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Annealing, thermal

Fig. 1.48. Results of annealing (thermal treatment) on the formation of ice in a 60 % fructose solution (1) and in a 60 % glucose solution (2). Fig. 1.48. Results of annealing (thermal treatment) on the formation of ice in a 60 % fructose solution (1) and in a 60 % glucose solution (2).
Fig. 1.48.1. Results of annealing (thermal treatment) on the formation of ice in (1) 60% fructose and (2) 60% glucose solution. (A) After cooling at 30 °C/min to -100 °C the DSC plots were recorded during rewarming at 5 °C/min.Tg—85 and-88 °C, respectively. At = 48 and-44 °C, respectively, ice crystallization clearly starts, followed by the beginning of melting of ice (during freezing only part of the water has been crystallized). (B) After cooling... Fig. 1.48.1. Results of annealing (thermal treatment) on the formation of ice in (1) 60% fructose and (2) 60% glucose solution. (A) After cooling at 30 °C/min to -100 °C the DSC plots were recorded during rewarming at 5 °C/min.Tg—85 and-88 °C, respectively. At = 48 and-44 °C, respectively, ice crystallization clearly starts, followed by the beginning of melting of ice (during freezing only part of the water has been crystallized). (B) After cooling...
SEM images of a nanotubular nickel oxide DG obtained after thermal annealing based on the KirkendaU effect is shown in Fig. 6.6. The extent of void formation driven by the KirkendaU effect can be controlled by the elective dissolution of the template before thermal annealing. Thermal annealing performed on template-freed samples led to an unhindered expansion of the Ni struts which is based on the NKE with pronounced nanotube formation (Fig. 6.6b). In contrast, the expansion of the oxidizing Ni struts as well as the extent of nanotube void formation is constrained (Fig. 6.6c). The following discussion focuses on nanotubular NiO with pronounced void formation. The nanotubular array can be considered as a core-shell double-gyroid which was discussed in Sect. 2.6. [Pg.127]

Figure 4.126 illustrates that the reversing glass transition measurement is almost independent of the annealing (thermal) history. The still little-explored, small differences are an indication of the changes in relaxation kinetics on annealing of glasses. The corresponding nonreversing components are shown in Fig. 4.127. They permit the quantitative characterization of the thermal history of the glass as mentioned above, the differences, however, between the curves of Fig. 4.126 are not considered in this separation. Figure 4.126 illustrates that the reversing glass transition measurement is almost independent of the annealing (thermal) history. The still little-explored, small differences are an indication of the changes in relaxation kinetics on annealing of glasses. The corresponding nonreversing components are shown in Fig. 4.127. They permit the quantitative characterization of the thermal history of the glass as mentioned above, the differences, however, between the curves of Fig. 4.126 are not considered in this separation.
She] Induction melting, chemical analysis, annealing, thermal analysis. X-ray diffraction < 7 mass% C, < 40 mass% W... [Pg.497]

Annealing (thermal or radiational) after irradiation alters chemical form distribution of recoil products. This usually increases the yield of the parent chemical form (retention). Some features specific to solid matrices affect the recoil product distribution crystal structures, defects introduced into crystals, etc., play important roles in determining chemical fates of recoil atoms. [Pg.1362]

Kong J, Fab X, Xie Y, Qiao W (2004) Study on molecular chain heterogeneity of linear low-density polyethylene by cross-fractionation of temperature rising elution fractionation and successive self-nucleation/annealing thermal fractionation. J Appl Polym Sci 94 1710-1718... [Pg.267]

Annealing Thermal treatment to remove stress from glassware... [Pg.395]

Even if it seems more reasonable to propose a linear decrease of D with x, diffusion in undoubtedly slower when increasing crystalline ratio. Hence, D are expected to be slower in annealed (thermally treated below melting temperature) than in melted (thermally treated below melting temperature) UHMWPE, in agreement with the observed changes in crystalline ratio [94]. [Pg.69]

Ldlerud K P and Kofstad P, Oxidation of annealed, thermally etched chromium at 800-1100°C JEIectrochem Soc, 1980 127 2397-2410. [Pg.638]


See other pages where Annealing, thermal is mentioned: [Pg.268]    [Pg.26]    [Pg.33]    [Pg.130]    [Pg.48]    [Pg.394]    [Pg.253]    [Pg.397]    [Pg.221]    [Pg.67]    [Pg.67]    [Pg.3]    [Pg.129]    [Pg.392]    [Pg.468]    [Pg.391]    [Pg.1364]    [Pg.315]    [Pg.486]    [Pg.523]    [Pg.198]    [Pg.280]   
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See also in sourсe #XX -- [ Pg.133 ]

See also in sourсe #XX -- [ Pg.181 , Pg.182 , Pg.338 , Pg.340 , Pg.341 ]

See also in sourсe #XX -- [ Pg.69 ]




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