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Silicon gallium

The thermal conductivity of diamond at 300 K is higher than that of any other material, and its thermal expansion coefficient at 300 K is 0.8 x 10". lower than that of Invar (an Fe-Ni alloy). Diamond is a very widc-band gap semiconductor Eg = 5.5 eV), has a high breakdown voltage (I07V cm-1), and its saturation velocity of 2.7 x I01 cm s-1 is considerably greater than that of silicon, gallium arsenide, or indium phosphide. [Pg.484]

Moderately doped diamond demonstrates almost ideal semiconductor behavior in inert background electrolytes (linear Mott -Schottky plots, photoelectrochemical properties (see below), etc.), which provides evidence for band edge pinning at the semiconductor surface. By comparison in redox electrolytes, a metal-like behavior is observed with the band edges unpinned at the surface. This phenomenon, although not yet fully understood, has been observed with numerous semiconductor electrodes (e.g. silicon, gallium arsenide, and others) [113], It must be associated with chemical interaction between semiconductor material and redox system, which results in a large and variable Helmholtz potential drop. [Pg.245]

Drawing a Conclusion The elements aluminnm, silicon, gallium, germanium, arsenic, selenium are all used in making various types of semiconductor devices. Write electron configurations and electron-dot structures for atoms of each of these elements. What similarities among the elements electron configurations do you notice ... [Pg.148]

Semiconductor - Any material that has a limited capacity for conducting an electric current. Certain semiconductors, including silicon, gallium arsenide, copper indium diselenide, and cadmium telluride, are uniquely suited to the photovoitaic conversion process. [Pg.408]

Substrates, Films are usually prepared on platinum or gold electrodes which are inert, but semiconducting materials including indium tin oxide, n-type polycrystalline silicon, gallium arsenide, cadmium sulphide and cadmium selenide, graphite [38, 59], and oxide covered metals [60] have also been used. In the majority of cases, the films are produced readily and the only serious limitations are the potential and the nucleophilic nature of the solution. [Pg.40]

The most striking property of water is that its solid form is less dense than its liquid form ice floats at the surface of liquid water (Figure 6.8). With a few exceptions, (for example, silicon, gallium, germanium, bismuth, and pure acetic acid), the density of almost all other substances is greater in the solid state than in the liquid state. To understand why water is different, we have to examine the electronic structure of the H2O molecule. As we saw in Chapters 2 and 3, there are two pairs of nonbonding electrons, or two lone pairs, on the oxygen atom ... [Pg.339]

This technology is quite similar to what happens in CVD processes, though here with this process if the substrate is an ordered semiconductor crystal (i.e. silicon, gallium arsenide), it is possible to keep on building on the substrate with the same crystallographic orientation with the substrate acting as a seed for the deposition. If an amorphous/polycrystalline substrate surface is used, the film will also be amorphous or polycrystalline. [Pg.219]

Transistor Three-terminal amplifier and on/ off switch made from a semiconductor, most frequently silicon but sometimes germanium, germanium-silicon, gallium arsenide, or silicon carbide. [Pg.1852]

Raw materials, silicon, gallium arsenide, etchants, dopants... [Pg.2]

Diamond has an excellent electron-carrier mobility exceeded only by germanium in the p-type and by gallium arsenide in the n-type. The saturated carrier velocity, that is, the velocity at which electrons move in high electric fields, is higher than silicon, gallium arsenide, or silicon carbide and, unlike other semiconductors, this velocity maintains its high rate in high-intensity fields as shown in Fig. 11.15. [Pg.270]

Several other nanoparticles have been studied because physical properties of the nanostructures differ from the bulk materials [5,6]. Metal nanoparticles such as ZnO and titanium dioxide (Ti02), for example, provide nanocomposites the attractive nonlinear properties that make them ideal candidates for nonlinear optical (NLO) based devices [5]. Porous system-based nanocomposites, including porous materials such as silicon, gallium phosphide, aluminum oxide, and structures based on them, were considered by Golovan et al. [6]. The main focus is on the effect of birefringence, which is caused by the anisotropy of pores in the materials. [Pg.148]

