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Titanium oxide, deposition

A beat exchanger system installed on the coolant fluid circuit is used to produce high-pressure steam (6.10 Pa absolute. The catalyst is a mixture of vanadium and titanium oxides deposited on an inert, non-porous support The molar yield of phthalic anhydride is 74 per cent of stoichiometry, using 95 per cent o-xylene. [Pg.315]

The deposition of titanium oxide thin-films on Mo(l 10) represents a case where the stoichiometry of the film is sensitive to the deposition conditions [4T]. It was found that both Ti02 and Ti203 thin-films could be made. [Pg.941]

A large deposit of loparite occurs ia the Kola Peninsula, Russia. The production of REO reaches 6500 t/yr. Loparite contains over 30% of rare-earth oxides from the cerium group. In addition, loparite contains up to 40% titanium oxide and up to 12% niobium and tantalum oxides. [Pg.543]

Anode Applications. Graphite has been used as the primary material for electrolysis of brine (aqueous) and fused-salt electrolytes, both as anode and cathode. Technological advances, however, have resulted in a dimensionally stable anode (DSA) consisting of precious metal oxides deposited on a titanium substrate that has replaced graphite as the primary anode (38—41) (see Alkali and chlorine products). [Pg.521]

Fig. 1.51 Crevice corrosion resulting from the crevice produced between the gasket and the flange of a titanium pipe used for conveying a hot hypochlorite solution. The attacked areas are coated with a hard deposit of titanium oxides, whilst the unattacked area of metal outside... Fig. 1.51 Crevice corrosion resulting from the crevice produced between the gasket and the flange of a titanium pipe used for conveying a hot hypochlorite solution. The attacked areas are coated with a hard deposit of titanium oxides, whilst the unattacked area of metal outside...
The largest uses of platinum group metals in electronics are ruthenium for resistors and palladium for multilayer capacitors, both applied by thick film techniques . Most anodes for brine electrolysis are coated with mixed ruthenium and titanium oxide by thermal decomposition . Chemical vapour deposition of ruthenium was patented for use on cutting tools . [Pg.566]

Titanium dioxide (Ti02), also known as titania, is the most common of several known titanium oxides. It is deposited by CVD on an experimental and production basis. Its characteristics and properties are summarized in Table 11.7. [Pg.309]

Recently, it is reported that Xi02 particles with metal deposition on the surface is more active than pure Ti02 for photocatalytic reactions in aqueous solution because the deposited metal provides reduction sites which in turn increase the efficiency of the transport of photogenerated electrons (e ) in the conduction band to the external sjistem, and decrease the recombination with positive hole (h ) in the balance band of Xi02, i.e., less defects acting as the recombination center[l,2,3]. Xhe catalytic converter contains precious metals, mainly platinum less than 1 wt%, partially, Pd, Re, Rh, etc. on cordierite supporter. Xhus, in this study, solutions leached out from wasted catalytic converter of automobile were used for precious metallization source of the catalyst. Xhe XiOa were prepared with two different methods i.e., hydrothermal method and a sol-gel method. Xhe prepared titanium oxide and commercial P-25 catalyst (Deagussa) were metallized with leached solution from wasted catalytic converter or pure H2PtCl6 solution for modification of photocatalysts. Xhey were characterized by UV-DRS, BEX surface area analyzer, and XRD[4]. [Pg.469]

Figure 1 shows AES data for the oxidized titanium surface before and after deposition of 30 X of platinum with the substrate held at 130 K. The platinum thickness was calculated from the attenuation of the oxygen AES signal assuming layered growth of the metal. From the spectra It Is clear that the platinum was sufficient to completely attenuate the underlaying features of the titanium oxide. [Pg.81]

To explore the possibility of electronic Interaction between the reduced titanium oxide and Pt, 1 ML of Pt was deposited on both fully oxidized and partially reduced T102. The reduced sample was prepared by Ar" " sputtering of the TIO2 substrate prior to metal deposition. Introducing reduced Tl centers at the Pt-Tl Interface. [Pg.84]

The process has been commercially implemented in Japan since 1977 [1] and a decade later in the U.S., Germany and Austria. The catalysts are based on a support material (titanium oxide in the anatase form), the active components (oxides of vanadium, tungsten and, in some cases, of molybdenum) and modifiers, dopants and additives to improve the performance, especially stability. The catalyst is then deposited over a structured support based on a ceramic or metallic honeycomb and plate-type structure on which a washcoat is then deposited. The honeycomb form usually is an extruded ceramic with the catalyst either incorporated throughout the stmcture (homogeneous) or coated on the substrate. In the plate geometry, the support material is generally coated with the catalyst. [Pg.8]

X-ray diffraction conducted on the codeposited powder revealed that the deposit obtained from a suspension of gamma alumina, which had been partially converted to the alpha phase, contained both phases of alumina. Whereas, the powder codeposited from a suspension having a 50 50 mixture of alpha to gamma alumina powder, consisted only of the alpha phase. Using a parallel plate electrode configuration, Chen et al. [31] concluded that only alpha alumina can be codeposited. Chen also observed a difference in codeposition with copper when using two different phases of the titanium oxide particle system rutile readily codeposited but anatase titania did not... [Pg.205]

