Schematic cross section

Figure Bl.7.14. Schematic cross-sectional diagram of a quadnipole ion trap mass spectrometer. The distance between the two endcap electrodes is 2zq, while the radius of the ring electrode is (reproduced with pennission of Professor R March, Trent University, Peterborough, ON, Canada).

Figure C2.16.9. Schematic cross-section and biasing of a metai-oxide-semiconductor transistor. A unifonn conducting channei is induced between source (S) and drain (D) for > V. Voitage is appiied between the gate (G) and the source. Part (A) shows the channei for - V the transistor acts as a triode. The source-...

Fig. 4. Schematic cross section and the band diagram of a double heterostmcture showing the band-edge discontinuities, AE and AE used to confine carriers to the smaller band gap active layer, (a) Without and (b) with forward bias. See text.

Fig. 12. Schematic cross section of SX-70 integral lihii uniL. l lic lihii is exposed Llirough die clear upper sheet. When the reagent from the pod is spread, it forms a white pigmented layer. The image formed in the image-receiving layer is viewed against the refiective pigment layer (5).

Fig. 13. Schematic cross section of Time-Zero SX-70 integral film. In this film the polymeric acid layer and the timing layer are located beneath the negative layers, rather than in the positive sheet. Time-Zero and all later Polaroid integral films have an antireflection layer coated on the outer surface of the clear...

Fig. 14. Schematic cross section of Spectra integral film. The 600 Plus film has a similar stmcture. In these films the yellow image is formed by silver-assisted cleavage of a yellow dye releaser. A colorless developer reduces exposed silver hahde in the blue-sensitive emulsion in unexposed areas dissolved silver diffuses to the dye releaser layer and triggers the release of the yellow image dye.

Fig. 15. Schematic cross section of Kodak PR-10 integral film. This film is exposed through the transparent covet sheet, and the color image is formed by...

Fig. 16. Schematic cross sections of (a) Fuji FI-800 integral color film and (b) Fuji FP-lOO peel-apart instant color film (5).

Fuji Peel-Apart Film FP-100. In 1984 Fuji introduced FP-lOO, a peel-apart instant color film rated at ISO 100. The FP-lOO system uses a dye-release process similar to that used in the Fuji integral films. Figure 16b is a schematic cross section of FP-100, and Figure 11b (on the colored plate) is a micrograph of the unprocessed film in cross section. The negative stmcture includes a spacer layer between the red-sensitive layer and the cyan dye-releaser layer that it controls, similar to that shown in the FI-800 stmcture, but there are no spacers between the other emulsions and corresponding dye-releaser layers. 

Fig. 17. Schematic cross section of Agfachrome-Speed film. During processing of this single-sheet film, dyes released by reduction in unexposed areas diffuse from layers of the negative to the image-receiving layer to form the positive color image (5).

Fig. 18. Schematic cross sections of Copycolor negative and receiving sheet. During processing dyes are released by reduction in the unexposed areas. Dyes...

Fig. 26.5. A schematic cross-section through a typical layered bearing shell.

The CHA is shown in schematic cross-section in Fig. 2.5 [2.5]. Two hemispheres of radii ri (inner) and T2 (outer) are positioned concentrically. Potentials -Vi and -V2 are applied to the inner and outer hemispheres, respectively, with V2 greater than Vi. The source S and the focus E are in the same plane as the center of curvature, and Tq is the radius of the equipotential surface between the hemispheres. If electrons of energy E = eVo are injected at S along the equipotential surface, they will be focused at Eif ... 

Figure 15-18. Schematic cross-section of a bilayer device fabricated from MEH-PPV and...

Figure 1. Schematic cross section of 55 2CR tinplate ( 25 tin coating)...

Tin Free Steel—Electrolytic Chromium-Coated. A less expensive substitute for tinplate, electrolytic chromium coated-steel, has been developed and is designated TFS-CT (tin free steel-chromium type) or TFS-CCO (tin free steel-chromium-chromium oxide) (19). This material can be used for many products where the cathodic protection usually supplied by tin is not needed. A schematic cross section is shown in Figure 2. Electrolytic, chromium-coated steel is made by electro-lytically depositing a thin layer of metallic chromium on the basic tin mill steel, which is in turn covered by a thin passive coherent layer of chromium oxide. 

