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Plasma processing

In this section, the wide diversity of teclmiques used to explore ion chemistry and ion structure will be outlined and a sampling of the applications of ion chemistry will be given in studies of lamps, lasers, plasma processing, ionospheres and interstellar clouds. [Pg.798]

The deposition of amoriDhous hydrogenated silicon (a-Si H) from a silane plasma doped witli diborane (B2 Hg) or phosphine (PH ) to produce p-type or n-type silicon is important in tlie semiconductor industry. The plasma process produces films witli a much lower defect density in comparison witli deposition by sputtering or evaporation. [Pg.2806]

Estimates for a number of economic aspects of plasma fractionation can be made (200—206). The world capacity for plasma fractionation exceeded 20,000 t of plasma in 1990 and has increased by about 75% since 1980, with strong growth in the not-for-profit sector (Fig. 4). The quantity of plasma processed in 1993 was about 17,000 t/yr the commercial sector accounts for about 70% of this, with over 8000 t/yr in the form of source plasma from paid donors (Fig. 5). Plant capacities and throughput are usually quoted in terms of principal products, such as albumin and Factor VIII. These figures may not encompass manufacture of other products. [Pg.533]

A considerable amount of carbon is formed in the reactor in an arc process, but this can be gready reduced by using an auxiUary gas as a heat carrier. Hydrogen is a most suitable vehicle because of its abiUty to dissociate into very mobile reactive atoms. This type of processing is referred to as a plasma process and it has been developed to industrial scale, eg, the Hoechst WLP process. A very important feature of a plasma process is its abiUty to produce acetylene from heavy feedstocks (even from cmde oil), without the excessive carbon formation of a straight arc process. The speed of mixing plasma and feedstock is critical (6). [Pg.386]

Table 7. Characteristic Data of Electric Plasma Processes ... Table 7. Characteristic Data of Electric Plasma Processes ...
Hydrogen plasma process using naphtha. Case A secondary injection of naphtha Case B radial injection of the naphtha feed. Hydrogen plasma process using cmde oil. [Pg.386]

Table 8. Operational Results of the Hbls Plasma Process in the Cracking of Light Hydrocarbons, ... Table 8. Operational Results of the Hbls Plasma Process in the Cracking of Light Hydrocarbons, ...
Fig. 4. Examples of emission spectrometry as a diagnostic monitoring tool for plasma processing, (a) The removal of chlorine contamination from copper diode leads using a hydrogen—nitrogen plasma. Emissions are added together from several wavelengths, (b) The etching and eventual removal of a 50-p.m thick polyimide layer from an aluminum substrate, where (x ) and (° ) correspond to wavelengths (519.82 and 561.02 nm, respectively) for molecular CO2... Fig. 4. Examples of emission spectrometry as a diagnostic monitoring tool for plasma processing, (a) The removal of chlorine contamination from copper diode leads using a hydrogen—nitrogen plasma. Emissions are added together from several wavelengths, (b) The etching and eventual removal of a 50-p.m thick polyimide layer from an aluminum substrate, where (x ) and (° ) correspond to wavelengths (519.82 and 561.02 nm, respectively) for molecular CO2...
Fig. 7. Schematic of a self-contained plasma processing unit designed to continuously plasma-treat and impregnate with resin, reinforcing fibers for enhanced composite strength. The unit can also be used to plasma-treat wires to be coated or treated for improved adhesion. Throughput speeds of over... Fig. 7. Schematic of a self-contained plasma processing unit designed to continuously plasma-treat and impregnate with resin, reinforcing fibers for enhanced composite strength. The unit can also be used to plasma-treat wires to be coated or treated for improved adhesion. Throughput speeds of over...
J. L. Cecchi, ia S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood, eds.. Handbook of Plasma Processing Technology, Noyes PubHcations, Park Ridge,... [Pg.118]

H. J. Oskam, ed.. Plasma Processing of Materials, Noyes Data Corp., Park Ridge, N.J., 1985. [Pg.119]

J. W. Cobum, R. A. Gottscho, andD. W. Hess, eds.. Plasma Processing, Materials Research Society, Pittsburgh, Pa., 1986. [Pg.119]

Staff of Panel on Plasma Processing of Materials, United States Nation Research Council, Plasma Processing of Materials Scientific Opportunities and Technological Challenges, Books on Demand, Ann Arbor, Mich., 1994. [Pg.119]

G. S. Mathad and D. W. Hess, eds.. Proceedings of the International Symposium of Plasma Processing 10th, Electrochemical Society, Inc., Pennington, N.J.,... [Pg.119]

Plasma processing technologies ate used for surface treatments and coatings for plastics, elastomers, glasses, metals, ceramics, etc. Such treatments provide better wear characteristics, thermal stability, color, controlled electrical properties, lubricity, abrasion resistance, barrier properties, adhesion promotion, wettability, blood compatibility, and controlled light transmissivity. [Pg.434]

Fig. 1. Vacuum deposition system having a plasma processing capabiHty, where the dashed lines represent optional additions to a system. Fig. 1. Vacuum deposition system having a plasma processing capabiHty, where the dashed lines represent optional additions to a system.
Ti02/Na2C02/Na2AlF2/NaCl/Na2B40, at 1050°C (20). Very fine titanium diboride may be made by a gas-phase plasma process in which titanium tetrachloride and boron trichloride are reacted in a hydrogen gas heated by a d-c plasma (21). [Pg.117]