The key effect of oxide supports on the catalytic activities of metal particles is exerted through the interface between oxides and metal particles. The key objective of this study is to develop synthesis methodologies for tailoring this interface. Here, an SSG approach was introduced to modify the surface of mesoporous silica materials with ultrathin films of titanium oxide so that the uniform deposition of gold precursors on ordered mesoporous silica materials by DP could be achieved without the constraint of the low lEP of silica. The surface sol-gel process was originally developed by Kunitake and coworkers.This novel technology enables molecular-scale control of film thickness over a large 2-D substrate area and can be viewed as a solution-based... [Pg.62]

Based on cp-AFM evidence for the simple case of an n-alkanethiolate/Au SAM, the M structures show no evidence for penetration of metal to form conducting filaments that can cause shorts. The resultant junctions, however, do show extensive formation of reaction product layers with complex chemical compositions which may lead to unfavorable characteristics for molecular device operation. Indeed, in recent reports the use of Ti deposition on LB films, which contain water and inorganic salts at the bottom Pt electrode/LB film interface, leads to formation of inorganic titanium oxide type species in the junction but these complex inorganic layers have also been reported to impart fortuitously quite useful device... [Pg.253]

Park MH, Jang YJ, Sung-Suh HM, Sung MM (2004) Selective atomic layer deposition of titanium oxide on patterned self-assembled monolayers formed by microcontact printing. Langmuir 20 2257-2260... [Pg.271]

The main characteristics of the various titanium oxide catalysts used in this chapter are summarized in Table 1. Titanium oxide thin film photocatalysts were prepared using an ionized cluster beam (ICB) deposition method [13-16]. In ICB deposition method, the titanium metal target was heated to 2200 K in a crucible and Ti vapor was introduced into the high vacuum chamber to produce Ti clusters. These clusters then reacted with O2 in die chamber and stoichiometric titanium oxide clusters were formed. Tlie ionized titanium oxide clusters formed by electron beam irradiation were accelerated by a high electric field and bombarded onto the glass substrate to form titanium oxide thin films. [Pg.287]

The preparation of nickel oxide deposits with high surface area on steel, nickel, copper, graphite or titanium electrodes partly for anodic oxidation of organic compounds and the preparation of pressed nickel oxide powder electrodes mainly for application in storage batteries is described. The performance of nickel oxide anodes for batteries is improved by addition of cobaltflljhydroxide... [Pg.104]

The chief mined ore of titanium is ilmenite (iron titanium oxide, FeTiC>3) and it occurs as vast deposits of sand in Western Australia, Canada and the Ukraine. Large deposits of rutile (titanium dioxide, TiO ) are known in North America, and South Africa. World production of the metal itself is around 90,000 tonnes per year, small compared to titanium dioxide production which is 4.3 million tonnes per year. Reserves of titanium amount to more than 600 million tonnes and while there is an abundance of this element it is extremely costly because it has to be extracted by a complicated process, and yet it could be so much more useful if it was cheaply available. [Pg.143]

Control of pore sizes of known catalysts like zeolites has been known for some time although the use of chemical vapor deposition (CVD) of organosilanes to control pore sizes has been the focus of recent research.7 Other catalysts like silica have been treated with methods like CVD and sol-gel in order to deposit thin films. Monolayer coatings of titanium oxide prepared by sol-gel methods have been recently used to coat silica and such films are active in alcohol dehydrogenation reactions.8... [Pg.9]

Ceramic and semiconductor thin films have been prepared by a number of methods including chemical vapor deposition (CVD), spray-coating, and sol-gel techniques. In the present work, the sol-gel method was chosen to prepare uniform, thin films of titanium oxides on palladium Titanium oxide was chosen because of its versatility as a support material and also because the sol-gel synthesis of titania films has been clearly described by Takahashi and co-workers (22). The procedure utilized herein follows the work of Takahashi, but is modified to take advantage of the hydrogen permeability of the palladium substrate. Our objective was to develop a reliable procedure for the fabrication of thin titania films on palladium, and then to evaluate the performance of the resulting metalloceramic membranes for hydrogen transport and ethylene hydrogenation for comparison to the pure palladium membrane results. [Pg.174]

An example of recent achievement in this area is a flexible, thin film Cu(In,Ga)Se2 solar cell deposited on a titanium foil, which was combined with a TiC>2 photocatalyst layer and modified by a niobium-doped titanium oxide front electrode to function as a photoelectrochemical tandem cell/membrane for a direct light-driven hydrogen evolution from an aqueous solution [48], Under illumination with UV/vis light, the system produced up to 0.052 pLH2/scm2 (e.g. the hydrogen formation rate was approximately 7,250 pmol/h g relative to the amount of TiC>2 used). Several aspects of the operating principles of the photoelectrochemical devices, the materials requirements, main bottlenecks, and the various device concepts (in relation to H2... [Pg.391]

Halary, E., Benvenuti, G., Wagner, F. and Hoffmann, P. (2000). Light induced chemical vapour deposition of titanium oxide thin films at room temperature. Appl. Surf. Sci. 154, 146-151. [Pg.505]


See other pages where Titanium oxide, deposition is mentioned: [Pg.156]    [Pg.587]    [Pg.156]    [Pg.587]    [Pg.132]    [Pg.94]    [Pg.426]    [Pg.360]    [Pg.573]    [Pg.393]    [Pg.251]    [Pg.255]    [Pg.465]    [Pg.99]    [Pg.816]    [Pg.371]    [Pg.981]    [Pg.134]    [Pg.385]    [Pg.332]    [Pg.114]    [Pg.162]    [Pg.129]    [Pg.174]    [Pg.94]    [Pg.470]   
See also in sourсe #XX -- [ Pg.977 , Pg.978 , Pg.979 ]




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