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Radicals adsorbed

The foregoing shows that the presence of very small amounts of radicals on electrodes can be observed by ESR. This naturally raises the question of [Pg.394]

FIGURE 29. The spin label used by Hill and coworkers for the preparation of their spin-labeled electrode and the resulting potential-dependent ESR spectra. [Pg.395]

Carrington and A. D. McLachlan, Introduction to Magnetic Resonance, Chapman and Hall, London (1979). [Pg.396]

Kastening, J. Divicek, and B. Costica-Mihelcic, Faraday Disc. Chem. Soc. 56, 341 (1973). [Pg.397]

Robinson, in Electrochemistry Royal Society of Chemistry Specialist Periodical Reports (D. Pletcher, ed.), Vol. 9, p. 156, Royal Society of Chemistry, London (1984). [Pg.397]


Carboxylates, which are chiral in the a-position totally lose their optical activity in mixed Kolbe electrolyses [93, 94]. This racemization supports either a free radical or its fast dynamic desorption-adsorption at the electrode. A clearer distinction can be made by looking at the diastereoselectivity of the coupling reaction. Adsorbed radicals should be stabilized and thus react via a more product like transition state... [Pg.98]

The enhanced adsorption of anions and other substances that occurs at increasingly positive potentials causes a gradual displacement of water (or other solvent) molecules from the electrolyte layer next to the electrode. This leads to a markedly slower increase in the rate of oxygen evolution from water molecules and facilitates a further change of potential in the positive direction. As a result, conditions arise that are favorable for reactions involving the adsorbed species themselves (Fig. 15.9). In particular, adsorbed anions are discharged forming adsorbed radicals ... [Pg.288]

First, let us point out that as it has been mentioned in review [63] the formation of adsorbed radicals of O2 is observed only in the course of the process of reoxidation of the surface of initially reduced oxides. During subsequent adsorption of O2 oxygen radicals are not formed until oxide gets initially reduced again. [Pg.122]

Expression (2.100) is valid either at K" > K ", i.e. at weak manifestation of the process of recombination of chemisorbed radicals with respect to their annihilation as reaction of the first order, or on the contrary when K " > K" but in the case of either very small concentrations of radicals in volume Ny < (K") / K (2K" - K") = Ny2 or already at very high concentration Ny >2 (2K " - K") / K = Ny. Obviously that both these cases guarantee the predominant development of the process of annihilation of adsorbed radicals as reaction of the first order. [Pg.153]

Annihilation of adsorbed radicals on the surface of semiconductor adsorbent results in increase in electric conductivity of the latter due to making the metal atom available with its subsequent ionization ... [Pg.153]

The study [39] shows that similar equation is valid for adsorption of NH- and NH2-radicaIs, too. There are a lot of experimental data lending support to the validity of the proposed two-phase scheme of free radical chemisorbtion on semiconductor oxides. It is worth noting that the stationary concentration of free radicals during the experiments conducted was around 10 to 10 particles per 1 cm of gas volume, i.e. the number of particle incident on 1 cm of adsorbent surface was only 10 per second. Regarding the number of collisions of molecules of initial substance, it was around 10 for experiments with acetone photolysis or pyrolysis provided that acetone vapour pressure was 0,1 to 0,01 Torr. Thus, adsorbed radicals easily interact at moderate temperatures not only with each other but also with molecules which reduces the stationary concentration of adsorbed radicals to an even greater extent. As we know now [45] this concentration is established due to the competition between the adsorption of radicals and their interaction with each other as well as with molecules of initial substance in the adsorbed layer (ketones, hydrazines, etc.). [Pg.204]

