opacity, a gas concentration, or the emission rate. A CEM system is normally composed of a sample interface, the pollutant and diluent analyzers, and a data recording subsystem. The system is used to generate emission data that are representative of the total emissions from the facility. 

The whole system for corrosion rate monitoring has been operating in a plant for testing PWR primary pumps, developed by ENEA and FIAT. The system comprises ... 

The numerical methods [32, 33, 34, 35, 36, 37] developed for the analysis of experimental polarization curves described by the current-voltage characteristic (2) with the aim of determining the electrochemical parameters a, /3 and h, are of considerable importance in the field of basic research as well as in corrosion rate monitoring. They permit, in fact, a more objective evaluation of these quantities with reference to a given potential difference interval AE, removing the degree of subjectivity that is inherent in the graphic determination of the Tafel slopes. 

It is important that the pest or vector populations are monitored for resistance and the effectiveness of the control pesticide is monitored. In the event of a control failure that can be linked with resistance, it is important that the pest is not re-sprayed with an insecticide from the same class. Our data suggest a difference in the development rate of the susceptible and resistant strains at higher temperatures. This difference may be exploited in an attempt to control and prevent the spread of resistance in the population. 

Fluorescence monitoring has also been developed to monitor the real-time polymerization rate of in situ photopolymerizable... 

Many technologies have been developed to monitor or measure fluid flow in microdevices. The underlying mechanisms of these devices are based mainly on thermal or mechanical principles examples of the variables to be measured are temperature, differential pressure, and drag force, which translate to thermal changes, deflection of cantilever beams, and shear strain, respectively. Most of these microflow sensors are manufactured by microelectromechanical systems (MEMS) processes without moving parts, and the flow rate measurements are mainly translated from velocity detection. For example, because flows in microchannels are in most... 

Dissolution Measurements. Dissolution rate measurements of the benzophenone series were made on a Perkin-Elmer Dissolution Rate Monitor (DRM-5900) in puddle development mode with 0.25 N KOH developer. The DRM was computer-controlled using Perkin Elmer DRM analytical software (DREAMS 3.0). Measurements of the sulfonyl/carbonyl esters were made with 0.26 N tetramethyl-ammonium hydroxide (TMAH). Reported dissolution rates DRj/i) are at half film thickness. 

---