Big Chemical Encyclopedia

Chemical substances, components, reactions, process design ...

Articles Figures Tables About

Schematic technique

Fig. 5. Schematic technique to prepare ideal Si(l 11) surfaces, (a) Use of the crystal miscut (b) Use of Triton as additive. Fig. 5. Schematic technique to prepare ideal Si(l 11) surfaces, (a) Use of the crystal miscut (b) Use of Triton as additive.
The introduction of an integrator into circuits at lower frequencies is fimited by electronic parts leakage and op-amps offset. Also, the substantial variation of capacitors impedance over the passband in frequency-dependent circuits may impair the noise performance of a device. Therefore special schematic techniques and careful amplifier selection should be made in order to maintain the optimal noise performance of the integrator or differentiator stage. [Pg.952]

While field ion microscopy has provided an effective means to visualize surface atoms and adsorbates, field emission is the preferred technique for measurement of the energetic properties of the surface. The effect of an applied field on the rate of electron emission was described by Fowler and Nordheim [65] and is shown schematically in Fig. Vlll 5. In the absence of a field, a barrier corresponding to the thermionic work function, prevents electrons from escaping from the Fermi level. An applied field, reduces this barrier to 4> - F, where the potential V decreases linearly with distance according to V = xF. Quantum-mechanical tunneling is now possible through this finite barrier, and the solufion for an electron in a finite potential box gives... [Pg.300]

Figure B2.5.8. Schematic representation of laser-flash photolysis using the pump-probe technique. The beam splitter BS splits the pulse coming from the laser into a pump and a probe pulse. The pump pulse initiates a reaction in the sample, while the probe beam is diverted by several mirrors M tluough a variable delay line. Figure B2.5.8. Schematic representation of laser-flash photolysis using the pump-probe technique. The beam splitter BS splits the pulse coming from the laser into a pump and a probe pulse. The pump pulse initiates a reaction in the sample, while the probe beam is diverted by several mirrors M tluough a variable delay line.
Fig. 7. Schematic illustration of different photohthographic exposure techniques. Fig. 7. Schematic illustration of different photohthographic exposure techniques.
Fig. 3. Schematic configuration of (a) the 90° off-axis sputtering technique and (b) the system used to prepare multilayers. Fig. 3. Schematic configuration of (a) the 90° off-axis sputtering technique and (b) the system used to prepare multilayers.
Interfdci l Composite Membra.nes, A method of making asymmetric membranes involving interfacial polymerization was developed in the 1960s. This technique was used to produce reverse osmosis membranes with dramatically improved salt rejections and water fluxes compared to those prepared by the Loeb-Sourirajan process (28). In the interfacial polymerization method, an aqueous solution of a reactive prepolymer, such as polyamine, is first deposited in the pores of a microporous support membrane, typically a polysulfone ultrafUtration membrane. The amine-loaded support is then immersed in a water-immiscible solvent solution containing a reactant, for example, a diacid chloride in hexane. The amine and acid chloride then react at the interface of the two solutions to form a densely cross-linked, extremely thin membrane layer. This preparation method is shown schematically in Figure 15. The first membrane made was based on polyethylenimine cross-linked with toluene-2,4-diisocyanate (28). The process was later refined at FilmTec Corporation (29,30) and at UOP (31) in the United States, and at Nitto (32) in Japan. [Pg.68]

The AeroSizer, manufactured by Amherst Process Instmments Inc. (Hadley, Massachusetts), is equipped with a special device called the AeroDisperser for ensuring efficient dispersal of the powders to be inspected. The disperser and the measurement instmment are shown schematically in Figure 13. The aerosol particles to be characterized are sucked into the inspection zone which operates at a partial vacuum. As the air leaves the nozzle at near sonic velocities, the particles in the stream are accelerated across an inspection zone where they cross two laser beams. The time of flight between the two laser beams is used to deduce the size of the particles. The instmment is caUbrated with latex particles of known size. A stream of clean air confines the aerosol stream to the measurement zone. This technique is known as hydrodynamic focusing. A computer correlation estabUshes which peak in the second laser inspection matches the initiation of action from the first laser beam. The equipment can measure particles at a rate of 10,000/s. The output from the AeroSizer can either be displayed as a number count or a volume percentage count. [Pg.134]

