Big Chemical Encyclopedia

Chemical substances, components, reactions, process design ...

Articles Figures Tables About

Study of Thin Films

The importance of the thin film between the mineral particle and the air bubble has been discussed in a review by Pugh and Manev [74]. In this paper, modem studies of thin films via SFA and interferometry are discussed. These film effects come into play in the stability of foams and froths. Johansson and Pugh have studied the stability of a froth with particles. Small (30-/ m), moderately hydrophobic 6c = 65°) quartz particles stabilized a froth, while more hydrophobic particles destabilized it and larger particles had less influence [75]. [Pg.476]

The following two sections will focus on epitaxial growth from a surface science perspective with the aim of revealing the fundamentals of tliin-film growth. As will be discussed below, surface science studies of thin-film deposition have contributed greatly to an atomic-level understanding of nucleation and growth. [Pg.928]

Luthi R, Meyer E, Flaefke FI, Flowald L and Guntherodt Fl-J 1995 Nanotribology an UFIV-SFM study of thin films of AgBr(OOI) Tribol. Lett. 1 23... [Pg.1728]

The application of RBS is mostly limited to materials applications, where concentrations of elements are fairly high. RBS is specifically well suited to the study of thin film stmctures. The NMP is usefiil in studying lateral inliomogeneities in these layers [30] as, for example, in cases where the solid state reaction of elements in the surface layers occur at specific locations on the surfaces. Other aspects, such as lateral diffusion, can also be studied in tluee-dimensions. [Pg.1844]

Vanden Bout D A, Kerimo J, Higgins D A and Barbara P F 1997 Near-field optical studies of thin-film mesostructured organic materials Acc. Chem. Res. 30 204-12... [Pg.2510]

In another approach, which was previously mentioned, the mass thickness, or depth distribution of characteristic X-ray generation and the subsequent absorption are calculated using models developed from experimental data into a < )(p2) function. Secondary fluorescence is corrected using the same i flictors as in ZAP. The (pz) formulation is very flexible and allows for multiple boundary conditions to be included easily. It has been used successfully in the study of thin films on substrates and for multilayer thin films. [Pg.132]

A. Segmuller, I, C. Noyan, V. S. Speriosu. X-Ray Diffraction Studies of Thin Films and Multilayer Structures. Prog. Cryst. Growth and Charact. 18,21, 1989. [Pg.213]

Ellipsometry can be sensitive to layers of matter only one atom thick. For example, oxidation of freshly cleaved single-crystal graphite can be monitored from the first monolayer and up. The best thicknesses for the ellipsometric study of thin films are between about 1 nm and 1000 nm. Although the spectra become complicated, films thicker than even 1 pm can be studied. Flat planar materials are optimum, but surface and interfacial roughness can be quantitatively determined if the roughness scale is smaller than about 100 nm. Thus ellipsometry is ideal for the investigation of interfacial surfaces in optical coatings and semiconductor struc-... [Pg.402]

Chen ZM, Zabik MJ, Eeavitt RA. 1984. Comparative study of thin film photodegradation rates for 36 pesticides. Industrial and Engineering Chemistry Product Research and Development 23 5-11. [Pg.198]

Liquid lubricant confined in molecularly thin films would experience dramatic changes in its physical properties, such as increased viscosity, slow relaxation, and solidihcation. Progress in studies of thin film rheology has greatly improved our understanding of boundary lubrication, which is the subject to be discussed in this section and in the next. [Pg.83]

Gonbeau D, Guimon C, Pfister-Guillouzo G, Levasseur A, Meunier G, Dormoy R (1991) XPS study of thin films of titanium oxysulfides. Surface Sci 254 81-89... [Pg.346]

Surface path at low overpotential. Qualitative and quantitative analysis of impedance data, tracer studies, as well as various studies of thin-film electrodes suggest that under low-overpotential LSM operates primarily via a surface-mediated mechanism (like Pt). This conclusion appears to be consistent with the properties of LSM, which is fully oxygen stoichiometric under ambient Pq. However, little is known about how far the active region of reduction extends beyond the solid/solid interface (via surface diffusion) or the relative importance of chemical steps (on the LSM surface) vs electrochemical kinetics at the solid/solid interface. [Pg.586]

Boschloo GK, Goossens A, Schoonman J (1997) J Photoelectrochemical study of thin film of anatase Ti02 films prepared by metal organic chemical vapor deposition. J Electrochem Soc 144 1311-1317... [Pg.246]