The results obtained in above experiments confirm the removal of chemisorbed particles in the process of immersion of the film with preliminary chemisorbed radicals in a liquid acetone. Note that at low pressures of acetone, the CHa-radicals absorbed on ZnO film could be removed only by heating the film to the temperature of 200 - 250°C. Moreover, if the film with adsorbed radicals is immersed in a nonpolar liquid (hexane, benzene, dioxane), or vapours of such a liquid are condensed on the surface of the film, then the effect of removal of chemisorbed radicals does not take place, as is seen from the absence of variation of electric conductivity of the ZnO film after it is immersed in liquid and methyl radicals are adsorbed anew onto its surface. We explain the null effect in this case by suggesting that the radicals adsorbed on the surface of the ZnO film in the first experiment remained intact after immersion in a nonpolar liquid and blocked all surface activity of the adsorbent (zinc oxide). [Pg.266]

If heating of amorphous selenium with absorbed ethyl radicals is conducted in presence of nitrogen or inert gas with pressure 100 Torr no signal is picked up from the sensor. This implies that in this case the signals of the sensor are controlled by adsorption of ethyl radicals on its surface. Consequently, the heating of amorphous selenium with adsorbed radicals and resulted crystallization lead to emission of radicals. [Pg.370]

Fig. 6.10. The dependence of electric conductivity of the selenium film with adsorbed radicals as a function of temperature (/) at the rate of change of electric conductivity of sensor (2). Fig. 6.10. The dependence of electric conductivity of the selenium film with adsorbed radicals as a function of temperature (/) at the rate of change of electric conductivity of sensor (2).
The results of Table 1 show clearly that electronation of nitrocumene (39) (Scheme 15) does compete with reaction with chemisorbed hydrogen, M(H), at some stage in the electrohydrogenation process. The simplest interpretation is a direct competition between electronation of the nitro compound (eq. [7]) and reaction of the adsorbed nitro compound with chemisorbed hydrogen, M(H) (eq. [13]). However, it is quite possible that the electronation of the adsorbed nitro compound (eq. [20]) could be faster than its reaction with M(H) (eq. [13]) and the competition would then be between the cleavage of the adsorbed radical anion (eq. [21]) and its reaction with M(H) (eq. [22]). [Pg.15]

The spectra of both the adsorbed radical cation and radical anion have been reported for phenanzine(III) (95) adsorbed on silica-alumina and... [Pg.307]

Here, RH denotes the reducing agent, which yields the adsorbed radical species R and atomic H upon adsorption and dissociation the electron derived from the oxidation step (eqn. (18)) goes towards metal ion reduction. [Pg.236]

It is therefore possible that the initial fate of ZnCH3 in the static system work is dimerization. Under the conditions used diffusion to the surface can compete successfully with reaction (2) so formation of an intermediate dimer could be either a homogeneous or a heterogeneous process. By elimination, the two hydrogen atoms required to convert the dimer to 2 Zn+2 CH4 must come from dimethyl zinc itself and must leave a product that does not undergo subsequent decomposition. It is possible that this occurs via a cyclic intermediate, with adsorbed dimethyl zinc leaving surface-adsorbed radicals which may undergo polymerization, viz. [Pg.213]

As was suggested in a previous paper dthe steady state etching of solid material by exposure to gas phase particles with or without a plasma is usually described by the following sequence of steps (1) nondissociative adsorption of gas phase species at the surface of the solid being etched (2) dissociation of this absorbed gas (i.e., dissociative chemisorption) (3) reaction between adsorbed radicals and the solid surface to form an adsorbed product molecule, e.g., SiF fads) (4) desorption of the product molecule into the gas phase and (5) the removal of nonreactive residue (e.g., carbon) from the surface. [Pg.104]

The adsorbed cationic species are next transformed to the adsorbed radical species by the electron transfer. Finally, the Mg deposition may occur via the adsorbed radicals that disproportionate laterally on the electrode surface to form Mg metal and solution species, as represented, for example, by equations 35 ". [Pg.251]

The study of the kinetics of exchange reactions has focused attention on the way in which the surface concentrations of various kinds of adsorbed radicals depend on the pressure of the reacting gases. Let us consider a situation where the adsorption of all species is weak i.e., the extent of the surface is large compared with the fraction covered by adsorbed species. We shall assume that the strength of the adsorption is constant, which will be true for small variations in surface coverages. It is well known that, under these conditions, the fraction of the surface covered by hydrogen... [Pg.231]

