Utilisation in Semiconductor Processing and Cleaning

The use of carbon dioxide in its various states for processing and cleaning in semiconductor fabrication and related electronic devices is of enormous potential. 

The extremely low surface tension of SCCO2 is a favorable property in terms of its rapid and complete removal from the substrate after a treatment has been effected. Another reason for C02 s unique attractiveness is its environmental compatibility. There are currently four different approaches which have the potential to utilize CO2 for semiconductor technology. All of them have been intensively investigated but have not yet been applied in industrial production [42, 46—49]  

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