Polycrystalline silicon

Polycrystalline Silicon (Polysilicon). Polycrystalline silicon is used extensively in semiconductor devices. It is normally produced by the decomposition of silane at low pressure (ca. 1 Torr) as follows ... 

This reaction is irreversible. Epitaxial silicon is deposited. Polycrystalline silicon is obtained in the range of 610-630°C, which is close to the crystalline-amorphous transition temperature. 

Polysilicon is a contraction of polycrystalline silicon, (in contrast with the single-crystal epitaxial silicon). Like epitaxial silicon, polysilicon is also used extensively in the fabrication of IC s and is deposited by CVD.f l it is doped in the same manner as epitaxial silicon. Some applications of poly silicon films are ... 

Venkatesan, M., and Beinglass, I., Single-Wafer Deposition of Polycrystalline Silicon, Solid State Technology, pp. 49-53 (March 1993)... 

FIGURE 4.4 The production of polycrystalline silicon for the eleetronics industry involves several ehemieal steps aimed at the reduetion of impurities. These inelude (1) reaction of metallurgical grade silicon to produce a mixture of chlorosilanes, (2) distillation of trichlorosilane, and (3) reduction of trichlorosilane to polycrystalline silicon. Excerpted by special permission from Chemical Engineering, June 10, 1985. Copyright 1985 by McGraw-Hill, Inc., New York, NY 10020. 

Chemical vapor deposition is distinguished from physical vapor deposition processes by the use of a chemical reaction, usually a decomposition, to create the chemical species that is deposited. An example important to the microelectronics industry is the formation of polycrystalline silicon by the decomposition of silane ... 

Most important, reliable and no-regrettable measures are two move to renewable energies and energy saving/conservation. The concept of renewable energy is shown in Fig. 2. The trials of developments of new route to solar energies, for example production of polycrystalline silicon is important [9, 10]. The conversion of waste oil to fiiel has also been investigated [11]. The study on coal conversion is also developed to the biomass conversion study. 

Seager, C.H., and Ginley, D.S., (1982). Fundamental Studies of Grain Boundary Passivation in Polycrystalline Silicon with Application to Improved Photovoltaic Devices, Sandia Report, SAND82-1701, p. 19-21. 

K.F. Lee, T.J. Stultz, and James F. Gibbons, Beam Recrystallized Polycrystalline Silicon Properties, Applications, and Techniques... 

Schropp, R. E. I. Carius, R. Beaucarne, G. 2007. Amorphous silicon, microcrystalline and thin-film polycrystalline silicon solar cells. MRS Bull. 32 219-223. 

Kuo, Y. (Editor). 2004. Thin-Film Transistors Materials and Processes, Amorphous Silicon Thin-Film Transistors, Polycrystalline Silicon Thin Transistors. Kluwer, New York. 

Afentakis, T. Hatalis, M. Voutsas, A. T. Hartzell, J. 2006. Design and fabrication of high-performance polycrystalline silicon thin-film transistor circuits on flexible steel foils. IEEE Trans. Electron Dev. 53 815-822. 

Hara, A. Takei, M. Takeuchi, F. Suga, K. Yoshino, K. Chida, M. Kakehi, T. Ebiko, Y. Sano, Y. Sasaki, N. 2004. High performance low temperature polycrystalline silicon thin film transistors on non-alkaline glass produced using diode pumped solid state continuous wave laser lateral crystallization. Jpn. J. Appl. Phys., Pt. 1 43 1269-1276. 

In most microelectronics fabrication factories ( fabs ), LPCVD of polycrystalline silicon (poly-Si) is carried out by the decomposition silane... 

The chemistry of silicone halides was recently reviewed by Collins.13 The primary use for SiCU is in the manufacturing of fumed silica, but it is also used in the manufacture of polycrystalline silicon for the semiconductor industry. It is also commonly used in the synthesis of silicate esters. T richlorosilane (another important product of the reaction of silicon or silicon alloys with chlorine) is primarily used in the manufacture of semiconductor-grade silicon, and in the synthesis of organotrichlorosilane by the hydrosilylation reactions. The silicon halohydrides are particularly useful intermediate chemicals because of their ability to add to alkenes, allowing the production of a broad range of alkyl- and functional alkyltrihalosilanes. These alkylsilanes have important commercial value as monomers, and are also used in the production of silicon fluids and resins. On the other hand, trichlorosilane is a basic precursor to the synthesis of functional silsesquioxanes and other highly branched siloxane structures. 

T.J. McArdle, J.O. Chu, Y. Zhu, Z. Liu, M. Krishnan, C.M. Breslin, et al., Multilayer epitaxial graphene formed by pyrolysis of polycrystalline silicon-carbide grown on c-plane sapphire substrates, Applied Physics Letters, 98 (2011) 132108. 

Amorphous silicon can replace the expensive and more-efficient rigid monocrystalline and polycrystalline silicon sheets used in most common solar panels. Less efficient than crystalline silicon, it can be applied to a flexible plastic foil by Plasma Enhanced... 

C.I. Silicon and Poly silicon. The isotropic etching of silicon (Si) and polycrystalline silicon (Poly-Si) by atomic fluorine (F) is probably the most completely understood of all etch processes, particularly for the cases in which F atoms are produced in discharges of F2 (36) and CF4/O2 (42). Fluorine atoms etch (100) Si at a rate (A/min) given by (36) ... 

Examples are the deposition of polycrystalline silicon coatings in microelectronic circuit fabrication by reactions such as the decomposition of silane,... 

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