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Radical surface

The modihcation of polymer surfaces by graft copolymerization of a monomer or monomers from active sites has been reported in numerous references [165-169]. The most common techniques are y- and EB radiations, which generate surface radicals. Monomers can be present in gas phase (sublimed solid), in solution or as neat liquid. [Pg.871]

Since BaTi40g and Na2TieOi3 have a pentagonal prism tunnel and a rectangular tunnel structure, respectively, we have paid attention to the role of the tunnel structures in photocatalysis. A barium titanate, Ba4Tii303o, in a series of Ba-Ti titanates was chosen as a representative with non-tunnel structure, and we have compared the photocatalytic activity and the ability for the production of surface radical species with uv irradiation between the tunnel and the non-tunnel titanates. [Pg.144]

In the first part of the reaction scheme (Eq. 30) the generation (g) of holes (h ) in the valence band and of the surface radical S is described. The holes can also be consumed by recombination with electrons (rate v J or by direct hole transfer to the redox system (v, i). The surface radical can react with an electron from the conduction band (v ,2) or with the redox system (v, 2), processes by which the radical disappears. Accordingly, the original bond is repaired as illustrated in Fig. 7b. [Pg.94]

Can STM throw light on whether homogeneous gas-phase and heterogeneous surface reactions encompass a common theme - the participants of surface radicals in a two-dimensional gas ... [Pg.5]

The participation of surface radical species is, then, strongly suspected in the Kotbe reaction, but there are other radical reactions, such as the reductive dimerisation of C02, that are thought to be homogeneous, particularly in non-aqueous solvents. The basic mechanism in this latter case is thought to be ... [Pg.30]

The absolute determination of coverage is much more difficult. The formalism is well known, i.e., it is possible to go from the intensity of a spectral ion to the concentration material on the surface, but this can only be worked out if the transition dipole moment is known. A very rough order of magnitude version of this can, however, usually be obtained by analogy (rather than by quantum mechanical calculation) so that somewhat better than an order of magnitude calculation of the coverage of the surface radicals can be given. [Pg.367]

The principle of surface activation is to generate free radicals on the surface of the wood this then provides bonding sites on the wood surfaces for resin-free board production. The use of biological systems to generate surface radicals will be considered later, this section being concerned with the use of chemical systems for surface activation. [Pg.142]

As shown in Fig. 9-7, removing a pair of electrons from the covalent bonding orbital proceeds via an intermediate surface radical, S, as indicated in Eqn. 9-24 [Gerischer-Mindt, 1968] ... [Pg.298]

Fig. 9-7. Ionization of surface at oms followed by ion tnnsfer across an electrode interface in anodic dissolution of covalent semiconductor S = covalently bonded atom in semiconductor S. = surface atom of semiconductor s = surface radical = surfisce ion 825 = hydrated ion OHP = outer Helmholtz plane. Fig. 9-7. Ionization of surface at oms followed by ion tnnsfer across an electrode interface in anodic dissolution of covalent semiconductor S = covalently bonded atom in semiconductor S. = surface atom of semiconductor s = surface radical = surfisce ion 825 = hydrated ion OHP = outer Helmholtz plane.
For the two different steps of the ionization of surface radicals, Eqns. 9-24c and 9-24d, which follow the radical formation, the activation energy also differs as shown in Eqn. 9-30 ... [Pg.301]

The same disciission may apply to the anodic dissolution of semiconductor electrodes of covalently bonded compounds such as gallium arsenide. In general, covalent compoimd semiconductors contain varying ionic polarity, in which the component atoms of positive polarity re likely to become surface cations and the component atoms of negative polarity are likely to become surface radicals. For such compound semiconductors in anodic dissolution, the valence band mechanism predominates over the conduction band mechanism with increasing band gap and increasing polarity of the compounds. [Pg.305]

Whatever the initial step of formation of surface silyl radicals, the mechanism for the oxidation of silicon surfaces by O2 is expected to be similar to the proposed Scheme 8.10. This proposal is also in agreement with the various spectroscopic measurements that provided evidence for a peroxyl radical species on the surface of silicon [53] during thermal oxidation (see also references cited in [50]). The reaction being a surface radical chain oxidation, it is obvious that temperature, efficiency of radical initiation, surface precursor and oxygen concentration will play important roles in the acceleration of the surface oxidation and outcome of oxidation. [Pg.208]

The role of the catalyst consists in producing such surface radicals. They... [Pg.217]

