Plasma deposition process

In the plasma deposition process, siUcon tetrachloride vapor is passed through an induction-coupled plasma torch using a hydrogen-free oxygen... 

Henne R. Solid oxide fuel cells a challenge for plasma deposition processes. J. Therm. Spray Tech. 2007 16 381-403. 

Schiller G, Henne R, Lang M, and Muller M. Development of solid oxide fuel cells (SOFC) for stationary and mobile applications by applying plasma deposition processes. Mat. Sci. Forum 2003 3 2539-2544. 

Glow discharge or "cold" plasmas are gaining increased currency for the deposition of novel and potentially valuable macromolecular coatings. The range of properties attainable by a plasma-polymer is wide, and depends critically on such variables of the plasma deposition process as choice of monomer, substrate temperature (T ), power density (p), the excitation frequency (v), and others incluSing monomer flow rate, reactor geometry, etc... Control over these variables can produce crossllnked, dense deposits which adhere tenaciously to... 

Method D in Table 1 represents a case where dry support films were always used because of the need to employ a vacuum and because of the very nature of plasma deposition processes. Yasuda (12) showed that a wide variety of gas phase reactants could be used in this technique. Not only conventional vinyl monomers were used but also any organic compounds with adequate vapor pressure. Further, copolymers could be prepared by introduction of a second reactant such as nitrogen. Wydeven and coworkers (13,14) showed the utility of this method in preparing reverse osmosis membranes from an allylamine plasma. 

The optical fibers resulting from the plasma deposition process show no particularly different properties as regards attenuation between 600 nm and 1100 nm compared with those of fibers prepared by thermal means. Figure 18 shows a typical attenuation curve with the losses near the intrinsic limit. The water peak at about 950 nm corresponds to an impurity level of 1 ppm OH. 

Organic conductive films, e.g. polyaniline or polythiophene, have an interesting potential application due to their easy processability combined with a low weight. A plasma deposition process is even more interesting from a technical point of view, because it is, as opposed to wet chemistry, much more compatible with production processes in vacuum. The sample used was polymerized by Kruse et al. [454] on a silicon wafer over 20 min in a microwave plasma chamber at 2.45 GHz using 2-iodothiophene (at... 

LeComber (1975) showed that by suitable doping, a-Si could be made n- or p-type. These properties, in conjunction with the fact that plasma-deposition processes are generally amendable to large areas, were such that much of the early interest in a-Si was directed to photovoltaic applications (Carlson and Wronski, 1976 Kuwano. 1986). It was quickly recognized, however, that the requirements for photovoltaic applications were, in many respects, similar to those for xerographic photoreceptors. 

From Figure 11.6c it can also be noted that the internal stress in CAT polymers deceased with increasing VpMDSO monomer feed rate. In plasma deposition process, when the other plasma parameters are kept the same, the increase of monomer feed rate indicates that the same amount of energy input is consumed by a larger number of monomer molecules. In other words, when the other plasma parameters are kept constant, the increase of monomer feed rate will actually reduce the relative energy input in plasma polymerization process. 

The DC cathodic polymerization, 40-kHz (HF) and 13.5-MHz (RF) plasma polymerization of trimethylsilane (TMS) were compared in a bell jar type of reactor [1-3]. The bell jar has the dimensions of 635 mm height and 378 mm diameter. A pair of stainless steel plates (17.8 x 17.8 x 0.16cm) was placed inside the bell jar with spacing of 100 mm and used as parallel electrodes. The substrate used in the plasma deposition process was an aluminum alloy panel positioned in the midway between the two parallel electrodes. 

It should be pointed out that excellent primer adhesion was also obtained with TMS plasma polymers from a (TMS-bAr) mixture in a closed reactor system. This result indicated that, to achieve equally good primer adhesion, TMS polymerization with subsequent Ar plasma treatment could be replaced by one process of cathodic polymerization of a (TMS-bAr) mixture. Since the addition of argon to TMS can help stabilize the gas discharge, plasma polymerization of a (TMS + Ar) mixture is very important in the practical operation of plasma deposition process in conjunction with the industrial IVD process. Plasma polymerization of a mixture of TMS and argon in a closed system also has the advantage of being more... 

Ramalingam, S., Maroudas, D., and Aydil, E. S., Visualizing radical-surface interactions in plasma deposition processes Reactivity of SiHs radicals with Si surfaces. IEEE Trans. Plasma Sci. 27,104-105 (1999a). 

Vacuum arc plasma discharges are intense sources of dense metal plasma, and can be used to deposit metal alloy thin films of various kind including both conventional alloys as well as non—equilibrium alloys. In our approach, the basic plasma deposition process is combined with the ion bombardment the method is environmentally friendly, highly efficient, can be scaled up to large size, and can synthesize films of a wide range of materials[5—9], A metal plasma of the required species is formed by a vacuum arc plasma gun and directed towards the substrate with a moderate streaming energy, typically in order of 100 eV. At the same time, the substrate is... 

Plasma Deposition Processes Plasma-Enhanced Chemical Vapor Deposition... 

PLASMA DEPOSITION PROCESSES PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION AND SPUTTERING DEPOSITION... 

The important information for understanding plasma deposition processes is the knowledge of the energy of species bombarding surfaces (reactor walls, electrodes, substrates, etc.) adjacent to the plasma [14]. This may be assessed from the potential variation, which is shown in Fig. 5 for the case of a dc glow dischar deposition sys-... 

R. Henne, Solid Oxide Fuel Cells A Challenge for Plasma Deposition Processes, J. Therm. Spray Technoi, 16(3), 381-403 (2007). 

Randhawa H, Johnson PC (1987) A review of cathodic arc plasma deposition processes and their applications. Surf Coat Technol 31 303-318... 

Green, M.A. (2007). Thin-Film Solar Cells Review of Materials, Technologies and Commercial Status. /. Mater. Sci Mater. Electron., Vol. 18, pp. S15-S19 Green, M.A. Emery, K. Hishikawa, Y. Warta, W. (2011). Solar Cell Efficiency Tables (Version 37). Prog. Photovolt Res. AppL, Vol. 19, pp. 84-92 Henne, R. (2007). Solid Oxide Fuel Cells A Challenge for Plasma Deposition Processes.. Therm. Spray Techn., Vol. 16, pp. 381-403... 

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