Fig. 4. Schematic of the Closed Container Sampling technique used in the Baxter PARAMAX analy2er showing (a) the collection tube with bar-coded label being brought into sampling position under the caimula (b) the tube raised so that the caimula has penetrated the stopper (c) the sample sensing probe coming through the caimula to aspirate the exact volume required for each assay and (d) after sampling, where the tube is lowered away from the cannula. Fig. 4. Schematic of the Closed Container Sampling technique used in the Baxter PARAMAX analy2er showing (a) the collection tube with bar-coded label being brought into sampling position under the caimula (b) the tube raised so that the caimula has penetrated the stopper (c) the sample sensing probe coming through the caimula to aspirate the exact volume required for each assay and (d) after sampling, where the tube is lowered away from the cannula.
FIG. 18-122 Schematic of a rotary-drum vacuum filter with scraper discharge, showing operating zones. (Schweitzer, Handbook of Separation Techniques for Chemical Engineers, p. 4-38. Copqtight 1979 hq McGraw-Hill, Inc. Used with permission of McGraw-Hill Inc.)... [Pg.1715]

Process Flow The schematic in Fig. 22-56 may imply that the feed rates to the concentrate and diluate compartments are equal. If they are, and the diluate is essentially desalted, the concentrate would leave the process with twice the salt concentration of the feed. A higher ratio is usually desired, so the flow rates of feed for concentrate and feed for diluate can be independently controlled. Since sharply differing flow rates lead to pressure imbalances within the stack, the usual procedure is to recirculate the brine stream using a feed-and-bleed technique This is usually true for ED reversal plants. Some nonreversal plants use slow flow on the brine side avoiding the recirculating pumps.. Diluate production rates are often 10X brine-production rates. [Pg.2031]

Figure 25-2 provides a more detailed schematic representation of the two preferred pollution prevention techniques (i.e., source reduction ana recychng). [Pg.2165]

Figure 12.30(b) Typical schematic illustrating the squaring technique... [Pg.297]

The work required to drive the turbine eompressor is reduced by lowering the compressor inlet temperature thus increasing the output work of the turbine. Figure 2-35 is a schematic of the evaporative gas turbine and its effect on the Brayton cycle. The volumetric flow of most turbines is constant and therefore by increasing the mass flow, power increases in an inverse proportion to the temperature of the inlet air. The psychometric chart shown shows that the cooling is limited especially in high humid conditions. It is a very low cost option and can be installed very easily. This technique does not however increase the efficiency of the turbine. The turbine inlet temperature is lowered by about 18 °F (10 °C), if the outside temperature is around 90 °F (32 °C). The cost of an evaporative cooling system runs around 50/kw. [Pg.97]

Combination of Evaporative Cooling and Steam Injection. The combination of the above techniques must also be investigated as none of these techniques is exclusive of the other techniques and can be easily used in conjunction with each other. Figure 2-44 is a schematic of combining the inlet evaporative cooling with injection of steam in both the compressor exit and the combustor. In this system, the power is augmented benefiting from... [Pg.104]

A schematic of a PL system layout is shown in Figure 5. This optical system is very similar to that required for absorption, reflectance, modulated reflectance, and Raman scattering measurements. Many custom systems are designed to perform several of these techniques, simultaneously or with only small modifications. [Pg.383]

Figure 1 Schematic iiiustration of resonant profiling technique. In (a), the incident... Figure 1 Schematic iiiustration of resonant profiling technique. In (a), the incident...
In contrast to many other surface analytical techniques, like e. g. scanning electron microscopy, AFM does not require vacuum. Therefore, it can be operated under ambient conditions which enables direct observation of processes at solid-gas and solid-liquid interfaces. The latter can be accomplished by means of a liquid cell which is schematically shown in Fig. 5.6. The cell is formed by the sample at the bottom, a glass cover - holding the cantilever - at the top, and a silicone o-ring seal between. Studies with such a liquid cell can also be performed under potential control which opens up valuable opportunities for electrochemistry [5.11, 5.12]. Moreover, imaging under liquids opens up the possibility to protect sensitive surfaces by in-situ preparation and imaging under an inert fluid [5.13]. [Pg.280]


See other pages where Schematic technique is mentioned: [Pg.210]    [Pg.1655]    [Pg.1847]    [Pg.2389]    [Pg.2964]    [Pg.3010]    [Pg.175]    [Pg.211]    [Pg.132]    [Pg.208]    [Pg.209]    [Pg.272]    [Pg.288]    [Pg.290]    [Pg.241]    [Pg.311]    [Pg.313]    [Pg.579]    [Pg.517]    [Pg.149]    [Pg.517]    [Pg.390]    [Pg.66]    [Pg.528]    [Pg.396]    [Pg.418]    [Pg.49]    [Pg.53]    [Pg.202]    [Pg.8]    [Pg.686]    [Pg.125]    [Pg.211]   
See also in sourсe #XX -- [ Pg.69 ]




SEARCH



Plasma spraying technique schematic diagram

Schematic representation technique

© 2024 chempedia.info