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Thin passivating

Secondly, crystal defects might be expected to affect the corrosion behaviour of metals which owe their corrosion resistance to the presence of thin passive or thick protective films on their surface. The crystal defects and structural features discussed in Section 20.4 might, in principle, be expected to affect the thickness, strength, adhesion, porosity, composition, solubility, etc. of these surface films, and hence, in turn, the corrosion behaviour of the filmed metal surfaces. Clearly, this is the more common situation in practice. [Pg.36]

Metals which owe their good corrosion resistance to the presence of thin, passive or protective surface films may be susceptible to pitting attack when the surface film breaks down locally and does not reform. Thus stainless steels, mild steels, aluminium alloys, and nickel and copper-base alloys (as well as many other less common alloys) may all be susceptible to pitting attack under certain environmental conditions, and pitting corrosion provides an excellent example of the way in which crystal defects of various kinds can affect the integrity of surface films and hence corrosion behaviour. [Pg.49]

Tin Free Steel—Electrolytic Chromium-Coated. A less expensive substitute for tinplate, electrolytic chromium coated-steel, has been developed and is designated TFS-CT (tin free steel-chromium type) or TFS-CCO (tin free steel-chromium-chromium oxide) (19). This material can be used for many products where the cathodic protection usually supplied by tin is not needed. A schematic cross section is shown in Figure 2. Electrolytic, chromium-coated steel is made by electro-lytically depositing a thin layer of metallic chromium on the basic tin mill steel, which is in turn covered by a thin passive coherent layer of chromium oxide. [Pg.11]

The hrst mechanism specihcally for tungsten CMP was proposed by Kaufman et al. [67]. They thought, first, chemical action dissolves W and forms a very thin passivating him which stops growth as soon as it reaches a thickness of one or a few moleculars later. Second, the him is removed locally by the mechanical action of abrasive particles, which contact with the protrude parts of the wafer surface, and then cause material loss. In recent years, most of the analysis and models for metal CMP are built based on the Kaufman model [68,69]. However, the model is not involved in microscopic structure analysis for the polished surface, but focuses on interpreting macroscopic phenomena happening during CMP [18]. [Pg.251]

Aqueous electrolytes of high pH etch silicon even at open circuit potential (OCP) conditions. The etch rate can be enhanced or decreased by application of anodic or cathodic potentials respectively, as discussed in Section 4.5. The use of electrolytes of high pH in electrochemical applications is limited and mainly in the field of etch-stop techniques. At low pH silicon is quite inert because under anodic potentials a thin passivating oxide film is formed. This oxide film can only be dissolved if HF is present. The dissolution rate of bulk Si in HF at OCP, however, is negligible and an anodic bias is required for dissolution. These special properties of HF account for its prominent position among all electrolytes for silicon. Because most of the electrochemistry reported in the following chapters refers to HF electrolytes, they will be discussed in detail. [Pg.7]

The measurement of potentials in electrolytes is not as easy as it is for solid-state devices. Depending on the composition of the electrolyte and the electrode material a monolayer of adsorbates or a thin passivation layer may be formed on the electrode, and can significantly shift the electrode potential. These effects have to be taken into account for the working as well as for the counter electrode. The potential at the latter becomes irrelevant if a reference electrode is used. The reference electrode should be placed as close as possible to the Si electrode or it can access the Si electrode via a capillary. The size of the reference electrode is not rel-... [Pg.12]

In the active state, the dissolution of metals proceeds through the anodic transfer of metal ions across the compact electric double layer at the interface between the bare metal and the aqueous solution. In the passive state, the formation of a thin passive oxide film causes the interfadal structure to change from a simple metal/solution interface to a three-phase structure composed of the metal/fUm interface, a thin film layer, and the film/solution interface [Sato, 1976, 1990]. The rate of metal dissolution in the passive state, then, is controlled by the transfer rate of metal ions across the film/solution interface (the dissolution rate of a passive semiconductor oxide film) this rate is a function of the potential across the film/solution interface. Since the potential across the film/solution interface is constant in the stationary state of the passive oxide film (in the state of band edge level pinning), the rate of the film dissolution is independent of the electrode potential in the range of potential of the passive state. In the transpassive state, however, the potential across the film/solution interface becomes dependent on the electrode potential (in the state of Fermi level pinning), and the dissolution of the thin transpassive film depends on the electrode potential as described in Sec. 11.4.2. [Pg.382]

