SEARCH Articles Figures Tables ARTIN HANEK, NORBERT LOW, ANDREAS MUHLBAUER 1 Cleaning requirements in the electronic industry Activity of detergents in dry cleaning CLEANING PROCESSES IN POWER STATIONS Carbon Monoxide Fine Clean-Up in Fixed-Bed Reactors Carbon Monoxide Fine Clean-Up in Membrane Reactors Carbon Monoxide Fine Clean-Up in Monolithic Reactors Carbon Monoxide Fine Clean-Up in Plate Heat-Exchanger Reactors Clean in place Clean-in-place cleaners Clean-in-place pump Clean-in-place systems Cleaning in-place systems Cleaning, gas settles in waste heat boiler Cleaning-in-place Cleaning-in-place procedures Cleaning-in-place process Formation and Loss of O3 in the Clean Atmosphere Hydrogen in Aerospace Clean Contrails and the Orient Express Hydrogen peroxide in clean processes In Situ Characterization of Membrane Fouling and Cleaning Using a Multiphoton Microscope In situ cleaning In-line cleaning Just-in-time cleaning Microemulsions in textile cleaning New Developments in the Context of Clean Synthesis Perceptions in Cleaning Hair and the Subjective Testing of Shampoos Photochemical self-cleaning in the environment Plasma Cleaning and In Situ Deposition of TMS Polymer on Cold-Rolled Steel Recycling of solvents in dry cleaning Removal of soiling in dry cleaning Sample Clean-Up Ways to Overcome the Bottleneck in Proteome Analysis Situ Plasma Cleaning in Micro-Electronics and Related Environmental Issues Solubility in Supercritical Fluid Cleaning Solvents in dry cleaning Spotting in dry cleaning Stencil cleaning in screen printing machines Use of clean fuels in burner-heated heat treatment furnaces Utilisation in Semiconductor Processing and Cleaning WASTE MANAGEMENT IN METAL CLEANING AND STRIPPING Water-free cleaning processes in closed, one-chamber vapor defluxing systems Water-free cleaning processes using HFE (hydrofluoroethers) in combination with a cosolvent