Combustion chemical vapor deposition CCVD

Combustion Chemical Vapor Deposition (CCVD) allows deposition of thin films that confer special electronic, catalytic, or optical properties, corrosion and oxidation resistance. The CCVD process is a novel, open-atmosphere process that is environmentally friendly and does not require expensive reaction/vacuum chambers. Often coatings are of equal or better quality than those obtained by vacuum-based methods. Coating costs are significantly lower than for more traditional processes such as Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD). Equally important, this novel technology can be implemented in a production-line environment, thus enabling uninterrupted processing. To date over 70 different inorganic materials have been deposited onto a variety... 

The innovative Combustion Chemical Vapor Deposition (CCVD) process, patented for applications other than the diamond coatings by the Georgia Institute of Technology and licensed exclusively to Micro Coating Technologies, Inc., (MCT, Chambiee, GA) has demonstrated its ability to overcome many of the shortcomings of traditional vapor... 

What follows is a review of the open and patent literature of thin film deposition processes that are related to Combustion Chemical Vapor Deposition (CCVD). This will help to distinguish the novel CCVD process from more... 

T.J. Hwang, H. Shao, M.R. Hendrick, H.G. Hornis, and A.T. Hunt, Combustion Chemical Vapor Deposition (CCVD) of LaPO Monazite on Alumina Eibers for Ceramic Matrix Composites, Journal of Materials Science and Engineering, V01.A244, 1998, pp.91-96. 

R., Shao, H., Hornis, H.G., and Hunt, A.T. (1998) Combustion chemical vapor deposition (CCVD) of LaP04 monazite and beta-alumina on alumina fibers for ceramic matrix composites, Mater. Sci. Eng. A, 244, 91. Copyright 1998, with permission from Elsevier. 

CCVD combustion chemical vapor deposition MOCVD mettil-organic-assisted CVD PECVD plasma-enhanced CVD FACVD flame-assisted CVD AACVD aerosol-assisted CVD ESAVD electrostatic-atomization CVD LPCVD low-pressure CVD APCVD atmospheric-pressure CVD PACVD photo-assisted CVD TACVD thermtil-activated CVD EVD electrochemical vapor deposition RTCVD rapid thermal CVD UHVCVD ultrahigh-vacuum CVD ALE atomic-layer epitaxy PICVD pulsed-injection CVD... 

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