Of the approximately 20,000 tons of crystals produced annually the largest fraction consists of semiconductors such as silicon, gallium arsenide, indium phosphides, germanium, group-III nitrides, cadmium teUuride and cadmium mercury telluride. Other large fractions include optical and scintillator crystals and crystals for the watch and jewellery industries. [Pg.516]

Published information on characterization of seven different materials has been gathered from the literature to serve as a guide to the use of existing analytical techniques. These seven materials are copper, silicon, gallium arsenide, potassium chloride, zinc sulfide, anthracene, and trace element glasses. Collectively they represent an extremely broad spectrum of analytical problems and illustrate both strong and weak points in the application of the present state of the art of measurement of composition. [Pg.416]

On metal electrodes, the transfer coefficients typically approach 0.5. Generally, the transfer coefficients for redox reactions on moderately doped diamond electrodes are smaller than 0.5 their sum a +p, less than 1. We recall that an ideal semiconductor electrode must demonstrate a rectification effect in particular, on p-type semiconductors, reactions proceeding via the valence band have the transfer coefficients a = 0, P = 1, and thus, a +p = 1 [7]. Actually, the ideal behavior is rarely the case even with single crystal semiconductor materials manufactured by use of advanced technologies ( like germanium, silicon, gallium arsenide, etc.). The departure from the ideal semiconductor behavior is likely to be caused by the fact that the interfacial potential drop appears essentially localized, even in part, in the Helmholtz layer, due, e.g., to a high density of surface states, or the surface states directly participate in the electrochemical reactions. As a result, the transfer coefficients a and p have intermediate values, between those characteristic of semiconductors (O or 1) and metals (-0.5). Semiconductor diamond falls in with this peculiarity. However, for heavily doped electrodes, the redox reactions often proceed as reversible, and the transfer coefficients approach 0.5 ( metaMike behavior). [Pg.59]

While the spatial resolution of AES, XPS and SIMS continues to improve, atomic scale analysis can only be obtained by transmission electron microscopy (TEM), combined with energy dispersive X-ray spectroscopy (EDX) or electron energy loss spectroscopy (EELS). EDX detects X-rays characteristic of the elements present and EELS probes electrons which lose energy due to their interaction with the specimen. The energy losses are characteristic of both the elements present and their chemistry. Reflection high-energy electron diffraction (RHEED) provides information on surface slmcture and crystallinity. Further details of the principles of AES, XPS, SIMS and other techniques can be found in a recent publication [1]. This chapter includes the use of AES, XPS, SIMS, RHEED and TEM to study the composition of oxides on nickel, chromia and alumina formers, silicon, gallium arsenide, indium phosphide and indium aluminum phosphide. Details of the instrumentation can be found in previous reviews [2-4]. [Pg.60]


See other pages where Silicon gallium is mentioned: [Pg.362]    [Pg.393]    [Pg.218]    [Pg.390]    [Pg.268]    [Pg.127]    [Pg.100]    [Pg.42]    [Pg.268]    [Pg.261]    [Pg.662]    [Pg.562]    [Pg.1637]    [Pg.2201]    [Pg.226]    [Pg.698]    [Pg.324]    [Pg.232]    [Pg.282]    [Pg.284]    [Pg.89]    [Pg.5]    [Pg.13]    [Pg.230]    [Pg.223]    [Pg.59]    [Pg.457]    [Pg.85]    [Pg.149]   
See also in sourсe #XX -- [ Pg.259 ]




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Gallium nitride on silicon carbide

Gallium silicon compounds

Gallium silicon halides

Gallium-doped silicon

Gallium-silicon bonds, lengths

Gallium-silicon cluster

Silicon compared with gallium arsenide

Silicon gallium-carbon bonds

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