Big Chemical Encyclopedia

Chemical substances, components, reactions, process design ...

Articles Figures Tables About

Plasma development process

Figure 22. Schematic plasma-development process showing exposure, fixing, and both negative and positive tone plasma development. (Reproduced by... Figure 22. Schematic plasma-development process showing exposure, fixing, and both negative and positive tone plasma development. (Reproduced by...
Figure 3.35. Negative plasma-development process via selective silylation of a positive-negative resist. Figure 3.35. Negative plasma-development process via selective silylation of a positive-negative resist.
History. Methods for the fractionation of plasma were developed as a contribution to the U.S. war effort in the 1940s (2). Following pubHcation of a seminal treatise on the physical chemistry of proteins (3), a research group was estabUshed which was subsequendy commissioned to develop a blood volume expander for the treatment of military casualties. Process methods were developed for the preparation of a stable, physiologically acceptable solution of alburnin [103218-45-7] the principal osmotic protein in blood. Eady preparations, derived from equine and bovine plasma, caused allergic reactions when tested in humans and were replaced by products obtained from human plasma (4). Process studies were stiU being carried out in the pilot-plant laboratory at Harvard in December 1941 when the small supply of experimental product was mshed to Hawaii to treat casualties at the U.S. naval base at Pead Harbor. On January 5, 1942 the decision was made to embark on large-scale manufacture at a number of U.S. pharmaceutical plants (4,5). [Pg.526]

Gases for mixing with argon, such as N2 and Xe, have been the subject of study for some time. Some new instrumentation tvill incorporate manifolds for making this process easier. Other plasma developments include microwave-induced plasmas with He to eliminate interferences from argon containing molecular species. [Pg.631]

For PK assays, it is generally believed that most matrix effects are due to the sample matrix (typically plasma). While this is correct in many cases, this assumption has some exceptions (vide infra). One of the most useful tools for avoiding matrix effects is studying the sample matrix and proposed assay by using the post-column infusion technique described by Bonfiglio et al.14S This technique allows visualization of the portion of the chromatographic step affected by ion suppression.161721 Xu et al.101 recommended inclusion of this step in the method development process for drug discovery PK assays. [Pg.220]

Schiller G, Henne R, Lang M, and Muller M. Development of solid oxide fuel cells (SOFC) for stationary and mobile applications by applying plasma deposition processes. Mat. Sci. Forum 2003 3 2539-2544. [Pg.281]

The interaction of neutrons with organic molecules occurs mainly through knock-on of protons. Thus, the radiation chemistry is similar to proton irradiation. Radiation chemistry by positive ions is of increasing importance on account of ion implantation technology, plasma development and deposition processes, and cosmic irradiation. [Pg.3]

In 1979, Smith and co-workers described the development of a system they called PDF (which presumably stands for Plasma Developable Photoresist) that is based on the use of a material, the structure of which has not yet been divulged 61). In this process the resist is coated in the usual fashion and exposed optically. The exposed film is then subjected to a baking cycle that produces a relief image of negative-tone that is, depressions are generated in unexposed areas (Figure 45). This relief structure is... [Pg.141]

Figure 44. A schematic representation of the plasma developed x-ray resist process. Exposure serves to covalenty bind the monomer (m) into the polymer matrix (p). Heating (fixing) drives out (volatilizes) the monomer except where it is "locked in place" by exposure. Plasma treatment converts the silicon to Si02 which retards the etch rate in the exposed areas through formation of a metallic oxide (MO) layer. Figure 44. A schematic representation of the plasma developed x-ray resist process. Exposure serves to covalenty bind the monomer (m) into the polymer matrix (p). Heating (fixing) drives out (volatilizes) the monomer except where it is "locked in place" by exposure. Plasma treatment converts the silicon to Si02 which retards the etch rate in the exposed areas through formation of a metallic oxide (MO) layer.
Figure 13. Schematic of plasma-developed resist film composed of polymer host (P) and volatile monomer (m). Processing steps are (a) exposure which locks monomer in place, (b) fixing which removes unlocked monomer, (c) plasma development. (Reproduced with permission from... Figure 13. Schematic of plasma-developed resist film composed of polymer host (P) and volatile monomer (m). Processing steps are (a) exposure which locks monomer in place, (b) fixing which removes unlocked monomer, (c) plasma development. (Reproduced with permission from...
Laser-induced breakdown spectroscopy Plasma generated by a laser pulse and detection of the emitted light (destruction of sample) X Drug development Process troubleshooting... [Pg.363]


See other pages where Plasma development process is mentioned: [Pg.160]    [Pg.160]    [Pg.499]    [Pg.264]    [Pg.501]    [Pg.773]    [Pg.493]    [Pg.318]    [Pg.76]    [Pg.123]    [Pg.147]    [Pg.295]    [Pg.289]    [Pg.402]    [Pg.142]    [Pg.204]    [Pg.210]    [Pg.246]    [Pg.88]    [Pg.877]    [Pg.954]    [Pg.163]    [Pg.499]    [Pg.732]    [Pg.43]    [Pg.54]    [Pg.85]    [Pg.92]    [Pg.106]    [Pg.109]    [Pg.111]    [Pg.517]    [Pg.219]    [Pg.458]    [Pg.358]    [Pg.359]   
See also in sourсe #XX -- [ Pg.160 ]




SEARCH



Plasma processing

Plasma processing plasmas

© 2024 chempedia.info