It must be stressed that Equation (22) is one example of a general equation from which initial distributions of products can be calculated for the exchange of a great variety of compounds with appropriate assumed mechanisms. Cases where more than two kinds of adsorbed radicals are involved can also be covered, but this necessarily involves the introduction of further parameters. [Pg.239]

A widespread phenomenon in chemical catalysis is the volcano. One finds that for a given reaction carried out on a variety of catalysts, one is able to plot the rates on each catalyst so that they pass through a maximum. As to what is plotted on the abscissae, this varies, but it is always a function involving some property of the catalyst, e.g., its heat of sublimation (which would be proportional to its metal-metal bond strength), or the actual bond strength of the catalyst material and an adsorbed radical taking part in the rds, or the interatomic distance among the surface atoms. The... [Pg.567]

Here the intermediate product, I, is an adsorbed radical. It may have great difficulty in going on to B (i.e., k+l is small) or it may rapidly go to B (k+l is latge). In the first case, current reversal reproduces A in the second case, there is no 1 to send back to A. One can see that at least some knowledge about I can be obtained from a current reversal experiment. [Pg.700]

The first difficulty involves steady state. In this book, it has been stressed that fundamental electrochemistry is not limited to simple redox reactions with no adsorbed radical intermediates, and that we must accept the indisputable fact that most electrode reactions involve intermediates, and their concentration depends not only on the electrode potential but also on time during the potential sweep. Thus, unless the surface concentration of the intermediates is negligible or their relaxation times much faster than those of the sweep rate, the steady-state value of 0j, 02, etc. (of the various adsorbed radicals) may not be felt by the current registered in the sweep. However, when one writes a reaction sequence ... [Pg.718]

Such objections do not apply to a redox-type situation (Fe + e = Fe ) and for which there are no radical intermediates. They apply only in a muted form when the cyclic voltammetric method is used in some kind of analysis of the content of the solution. However, they do apply to mechanism studies of electrochemical reactions involving intermediates as adsorbed radicals, and that means that they apply to mosl electrochemical reactions. [Pg.720]

We conclude that oxidative transformations of organic substrates can be readily understood as emanating from either photogenerated surface adsorbed radical cations or from radicals formed by activated oxygen radicals (surface oxides or adsorbed hydroxy, hydroperoxy or peroxy radicals). Photoelectrochemical methods not only generate the reactive species by interfacial electron transfer, but also control the subsequent activity of the surface adsorbed intermediate. [Pg.90]

A Stern-Volmer plot obtained in the presence of donors for the stilbene isomerization has both curved and linear components. Two minimal mechanistic schemes were proposed to explain this unforeseen complexity they differ as to whether the adsorption of the quencher on the surface competes with that of the reactant or whether each species has a preferred site and is adsorbed independently. In either mechanism, quenching of a surface adsorbed radical cation by a quencher in solution is required In an analogous study on ZnS with simple alkenes, high turnover numbers were observed at active sites where trapped holes derived from surface states (sulfur radicals from zinc vacancies or interstitial sulfur) play a decisive role... [Pg.93]

Thus, as with the oxidative cleavages, a clear role for surface-adsorbed radical cations is implicated in the observed geometrical isomerizations. [Pg.93]


See other pages where Radicals adsorbed is mentioned: [Pg.115]    [Pg.21]    [Pg.97]    [Pg.116]    [Pg.148]    [Pg.149]    [Pg.203]    [Pg.266]    [Pg.41]    [Pg.271]    [Pg.131]    [Pg.209]    [Pg.9]    [Pg.252]    [Pg.107]    [Pg.236]    [Pg.241]    [Pg.243]    [Pg.245]    [Pg.255]    [Pg.308]    [Pg.34]    [Pg.558]    [Pg.690]    [Pg.786]    [Pg.814]    [Pg.153]   
See also in sourсe #XX -- [ Pg.98 ]




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