Tetramethyl-ammonium-hydroxide

Li0. VwOw H2O- which is prepared by dissolving V205 in tetramethyl ammonium hydroxide and LiOH, acidified with nitric acid and heated at 200 °C [94],... 

As the solvent mixture also contained 225 mg of tetramethyl ammonium hydroxide pentahydrate per liter at a high water content (75%), the surface of the reverse phase would have been largely covered with the tetramethyl ammonium hydroxide pentahydrate. This would have acted as an adsorbed ion exchange stationary phase. It is clear that the free acids, salicylic acid, acetylsalicylic acid (aspirin) and benzoic acid were retained largely by ionic interactions with adsorbed basic ion exchanger and partly by dispersive interactions with the exposed reversed phase. The acetaminophen and the caffeine, on the other hand, being unionized substances, were retained only by dispersive interactions with the exposed reversed phase. 

Solubility of polymers in tetramethyl ammonium hydroxide aqueous solution was measured by dipping the wafer on which the polymer solution was spin-coated, for 1 min. at 25°C. The prebake was carried out at 90°C for 5min. Sensitivity of resists was measured after the exposure with CA 800(Cobilt) or KrF excimer laser(0.9mJ/cm2/1 pulse). The polymer structure was determined by iH-NMR, 13C-NMR(FX90Q apparatus,JEOL) and 2 Si-NMR. The molecular weight distribution was determined with a Toyo Soda Model 801 gel permeation chromatograph at 40°C. The four columns were connected in series, each packed with G-2000H8x3 and G-400H8(Toyo Soda polystylene gel), respectively. 

Carboxylic acids were introduced by the reaction of the polysilane(II) with carboxylic acid anhydrides in the presence of an amine. Table 2 shows the results. In order to examine the effect of unsaturated bonds and halides in the side chain on photolysis, double bonds or chloride groups were introduced with the carboxylic acid. Polysilanes(III) were also soluble in polar solvents and basic aqueous solution. The solubility in tetramethyl ammonium hydroxide aqueous solution(TMAH) depended strongly... 

After exposure, the resist film was developed with a 60s immersion in tetramethyl ammonium hydroxide (TMAH) aqueous solution. 

Experiments 9-12 explore the use of an SAT (spray acid tool, which rotates the wafers during cleaning) with SCl-HF with various concentrations. We found out that none of the experimental conditions yielded acceptable electrical data. Both SCI and HF corroded W plugs. Experiments 13 and 14 use SAT and novel chemicals that is, TMAH (N(CH3)40H, tetramethyl ammonium hydroxide), and/or NH4F (ammonium fluoride). These results were the best in terms of both the Fe contamination and the W plug compatibility. 

Hydroxides Precipitation of hydroxides may be done through addition of a base to an aqueous solution of salts. Yttrium and copper hydroxides have a similar precipitation range but for the less polarizing Ba cation, very high pH is necessary to start the precipitation. However, two processes have been described that increase the pH of a solution of nitrates in water by addition of either NaOH (52) or tetramethyl ammonium hydroxide (53). It appears that at 60°C and... 

The resist formulation was spin-coated onto a silicone wafer on which a bottom antireflective coating had been previously applied and then soft-baked for 60 seconds at 90°C on a hot plate to obtain a film thickness of 1000 nm. The resist film was then exposed to i-line radiation of 365 nm through a narrowband interference filter using a high-pressure mercury lamp and a mask aligner. Experimental samples were then baked for 60 seconds at 90°C on a hot plate and developed. The dose to clear, E0, which is the dose just sufficient to completely remove the resist film after 60 seconds immersion development in 2.38% aqueous tetramethyl ammonium hydroxide, was then determined from the measured contrast curve. Testing results are provided in Table 1. 

Poly(terephthaloyl hydrazide) forms anisotropic solutions in concentrated solutions of some quarternary ammonium hydroxides such as tetramethyl ammonium hydroxide 33). These solutions contain typically about 10% each of the organic base and the polymer. Aromatic polyhydrazides such as poly(chloroterephthaloyl hydrazide) and various co-polyhydrazides also form anisotropic solutions in some of the solvents used for PPT, such as 100% sulphuric acid and fluorosulphonic acid 34). 

Studies of relative rates, activation parameters, kinetic isotope, and solvent isotope effects, and correlation of rates with an acidity function, have elucidated the mechanisms of cyclization of diacetyl aromatics (23-26) promoted by tetramethyl-ammonium hydroxide in DMSO.32 Rate-determining base-catalysed enolate anion formation from (24-26) is followed by relatively rigid intramolecular nucleophilic attack and dehydration whereas the cyclization step is rate determining for (23). 

