Substrate materials physical properties

High demands are placed on the substrate material of disk-shaped optical data storage devices regarding the optical, physical, chemical, mechanical, and thermal properties. In addition to these physical parameters, they have to meet special requirements regarding optical purity of the material, processing characteristics, and especially in mass production, economic characteristics (costs, processing). The question of recyclabiUty must also be tackled. 

The properties of leather-like materials depend on the polymer used for substrate and coating layer. Feel, hand, and resistance to grain break are affected by the constmction. The polymers and constmctions of leather-like materials are shown in Table 1. Physical properties of leather and leather-like materials are shown in Table 2. 

Functional polyethylene waxes provide both the physical properties obtained by the high molecular weight polyethylene wax and the chemical properties of an oxidised product, or one derived from a fatty alcohol or acid. The functional groups improve adhesion to polar substrates, compatibHity with polar materials, and dispersibHity into water. Uses include additives for inks and coatings, pigment dispersions, plastics, cosmetics, toners, and adhesives. 

Vinyl neodecanoate [26544-09-2] is prepared by the reaction of neodecanoic acid and acetjiene in the presence of a catalyst such as zinc neodecanoate. Physical properties of the commercially available material, VeoVa 10 from Shell, are given in Table 4. The material is a mobile Hquid with a typical mild ester odor used in a number of areas, primarily in coatings, but also in constmction, adhesives, cosmetics, and a number of misceUaneous areas. Copolymerization of vinyl neodecanoate with vinyl acetate gives coating materials with exceUent performance on alkaline substrates and in exterior weathering conditions. 

The energy densities of laser beams which are conventionally used in the production of thin films is about 10 — 10 Jcm s and a typical subsU ate in the semiconductor industry is a material having a low drermal conductivity, and drerefore dre radiation which is absorbed by dre substrate is retained near to dre surface. Table 2.8 shows dre relevant physical properties of some typical substrate materials, which can be used in dre solution of Fourier s equation given above as a first approximation to dre real situation. 

The application of any coating process may affect the physical or mechanical properties of the substrate material and any such effects should be considered when choosing the type of coating to be used and its method of application. 

The surface forces apparatus (SEA) can measure the interaction forces between two surfaces through a liquid [10,11]. The SEA consists of two curved, molecularly smooth mica surfaces made from sheets with a thickness of a few micrometers. These sheets are glued to quartz cylindrical lenses ( 10-mm radius of curvature) and mounted with then-axes perpendicular to each other. The distance is measured by a Fabry-Perot optical technique using multiple beam interference fringes. The distance resolution is 1-2 A and the force sensitivity is about 10 nN. With the SEA many fundamental interactions between surfaces in aqueous solutions and nonaqueous liquids have been identified and quantified. These include the van der Waals and electrostatic double-layer forces, oscillatory forces, repulsive hydration forces, attractive hydrophobic forces, steric interactions involving polymeric systems, and capillary and adhesion forces. Although cleaved mica is the most commonly used substrate material in the SEA, it can also be coated with thin films of materials with different chemical and physical properties [12]. 

The composition and functionality of the systems greatly vary according to the substrate material to be coated, as they demand different curing conditions, adapted physical properties and characteristics as well as functionality for better wetting and adhesion. Dyes, pigments... 

The organic materials must evaporate without decomposing during the fabrication process. The typical deposition temperature range is between 150 and 450°C. Factors that contribute to the ultimate temperature used in addition to the physical properties of the material include the vacuum pressure, source to substrate geometry, and required deposition rate. 

To rationalize the isothermal assumption, Dykhuizen 39() discussed two related physical phenomena. First, heat may be drawn out of the substrate from an area that is much larger than that covered by asplat. Thus, the 1 -D assumption in the Stefan problem becomes invalid, and a solution of multidimensional heat conduction may make the interface between a splat and substrate closer to isothermal. Second, the contact resistance at the interface is deemed to be the largest thermal resistance retarding heat removal from the splat. If this resistance does not vary much with substrate material, splat solidification should be independent of substrate thermal properties. Either of the phenomena would result in a heat-transfer rate that is less dependent on the substrate properties, but not as high as that calculated by Madej ski based on the... 

Dielectric spectroscopy, also known as impedance spectroscopy, has been used for process analysis for some time, as it offers the ability to measure bulk physical properties of materials. It is advantageous to other spectroscopic techniques in that it is not an optical spectroscopy and is a noncontact technique, allowing for measurement without disturbing a sample or process. The penetration depth of dielectric spectroscopy can be adjusted by changing the separation between the sensor electrodes, enabling measurement through other materials to reach the substrate of interest. Because it measures the dielectric properties of materials, it can provide information not attainable from vibrational spectroscopy. 

Developments in modern CVD allow to improve the deposition of thin films and bulky coatings nevertheless, an additional major issue remains the building of nanostructured materials such as ultra-thin films or dispersed nanoparticles. For these applications, the control of the deposit at the atomic or nano-scale level is essential. Consequently, the role of surface chemistry occurring between the CVD precursor and the substrate, as well as the gas-phase main physical properties have to be indisputably clarified. 

Particles produced in the gas phase must be trapped in condensed media, such as on solid substrates or in liquids, in order to accumulate, stock, and handle them. The surface of newly formed metallic fine particles is very active and is impossible to keep clean in an ambient condition, including gold. The surface must be stabilized by virtue of appropriate surface stabilizers or passivated with controlled surface chemical reaction or protected by inert materials. Low-temperature technique is also applied to depress surface activity. Many nanoparticles are stabilized in a solid matrix such as an inert gas at cryogenic temperature. At the laboratory scale, there are many reports on physical properties of nanometer-sized metallic particles measured at low temperature. However, we have difficulty in handling particles if they are in a solid matrix or on a solid substrate, especially at cryogenic temperature. On the other hand, a dispersion system in fluids is good for handling, characterization, and advanced treatment of particles if the particles are stabilized. 

Resolution Methods. Chiral pharmaceuticals of high enantiomeric purity may be produced by resolution methodologies, asymmetric synthesis, or the use of commercially available optically pure starting materials. Resolution refers to the separation of a racemic mixture. Classical resolutions involve the construction of a diastcrcomcr by reaction of the racemic substrate with an enantiomerically pure compound. The two diastereomers formed possess different physical properties and may be separated by crystallization, chromatography, or distillation. A disadvantage of the use of resolutions is that the best yield obtainable is. 50%, which is rarely approached. However, the yield may he improved by repeated raccmization of the undcsired enantiomer and subsequent resolution of the racemate. Resolutions are commonly used in industrial preparations of homochiral compounds. 

Chemical and physical vapor deposition technique has been widely applied for the preparation of such photocatalytic thin films. Since these vapor methods need an instrumental setup which enables control of temperature and pressure, their initial and running costs are generally high and the size of substrate is limited. Spray method, in which titanium alkoxide and water is sprayed on a substrate heated at a desired temperature, affords Ti02 thin films.69) However, like the sol-gel route, the physical properties and photocatalytic activity of Ti02 strongly depend on many factors such as temperature of substrate, flow rate of carrier gas, and partial pressure of starting material in the system. 

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