Tin Free Steel—Can-Maker s Quality. CMQ (can-maker s quality) steel is the basic tin mill product. CMQ can be either single or double reduced steel. Rolling oils are removed, and the surface may or may not be passivated. A schematic cross section of passivated CMQ is shown in Figure 3. QAR (quality as rolled) 2CR plate is the basic 2CR tin mill product with the rolling oils on the surface. No further treatment is given. Figure 4 is a schematic cross section of QAR plate. 

Figure 3. Schematic cross section Figure 4. Schematic cross section...

A schematic, cross-sectional drawing of a four-pass, packaged horizontal FT boiler (looking from the front) is shown in Figure 2.1. 

FIG. 72. Schematic cross-section of (a) a single junction p-i-n o-Si H superstrata solar cell and (b) a tandem solar cell structure. (From R. E. I, Schropp and M. Zeman. "Amorphous and Microcrystalline Silicon Solar Cells—Modeling, Materials and Device Technology," Kluwer Academic Publishers, Boston, 1998, with permission.)... 

A schematic cross-section of a p-i-n a-Si H solar cell [11] is shown in Figure 72a. In this so-called superstrate configuration (the light is incident from above), the material onto which the solar cell structure is deposited, usually glass, also serves as a window to the cell. In a substrate configuration the carrier onto which the solar cell structure is deposited forms the back side of the solar cell. The carrier usually is stainless steel, but flexible materials such as metal-coated polymer foil (e.g. polyimid) ora very thin metal make the whole structure flexible [11]. 

The most common a-Si H TFT structure is the so-called inverted staggered transistor structure [40], in which silicon nitride is used as the gate insulator. A schematic cross section is shown in Figure 74. The structure comprises an a-Si H channel, a gate dielectric (SiN.v), and source, drain, and gate contacts. 

FIG. 74. Schematic cross section of an inverted staggered TFT structure. 

Figure 4.1 Schematic cross-section of a centrifugal contact-separator (light gray = light phase, dark gray = heavy phase, striped = mixed phase).

Fig. 2.9.9 (a) Schematic cross section of a compartments at the top and bottom, respec-convection cell in Rayleigh-Benard configura- tively. (b) Velocity contour plot of typical tion. In the version examined in Refs. [8, 44], a convection rolls expected in the absence of any fluid filled porous model object of section flow obstacles (numerical simulation). 

Fig. 4. Schematic cross section of the Northwestern flow gas cell. Fe(CO)5 enters through the center port, Ar purge gas through ports by the windows. [Reproduced with permission from Ouderkirk et al. (75).]...

A schematic cross-section of one type of photomultiplier tube is shown in Figure 26. The photomultiplier is a vacuum tube with a glass envelope containing a photocathode and a series of electrodes called dynodes. Light from a scintillation phosphor liberates electrons from the photocathode by the photoelectric effect. These electrons are not of sufficient number or energy to be detected reliably by conventional electronics. However, in the photomultiplier tube, they are attracted by a voltage drop of about 50 volts to the nearest dynode. 

FIGURE 4.14 Schematic cross-section of the platform for in-vitro intracellular recording of ion concentration, designed for hepatocyte cell culture (a) and ESEM pictures of a micropipette (tilted at 75°) filled with the membrane cocktail. (From [102].)... 

Figure 5. Schematic cross section of the cave of Lachaise-de-Vouthon, Charente, France, showing the relation between dated travertine layers and the artifact- and...

Figure 3.38 shows a schematic cross-sectional view of the Galaxy, indicating the main stellar population groups (disk, bulge, halo and solar cylinder) that will figure in subsequent discussions and Table 7.9 gives some relevant statistics. 

Fig. 13.10 (a) Tapered optical fiber. p0 is the initial diameter, inset schematic cross section of the device p is the waist diameter, L0 is the length of the waist, t is the maximum thickness of the palladium film (shadowed area) and X is radiation wavelength, (b) Time response of the sensor to periodic cycles from a pure nitrogen atmosphere to a mixture of 3.9% hydrogen in nitrogen, (c) Time response of a sensor when it was exposed to different hydrogen concentrations, (d) Transmission versus hydrogen concentration sensor parameters p 1,300 nm, L 2 mm, and t 4 nm. Reprinted from Ref. 15 with permission. 2008 Optical Society of America... 

Figure 4.26 Schematic cross-section (left) of a multilayer coating used in the longterm protection of a mosaic. The mosaic was originally gilded therefore, a tiny gold foil is inserted into each tessera. Professor E. Bescher (right) brushing the mosaic with the sol-gel paint. (Photo courtesy of UCLA Daily Bruin). (Reproduced from ref. 23, with permission.)...

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