The passive film is composed of metal oxides which can be semiconductors or insulators. Then, the electron levels in the passive film are characterized by the conduction and valence bands. Here, we need to examine whether the band model can apply to a thin passive oxide film whose thickness is in the range of nanometers. The passive film has a two-dimensional periodic lattice structure on... [Pg.383]

Almost all metallic materials in practical environments perform their service in the state of spontaneous passivation, in which hydrated oxygen moleciiles or hydrogen ions act as oxidants to passivate the surfaces. Stainless steel is a good and widely known example of corrosion resistant metals it is spontaneously passivated and remains in the passive state with a thin passive oxide film even in fairly corrosive environments. [Pg.389]

In addition to examining the structure and growth of thin passivating oxide films, the process of film reduction and breakdown promises to be a fruitful area of research. Some preliminary results involving SECM as well as STM have been published [257,270,271]. [Pg.264]

Transmission electron microscope ( ) images of such n-Al powders indicate the presence of a thin passivation layer of aluminum oxide (A1203) which provides stability to it in the air. Without this layer, A1 nanoparticles would be pyrophoric and also have tendency to agglomerate to form bulk A1 metal. In order to protect this n-Al powder further, some researchers have suggested its coating with self-assembled nanolayers using perfluoroalkyl carboxylic acid [90]. [Pg.395]

If, however, a thin passivating MeO film covers the surface, stochastic nucleation of active sites for the permeation of H and hydride formation occurs. Such a process can be described phenomenologically as outlined in Section 6.2.3 by... [Pg.384]

This boundary condition might apply for solute absorption with its rate moderated by some thin passive surface layer. Note that the surface concentration at x = 0 must be a function of time to maintain the constant-flux condition (see Fig. 5.7). [Pg.112]

Although the existence of very thin passive layers was first established by means of elhpsometry (Tronstad, 1933 Reddy, 1964), until 1973 there was no understanding... [Pg.208]

The poly-(2-vinyl pyridine) is present in the cathode to solubilize the iodine via a complexation facilitating its diffusion. On fabrication, the cathode sheet, an iodine complex in a mixture with excess elemental iodine, is pressed against the Li metal anode. On contact a thin passivating, but Li-ion conductive, film of Lil is formed. It fails to grow further until the circuit is closed. Because the conductiv-... [Pg.454]

Rust of iron (the most abundant corrosion product), and white rust of zinc are examples of nonprotective oxides. Aluminum and magnesium oxides are more protective than iron and zinc oxides. Patina on copper is protective in certain atmospheres. Stainless steels are passivated and protected, especially in chloride-free aqueous environments due to a very thin passive film of Cr2C>3 on the surface of the steel. Most films having low porosities can control the corrosion rate by diffusion of reactants through the him. In certain cases of uniform general corrosion of metals in acids (e.g., aluminum in hydrochloric acid or iron in reducible acids or alkalis), a thin him of oxide is present on the metal surface. These reactions cannot be considered hlm-free although the him is not a rate-determining one.1... [Pg.333]

It is very likely that the anodic process in the very thin passive films is of the same nature as that postulated in the Mott-Cabrera theory. Although the exact nature of the films responsible for passivity is still a controversial subject (591, there does appear to be ample evidence that the film is very thin (in the range 10-200 A ), comoact, and non-porous (18,57, 58, 59,60,61,62). [Pg.347]

After cooling and by virtue of their shape, these hillocks form singularities where stress concentrations will encourage cracking and then flaking of any brittle thin passivation film after it has been deposited on the aluminum (Figure 5). [Pg.49]

In several cases of interest in photoconversion devices, the species D or A to be oxidised or reduced at the electrode is not in close contact with the electrode surface, but deliberately separated from it by a short distance. The separator may be, for example, a thin passivating film, a molecular spacer layer or an electron-transporting bridge B in an electrode-B-A or electrode-B-D assembly such as a self-assembled monolayer (SAM). [Pg.260]