Gas plasma treatment operates at low pressure and relatively low temperature. While the corona treatment is applicable to substrates in sheet or film form, the gas plasma process can treat objects of virtually any shape. The gases most widely used to generate plasma by free-radical reactions include air, argon, helium, nitrogen, and oxygen. All these, with the exception of oxygen. [Pg.527]

When the films were treated in either an oxygen plasma environment or under UV/ozone irradiation, the rates of oxidation were faster for the plasma process. Irradiation of chitosan solution showed that UV/ozone induces depolymerization. In both plasma and UV/ozone reactions, the main active component for surface modification was UV irradiation at a wavelength below 360 nm [231]. [Pg.183]

HANDBOOKOF PLASMA PROCESSING TECHNOLOGY edited by Stephen M. Rossnagel, Jerome J. Cuomo, and William D. Westwood... [Pg.1]


See other pages where Plasma processing is mentioned: [Pg.2804]    [Pg.2937]    [Pg.98]    [Pg.104]    [Pg.109]    [Pg.839]    [Pg.846]    [Pg.130]    [Pg.175]    [Pg.218]    [Pg.246]    [Pg.531]    [Pg.386]    [Pg.400]    [Pg.54]    [Pg.115]    [Pg.115]    [Pg.115]    [Pg.116]    [Pg.45]    [Pg.45]    [Pg.45]    [Pg.52]    [Pg.319]    [Pg.525]    [Pg.529]    [Pg.510]    [Pg.420]   
See also in sourсe #XX -- [ Pg.67 , Pg.130 , Pg.132 , Pg.133 ]

See also in sourсe #XX -- [ Pg.67 , Pg.130 , Pg.132 , Pg.133 ]

See also in sourсe #XX -- [ Pg.398 , Pg.403 , Pg.404 , Pg.405 , Pg.406 ]




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AIN Ceramics from Nanosized Plasma Processed Powder, its Properties and Application

Ageing process plasma

Atmospheric pressure glow discharge plasma process

Atmospheric pressure plasma processes

Atomic and Molecular Processes in Reactive Plasmas

Atomic and Molecular Processes in Reactive Plasmas from Physicochemical Viewpoints

Blood plasma processing

Charged species, transport, plasma processes

Chemical vapor deposition plasma process

Cold plasma processing

Decomposition plasma processes

Degree Regimes of the CO2 Dissociation Process in Non-Thermal Plasma

Elimination processes plasma half-lives

Energy Efficiency of Plasma-Chemical Processes Stimulated by Electronic Excitation and Dissociative Attachment

Etch process, plasma-assisted

Etching plasma processes, description

Fluorine-based plasma processes

Functional Surface Properties by Plasma-Based Processes

Gas-Phase Plasma Decomposition Processes

Kinetics surface, plasma processes

Length scales, plasma processing

Low-temperature plasma process

Microelectronics processes, plasma

Modeling plasma processes

Modeling plasma processes assumptions

Models/modeling plasma processing

Modes into Plasma-Chemical Dissociation Process

Molecular dynamics plasma processing

Non-Equilibrium Discharge Conditions and Gas-Phase Plasma-Chemical Processes in the Systems Applied for Synthesis of Diamond Films

Plasma Formation and Collision Processes

Plasma collision processes

Plasma deposition process

Plasma development process

Plasma etch process

Plasma etching process

Plasma etching process considerations

Plasma fractionation processes

Plasma polymerization electrical discharge process

Plasma process

Plasma processes analog

Plasma processes effects

Plasma processes primary limitations

Plasma processing dynamics

Plasma processing molecular dynamics simulations

Plasma processing plasmas

Plasma processing plasmas

Plasma processing semiconductors

Plasma protein manufacturing processes

Plasma sample processing

Plasma separation enrichment process

Plasma separation process

Plasma spray process

Plasma spray processing

Plasma technologies processes

Plasma treatments coloration process

Plasma treatments finishing process

Plasma treatments for sustainable textile processing

Plasma treatments pretreatment process

Plasma-Arc process

Plasma-Chemical Processes for Final Fabric Treatment

Plasma-assisted reaction process

Plasma-catalysis processing

Plasma-developed resist process

Plasma-spray-coating process

Plasma-stimulated processes

Polymer processing plasma treatment

Process inductively coupled plasma atomic emission

Process plasma spectrometry

Processes Occurring in the Plasma after Introduction of a Sample

Processing methods plasma spraying

Production of AIN Ceramics from Nanosized Plasma Processed Powder

Properties of AIN Ceramics from Nanosized Plasma Processed Powder

Recognition, Evaluation and Control of Some Plasma Processing Hazards

Reducing plasma processes

Specific Plasma-Chemical Etching Processes

Sprayed coatings plasma process

Surface Chemical Processes of Diamond-Film Growth in Plasma

Surface Modification by Plasma-Based Processes

Surface modification process using plasma

Tetronic plasma process

Thin film deposition techniques/processing plasma polymerization

Thin film deposition techniques/processing plasma-enhanced chemical vapor

Transfer Phenomena Influence on Energy Efficiency of Plasma-Chemical Processes

Vacuum system, design plasma processing

Validation plasma fractionation processes

Zircon plasma processes

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