Microchip-embedded capacitors

Single or multiple layers of TiAlOx, AI2O3, TiA10x/Al203, and T1O2/AI2O3 were synthesized by magnetron sputter-deposition techniques, and more recently by atomic layer (ALD) deposition (see details of oxide layer synthesis in the ehapter Microchip-Embedded Capacitors for Implantable Neural Stimulators). 

Microchip-Embedded Capacitors for Implantable Neural Stimulators... 

Design and Process Considerations for Oxide FUms for Microchip-Embedded Capacitors 332... 

Characterization of Oxide Eilms for Microchip Embedded Capacitors. 338... 

Challenges for Oxide Films as High-K Dielectric Films for Microchip-Embedded Capacitors... 

This book. Implantable Neural Prostheses 2 Techniques and Engineering Approaches, is part two of a two-volume sequence that describes state-of-the-art advances in techniques associated with implantable neural prosthetic devices. The techniques covered include biocompatibility and biostability, hermetic packaging, electrochemical techniques for neural stimulation applications, novel electrode materials and testing, thin-film flexible microelectrode arrays, in situ characterization of microelectrode arrays, chip-size thin-film device encapsulation, microchip-embedded capacitors and microelectronics for recording, stimulation, and wireless telemetry. The design process in the development of medical devices is also discussed. 

Fig. 3 Next-generation CMOS devices need a breakthrough in high-K films. TiAlOx or Ti02/Al203 superlattice layers push the research frontier to enable the next-generation CMOS devices and embedded energy-storage capacitors for implantable microchips...

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