Therefore, in UFIV (p < 10 mbar) the monolayer formation time is of the order of minutes to hours or longer and thus of the same length of time as that needed for experiments and processes in vacuum. The practical requirements that arise have become particularly significant in solid-state physics, such as for the study of thin films or electron tube technology. A UFIV system is different from the usual high vacuum system for the following reasons ... [Pg.65]

FTM and atom-probe studies of thin films of Ni, Au, Pt, a-Ge H, a-Si H and WO3, etc., on various substrates were reported by Krishna-swamy et a/.81 First, field ion tips each with a field evaporated surface were prepared. They are placed in an MRC model 8502 r.f. sputtering system. Tips were mounted on a recessed and shielded structure behind the sputtering surface which is bored with small holes about 1 to 2 mm in diameter. The very end of the tips came out of the holes to approximately the same level of the sputtering surface. Films were sputtered at about 20 mTorr Ar at an r.f. power of about 50 W. Thickness of a deposited thin film was controlled by both the r.f. power and the deposition time. Film thickness in the range of a few hundred to a few thousand A were studied. These tips were then imaged with Ne in the field ion microscope, or analyzed in the flight-time-focused ToF atom-probe. [Pg.201]

The primary techniques used in this study include X-ray photoelectron spectroscopy (XPS), reflection-absorption infrared spectroscopy (RAIR), and attenuated total reflectance infrared spectroscopy (ATR). XPS is the most surface-sensitive technique of the three. It provides quantitative information about the elemental composition of near-surface regions (< ca. 50 A sampling depth), but gives the least specific information about chemical structure. RAIR is restricted to the study of thin films on reflective substrates and is ideal for film thicknesses of the order of a few tens of angstroms. As a vibrational spectroscopy, it provides the type of structure-specific information that is difficult to obtain from XPS. The... [Pg.494]

A series of criteria that should be met before XPS can be fully applied to corrosion studies of thin films has been established by Castle (LI, 1 2). These criteria, when generalized to other surface science techniques, suggest four general areas or concerns (Table I) that should be addressed before a surface technique (or in fact any experimental technique) is applied to a corrosion problem. Although these concerns or questions seem very elementary, the specific problem and solutions they imply may be very difficult to sort out. In fact, in some cases, answers can not be obtained without testing or trying the method in similar or known conditions. [Pg.255]

A list of references is given below which will allow the reader to investigate any points of detail. A good place to start is the collection of papers in the March 2003 MRS Bulletin (Volume 28, issue 3), which provides a snapshot of some of the more recent work on hard materials. For a general study of thin films, try M. Ohring, The Materials Science of Thin Films, 1992, published by Harcourt Brace Jovanovich, Boston, MA. [Pg.237]

For many years, IRRAS has been successfully applied to the study of thin films adsorbates on metal surfaces [36], In the case of monolayers deposited on metal surfaces, an IR external reflection spectrum is obtained by reflecting the incoming radiation from the three-phase ambient-adsorbate-substrate system, measuring the reflected intensity as a function of wavelength, and then ratioing... [Pg.248]

The apparatus Im proven to be extremely useful for studies of thin films of viscous liquids and glassy and or ized solids over a wide range of temperatures, from 77 K to 577 K. With simple adaptors, the apparatus may be placed in a UV-IVIS spectrophotometer, a spectrofluorimeter and an IR spectrometer. It is small enough (200-300 g) to be carried in one hand. The apparatus for pyridinyl radicals is shown in Fig. 4 an elo trical thematic for the interferometer is given in Fig. 5. [Pg.125]


See other pages where Study of Thin Films is mentioned: [Pg.121]    [Pg.470]    [Pg.193]    [Pg.60]    [Pg.61]    [Pg.93]    [Pg.1]    [Pg.15]    [Pg.11]    [Pg.287]    [Pg.394]    [Pg.54]    [Pg.412]    [Pg.36]    [Pg.118]    [Pg.350]    [Pg.78]    [Pg.23]    [Pg.88]    [Pg.90]    [Pg.794]    [Pg.223]    [Pg.4745]    [Pg.181]    [Pg.198]    [Pg.592]    [Pg.121]    [Pg.370]    [Pg.154]    [Pg.324]   


SEARCH



Thin films, studies

© 2024 chempedia.info