Combustion chemical vapor deposition

These processes are very rapid and allow the preparation of inorganic supports in one step. This technique allows large-scale manufacturing of supports such as titania, fumed silica, and aluminas. Sometimes the properties of the material differ from the conventional preparation routes and make this approach unique. Multicomponent systems can be also prepared, either by multimetallic solutions or by using a two-nozzle system fed with monometallic solutions [22]. The as-prepared powder can be directly deposited onto substrates, and the process is termed combustion chemical vapor deposition [23]. 

Combustion Chemical Vapor Deposition (CCVD) allows deposition of thin films that confer special electronic, catalytic, or optical properties, corrosion and oxidation resistance. The CCVD process is a novel, open-atmosphere process that is environmentally friendly and does not require expensive reaction/vacuum chambers. Often coatings are of equal or better quality than those obtained by vacuum-based methods. Coating costs are significantly lower than for more traditional processes such as Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD). Equally important, this novel technology can be implemented in a production-line environment, thus enabling uninterrupted processing. To date over 70 different inorganic materials have been deposited onto a variety... 

The innovative Combustion Chemical Vapor Deposition (CCVD) process, patented for applications other than the diamond coatings by the Georgia Institute of Technology and licensed exclusively to Micro Coating Technologies, Inc., (MCT, Chambiee, GA) has demonstrated its ability to overcome many of the shortcomings of traditional vapor... 

What follows is a review of the open and patent literature of thin film deposition processes that are related to Combustion Chemical Vapor Deposition (CCVD). This will help to distinguish the novel CCVD process from more... 

Method and Apparatus for the Combustion Chemical Vapor Deposition of Films and Coatings, U.S. Patent 5,652,021, 1997. 

Frequency Adaptive Electronics, Contract DAAHO, 1-97-C-R230, DARPA STTR Phase I Grant, 1998 and S.S. Shoup, S. Shanmugam, D. Cousins, A.T. Hunt, M. Paranthaman, A. Goyal, P. Martin, and D.M. Kroeger, Low-Cost Combustion Chemical Vapor Deposition of Epitaxial Buffer Layers and Superconductors, IEEE Transactions on Applied... 

A.T. Hunt, J. Abbey, and H.G. Hornis, PZT, PLZT, ESC and Pt Thin Films Produced in the Open Atmosphere Using Combustion Chemical Vapor Deposition. Presented at the International Symposium on Integrated Ferroelectrics, Colorado Springs, CO, 1995. 

M.R. Hendrick, H. Shao, TJ. Hwang, and A.T. Hunt, Low Cost Corrosion Protection of Metals by Combustion Chemical Vapor Deposited Coatings, Materials Solutions Conference, Rosemont, Illinois, ASM International, Materials Park, Ohio, 1998. 

M.R. Hendrick, J.M. Hampikian, and W.B. Carter, Combustion Chemical Vapor Deposition of Alumina, Gordon Research Conference on High-Temperature Corrosion, New London, New Hampshire, 1995. 

T.J. Hwang, H. Shao, M.R. Hendrick, H.G. Hornis, and A.T. Hunt, Combustion Chemical Vapor Deposition (CCVD) of LaPO Monazite on Alumina Eibers for Ceramic Matrix Composites, Journal of Materials Science and Engineering, V01.A244, 1998, pp.91-96. 

M. Oljaca, H.L. Luten, T. Tomov, and T. Metzger, BST Thin Eilms by Combustion Chemical Vapor Deposition, Dependency of Materials Properties on Flame Characteristics, Combustion Flame, to be submitted. 

W.B. Carter, J.M. Hampikian, S. Godfrey, and T.A. Polley, Thermal Aging of Combustion Chemical Vapor Deposited Coatings, Materials and Manufacturing Processes, Vol.lO, No.5, 1995, pp.l007-1020. 

A.T. Hunt, W.B. Carter, and J.K. Cochran, Jr., Combustion Chemical Vapor Deposition, A Novel Thin-Lilm Deposition Technique, Applied Physics Letters, Vol.63, No.2, 1993, pp.266-268. 

A.T. Hunt, Combustion Chemical Vapor Deposition from Liquid Organic Solutions, Dissertation, Georgia Institute of Technology, 1993. 

Liu, Y. Koep, E. Liu, M., A highly sensitive and fast-responding Sn02 sensor fabricated by combustion chemical vapor deposition, Chem. Mater. 2005,17, 3997-4000... 

Liu, Y., S.W. Zha, and M.L. Liu, Novel nanostructured electrodes for solid oxide fuel cells fabricated by combustion chemical vapor deposition (CVD). Advanced Materials, 2004, 16(3) p. 256-260... 

Key words Combustion Chemical Vapor Deposition/Thin Film Electrol rte/Solid Oxide Fuel Cells... 

Z. Xu, J. Saukar, Q. Wei, Combustion chemical vapor deposition of YSZ thin films for fuel cell applications. MD (American Society of Mechanical Engineers), 2001, 95(Effects of Processing on Properties of Advanced Ceramics), p. 1-8. 

Z. Xu, S. Yarmolenko, and J. Saukar, Preparation and properties of YSZ electrolyte thin films via liquid fuel combustion chemical vapor deposition. Ceram. Eng. Sci. Proc., 2001, v.23, p. 711-718. 

R., Shao, H., Hornis, H.G., and Hunt, A.T. (1998) Combustion chemical vapor deposition (CCVD) of LaP04 monazite and beta-alumina on alumina fibers for ceramic matrix composites, Mater. Sci. Eng. A, 244, 91. Copyright 1998, with permission from Elsevier. 

CCVD combustion chemical vapor deposition MOCVD mettil-organic-assisted CVD PECVD plasma-enhanced CVD FACVD flame-assisted CVD AACVD aerosol-assisted CVD ESAVD electrostatic-atomization CVD LPCVD low-pressure CVD APCVD atmospheric-pressure CVD PACVD photo-assisted CVD TACVD thermtil-activated CVD EVD electrochemical vapor deposition RTCVD rapid thermal CVD UHVCVD ultrahigh-vacuum CVD ALE atomic-layer epitaxy PICVD pulsed-injection CVD... 

Hunt AT, Cochran JK, Carter WB, inventors Georgia Tech Research Corp, assignee. Combustion chemical vapor deposition of films and coatings. United States patent US... 

Hunt AT, Carter WB, Cochran JK Jr. Combustion chemical vapor deposition a novel thin film deposition techniques. Appl Phys Lett 1993 63(2) 266-8. 

Liu, Y. Zha, S. Liu, M. (2004). Novel Nanostructured Electrodes for Sohd Oxide Fuel Cells Fabricated by Combustion Chemical Vapor Deposition. Advanced Materials, Vol. 16, No. 3, pp. 256-260, ISSN 15214095... 

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