For example, PTV film was fabricated as follows. Polymerization of a sulphonium monomer, 2,5-thienylene bis (methylene-dimethyl-sulphonium chloride) was carried out in a methanol-water mixture at -20°C by adding a methanol solution of tetramethyl-ammonium hydroxide. The reaction was quenched by an addition of hydrochloric acid. A yellow precipitate (precursor polymer) appeared as the solution was warmed to room temperature. The precipitated precursor polymer was completely soluble in dich-loromethane. A precursor polymer thin film was obtained by spin-coating of the dichloromethane solution of the precursor polymer onto a fused silica glass substrate under inert atmosphere to prevent oxidation with air. The film was heated at 200-250°C in a vacuum of 10"2 Torr for 5 hours, to give a tough, flexible PTV film. The resulting PTV thin film was chemically stable in air. 

The SAPO-37 samples were synthesized following a procedure similar to that described by Saldarriaga et al.(21). H3PO4 (85 ), AlpOj (pseudobohemite), tetrapropylammonium hydroxide (40% TPAOH, Alfa products with K+Na= 340 ppm), tetramethyl ammonium hydroxide pentahydrate (TMAOH.5H2O, from Aldrich) and Aerosil-200 were used as starting materials. 

Kim CG, Yoon TI, Seo HJ, Yu YH. Hybrid treatment of tetramethyl ammonium hydroxide occurring from electronic materials industry. Kor J Chem Eng 2002 19 445-450. 

Fig. 2.9. The broken (left) and closed (right) truncated octahedron of hydrogen bonds in the low and high temperature structure of tetramethyl ammonium hydroxide tetrahydrate [124]...

McMullan RK, Mak TCW, Jeffrey GA (1966) Polyhedral clathrate hydrates XI. Structure of tetramethyl ammonium hydroxide pentahydrate. J Chem Phys 44 2338-2345... 

The Step 2 product was spin-coated onto a silicone wafer and baked for 2 minutes at 215°C. Thereafter the anti-reflective mixture was coated with a Keum Ho petroleum photosensitive agent and baked for 90 seconds 110°C. After these processes the material was exposed to a light source by means of ASML/900 scanner apparatus and baked an additional 90 minutes at 130°C. The exposed wafer was developed using an aqueous solution of 2.38% tetramethyl-ammonium hydroxide. 

Mw = 9300, Mw/Mn = 5.07). The poly (p-hydroxy styrene) was PHP-6817-24, obtained from Marusen Oil Co. (Mn = 3900, Mw = 10200, Mw/Mn = 2.62). Kodak micro positive developer 934 (934 developer) (predominantly tetramethyl ammonium hydroxide in water) was used at various dilutions with deionized water. M-cresyl naphthalene diazo-quinone sulfonate was prepsured by a pyridine catalyzed condensation of m-cresol with naphthalene diazoguinone sulfonyl chloride. 

ELECTROCHEMICAL BEHAVIOR OF COPPER IN TETRAMETHYL AMMONIUM HYDROXIDE BASED SOLUTIONS... 

The tetramethyl ammonium hydroxide (25% TMAH) used was provided by Mallinckrodt Baker Inc. Both ammonium hydroxide (29% NH4OH) and hydrogen peroxide (30% H2O2) were donated by Olin Microelectronic Materials. In experiments that were conducted in the pH range of 8 to 10,10" M potassium nitrate (KNO3) was added to increase the conductivity of the solution to overcome any IR drop that might occur between the working electrode and the reference electrode. 

The subsequent reactions after the initial pyrolytic process can be utilized with practical results. Besides the pyrolysis of a pure sample, the intentional pyrolysis of a mixture in which one of the components generates reactive products (such as tetramethyl ammonium hydroxide) can be applied to influence the chemical structure of the products generated at the end of the pyrolysis. This subject will be discussed in Section 2.7. 

During pyrolysis, quaternary ammonium hydroxide is also decomposed. The decomposition of tetramethyl ammonium hydroxide takes place by the following reaction ... 

Methanol is not the only result in this reaction. Dimethyl ether is also formed in different proportions. This reaction product may be formed from water elimination between two alcohol molecules or, more likely, from the reaction of methanol with tetramethyl ammonium hydroxide. This reaction is exemplified for TMAH ... 

Tetramethyl Ammonium Hydroxide (TMAH). TMAH, (CH3)4NOH, etchant has been developed more recently for anisotropic etching of silicon. It is relatively safe to use and presents no special disposal issues. It has a very low oxide etch rate and does not attack aluminum if the soluhon contains a certain amount of silicates. However, hillocks tends to develop in this solution. ... 

TMAH tetramethyl ammonium hydroxide, etching solution 7.4... 

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