At the polymer surface radicals are lost by reactions involving gaseous atomic hydrogen, gas phase free radicals, and adsorbed free radicals. The rate of surface termination can be expressed as... [Pg.52]

Diffusion into the electrode. If the surface radical is H, there may be diffusion into the electrode and this may cause a change in the character of the surface and the atoms immediately beneath it. Hence, for surface-catalyzed reactions on real surfaces, finding the steady state in the i—t curve at constant potential may show complexities (Fig. 7.44). Where is the steady state in Fig. 7.44(b) It becomes a matter of judgment The best plan is to take the first time-invariant section and to reject the further variations, which simply indicate a nonconstant surface.44... [Pg.404]

Then, another reason for the decline of the current may be buildup of intermediate-surface radicals that diminish the available surface area of the electrode by a time-dependent factor. It is erroneous (in respect to the majority of electrochemical reactions) to assume that the electrode surface remains unchanged during the reaction. What starts out with 0( 0 may end with 0( -1. The factor (1 - 0() may enter into the control of the... [Pg.699]

This very short treatment of reversal techniques has the following basis. There are certainly treatments in the literature of chronopotentiometiy dealing with current reversal, or reversed-step voltammetry. However, their validity has to be diligently examined in each application. For example, is an assumption of a first-order reaction tacitly involved, when the actual solution may correspond to a fractional reaction order Another reason for the limited treatment has an eye on the future. There are those who see in the rapid development of in situ spectroscopic techniques (see, e.g., Section 6.3), together with advances in STM and AFM, the future of surface analysis in electrochemistry. If these surface spectroscopic techniques continue to grow in power, and give information on surface radicals in time ranges as short as milliseconds, transient techniques to catch intermediate radicals adsorbed on surfaces may become less needed. [Pg.700]

How Bonding of Surface Radicals to the Electrode Produces Electrocatalysis... [Pg.767]

It has recently been reported that radical bond breakage may be initiated by carbon black of high surface area. The conversion of a model coal compound, 4-( I-naphthyl-methyl) bibenzyl was accelerated at 375°C without hydrogen pressure in either the presence or absence of hydrogen donors (41, 42). This suggests that polarity or surface radical content of carbon black may initiate the decomposition of phenyl-methylnaphthyl linkages. [Pg.56]


See other pages where Radical surface is mentioned: [Pg.693]    [Pg.543]    [Pg.160]    [Pg.172]    [Pg.173]    [Pg.174]    [Pg.176]    [Pg.93]    [Pg.201]    [Pg.27]    [Pg.359]    [Pg.299]    [Pg.300]    [Pg.119]    [Pg.213]    [Pg.213]    [Pg.216]    [Pg.217]    [Pg.67]    [Pg.83]    [Pg.543]    [Pg.291]    [Pg.280]    [Pg.284]    [Pg.286]    [Pg.307]    [Pg.557]    [Pg.214]   
See also in sourсe #XX -- [ Pg.383 ]




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Alkyl radical with silicon surface

Allylic radical, molecular orbital spin density surface

Atom transfer radical polymerization (ATRP surface initiated

Benzylic radical, resonance spin-density surface

Carbon electrodes surface radical states

Emission of alkyl radicals from disordered selenium surface

Free Radicals on the Surface

Grafting from polymer surfaces controlled radical polymerization

Grafting from polymer surfaces free radical polymerization

Molecular dynamics radical-surface interactions

Polymers surface radicals containing

Potential energy surface methyl radical transition state

Probing radical reorientation dynamics on surfaces and in solids

Radical Chemistry on Silicon Surfaces

Radical and Photochemical Reactions on Diamond Surfaces

Radical fracture surfaces

Radical ions surface adsorption

Radical potential energy surfaces

Radical singlet, potential energy surfaces

Radical surface reaction

Radical-anions, metal surface

Radical-surface interactions

Radical-surface interactions analysis

Radical-surface interactions deposition

Radical-surface interactions growth

Radical-surface interactions plasma

Radical-surface interactions radicals

Radical-surface interactions silicon

Radical-surface interactions species

Reactions Involving Radicals, Electron-Deficient Species, Reducing Agents, and at Surfaces

Spin density surface, allylic radical

Surface Analysis Using Neutral Radicals as Probe Molecules

Surface radical chain oxidation

Surface stabilized radicals

Surface-Initiated Living Radical Polymerization

Surface-initiated atom transfer radical polymerization

Surface-initiated atom transfer radical polymerization method

Surface-initiated atom-transfer radical

Surface-initiated controlled radical polymerization

Surface-located radical reactions

Triplet radical pair potential energy surfaces

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