The electrochemical oxidation of the nickel is of special interest since it is a typical passivation metal in which very thin passive oxide films of a few nm thickness on the surface can cover the substrate metals efficiently. The passive oxide layer on the nickel was studied by Sikora and Mac Donald [118] who claimed that the passive film consisted of the inner nickel oxide of a barrier layer and an outer Ni(OH)2 porous or hydrated layer, in which the inner layer behaves as a p-type oxide with a cation vacancy. Oblonsky and Devine measured the surface enhanced Raman spectra of the nickel passivized in a neutral borate solution and estimated the amorphous Ni(OH)2 in the passive potential region and the NiOOH in the higher transpassive region [119]. Further, the passive films formed in the acidic and neutral solutions were assumed as partially hydrated nickel oxide [120,121]. The anodic film formed in the alkaline solution was assumed to be Ni(OH)2 in the... [Pg.281]

It is worth noting that, as far as they are less than several nanometers thick, the passive films are subject to the quantum mechanical tunneling of electrons. Electron transfer at passive metal electrodes, hence, easily occurs no matter whether the passive film is an insulator or a semiconductor. By contrast, no ionic tunneling is expected to occur across the passive film even if it is extremely thin. The thin passive film is thus a barrier to the ionic transfer but not to the electronic transfer. Redox reactions involving only electron transfer are therefore allowed to occur at passive film-covered metal electrodes just like at metal electrodes with no surface film. It is also noticed, as mentioned earlier, that the interface between the passive film and the solution is equivalent to the interface between the solid metal oxide and the solution, and hence that the interfacial potential is independent of the electrode potential of the passive metal as long as the interface is in the state of band edge pinning. [Pg.563]

A relatively simple method is to dissolve out the chloride ions by immersion in a suitable solvent. Water has been used with the water being changed every month until no further chlorides are detected. This can take up to 5 years for marine artefacts with high levels of chloride buried within deep rust layers. Moreover, the metal will continue to corrode, while the artefact is immersed in the water for this length of time. By altering the pH of the solution it may be possible to dissolve out the chlorides without corroding the metal. This is achieved by forming a thin, passive film approximately 10 nm ( 10 9m) thick... [Pg.139]

Multiwall carbon nanotube (MWCNT)-reinforced hydroxyapatite composite coatings (80% HAp/20% MWCNT) were deposited on austenitic stainless steel AISI 316L by laser surface alloying (LSA) with a 2.5-kW CW Nd YAG laser (Kwok, 2007). EIS of unprotected AISI 316L and HAp/MWCNT-coated steel obtained at open circuit potential are shown in Figure 7.60 after immersion in 0.9% NaCl solution for 2 h. The Bode plot shows that the total impedance Z has noticeably increased for the steel substrate coated with HAp/MWCNT. While the thin passive oxide film on the stainless steel surface was rendered less protective... [Pg.391]

In many of the alloy systems shovm in Table 1/ the stable configuration of the alloy surface is that it is filmed. Many of the alloys, e.g., stainless steels, Al, Ti, Zr and Mg alloys are only usable in such a condition. Such a consideration applies not only to these alloys covered with a thin passive film but also to those on which relatively thick films are formed. The possible mechcUiisms by which stress corrosion cracking occurs are concerned with reactions between unfilmed metal and the environment. Before consideration of these it is necessary to consider how these various types of film break down initially. While many of the alloys exhibit pitting, it is not necessary for pitting as such to precede crack propagation. Pitting is associated with static unstressed metals whereas cracking is associated with a metal whose surface is stressed. [Pg.334]

Corrosion of Aluminum in Neutral and Alkaline Solutions In neutral non-complexing solutions, aluminum is resistant against corrosion. In Na2S04 - solutions, the dissolution current is very low and in the order of 0.1 pA cm . The resistance is attributed to the formation of the thin passive layer, which has a low conductivity (see above) [33, 34], therefore the cathodic partial reaction of the corrosion is... [Pg.92]


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