Big Chemical Encyclopedia

Chemical substances, components, reactions, process design ...

Articles Figures Tables About

Ion-beam techniques

There is another classification difficulty. In this chapter we have arranged our discussion of open shell molecules on the basis of Hund s case (a) or case [Pg.730]

There are several other important aspects of the experiment which should be mentioned. The waveguide cell is surrounded by a solenoid coil which can produce a magnetic field parallel to the ion beam direction the magnitude of this field (up to 50 G) is often sufficient to produce observable Zeeman splittings which greatly assist spectroscopic assignment, as we will see. ft is also possible to expose the molecular ion beam to two different microwave frequencies this so-called double resonance technique enables two different microwave transitions to be connected, if they share a [Pg.731]

The techniques described have been used to study the fundamental II2 ion, and its important isotopomers D2 and HD+. Our description of these particular experiments is postponed to chapter 11. Later in this chapter we will describe microwave experiments on the rare gas ions HeAr+, HeKr+ and Ne2, for which rotational transitions, among others, have been studied. [Pg.732]

The calculated values in the table were obtained by fitting the results to the conventional formula for the rotational energies [Pg.733]

It should be noted that the rotational spectroscopy of CO confined to a single vibrational level, usually the ground v = 0 level, provides only a limited amount of information about molecular structure. In the field of vibration-rotation spectroscopy, however, CO has been studied extensively and particular attention paid to the variation of the rotational and centrifugal distortion constants with vibrational quantum number. Vibrational transitions involving v up to 37 have been studied with high accuracy [78, 79, 80], and the measurements extended to other isotopic species [81] to test the conventional isotopic relationships. CO is, however, an extremely important and widespread molecule in the interstellar medium. CO distribution maps are now commonplace and with the advent of far-inffared telescopes, it is also an important [Pg.733]


There are, however, continuing difficulties for catalytic appHcations of ion implantation. One is possible corrosion of the substrate of the implanted or sputtered active layer this is the main factor in the long-term stabiHty of the catalyst. Ion implanted metals may be buried below the surface layer of the substrate and hence show no activity. Preparation of catalysts with high surface areas present problems for ion beam techniques. Although it is apparent that ion implantation is not suitable for the production of catalysts in a porous form, the results indicate its strong potential for the production and study of catalytic surfaces that caimot be fabricated by more conventional methods. [Pg.398]

P. Hansen and H. Heitmann, "Media foi Eiasable Magnetooptic Recoiding. IEEE Trans. Mag. 25(60 J. M. E. Haipei, "Ion Beam Techniques ia Thin Eihn Deposition," Solid State Technol, 129 (Api. 1987). [Pg.397]

Neutron reflectivity provides a depth resolution of 1 nm and fills an important gap in the resolution between X-ray photoelectron spectroscopy and ion-beam techniques. In this regard, neutron reflectivity promises to play a decisive role in the investigation of solid materials. Equally important is the fact that reflectivity meas-... [Pg.669]

As NRA is sensitive only to the nuclei present in the sample, it does not provide information on chemical bonding or microscopic structure. Hence, it is often used in conjunction with other techniques that do provide such information, such as ESCA, optical absorption. Auger, or electron microscopy. As NRA is used to detect mainly light nuclei, it complements another accelerator-based ion-beam technique, Rutherford backscattering (RBS), which is more sensitive to heavy nuclei than to light nuclei. [Pg.681]

While electron or ion beam techniques can only be applied under ultra-high vacuum, optical techniques have no specific requirements concerning sample environment and are generally easier to use. The surface information which can be obtained is, however, quite different and mostly does not contain direct chemical information. While with infra-red attenuated total reflection spectroscopy (IR-ATR) a deep surface area with a typical depth of some micrometers is investigated, other techniques like phase-measurement interference microscopy (PMIM) have, due to interference effects, a much better surface sensitivity. PMIM is a very quick technique for surface roughness and homogeneity inspection with subnanometer resolution. [Pg.367]

As a consequence one might expect that the future needs to rely on hybrid elements which arise from advanced UV-and electron-beam lithography, from imprint techniques or automated and parallelized nanomanipulation techniques, like dip-pen lithography or focused ion-beam techniques in combination with supramolecular approaches for the assembly of molecular inorganic/organic hybrid system. Nevertheless, it is evident for any kind of chemical approach that falling back onto the present-day... [Pg.125]

Principles and Characteristics The ion-molecule reaction (IMR) ionisation method belongs to the group of ion beam techniques. The basic structure of these instruments consists of ... [Pg.366]

Figure 1. Microcircuit fabrication using plasma and ion beam techniques. Figure 1. Microcircuit fabrication using plasma and ion beam techniques.
Ion Beam Deposition The most commonly used vacuum method for the rapid deposition of films (thin or thick) is sputtering (2M. This can be combined with ion beam techniques in a variety of ways (25) including (Figure 18) ion beam sputter deposition (IBSD) eg of oxide films or of hard carbon (26). In reactive systems the reactive gas is added to the argon ion beam. The properties of the deposited materials are modified substantially by varying the gas composition (Figure 19). [Pg.324]

Ion beam techniques have Iso been used to determine the location of B and H (or D) in the HB complex. These are described by Marwick in Chapter 9. DeLeo and Fowler (Chapter 14) review the theoretical calculations that have been performed for competing microscopic models of the HB complex. [Pg.117]

In this chapter we survey the application of ion beam techniques to the study of hydrogen in semiconductors. We describe the techniques... [Pg.200]

In the case of H in low-temperature deposited silicon nitride films, ion beam techniques have again been used to calibrate IR absorption. The IR absorption cross sections most often quoted in the literature for Si—H and N—H bonds in plasma-deposited material are those of Lanford and Rand (1978) who used 15N nuclear reaction to calibrate their IR spectrometry. Later measurements in CVD nitride films, using similar techniques, confirmed these cross sections (Peercy et al., 1979). [Pg.212]

Harper, "Ion Beam Techniques in Thin Film Deposition, Solid State... [Pg.958]


See other pages where Ion-beam techniques is mentioned: [Pg.356]    [Pg.37]    [Pg.366]    [Pg.374]    [Pg.48]    [Pg.107]    [Pg.15]    [Pg.307]    [Pg.308]    [Pg.22]    [Pg.23]    [Pg.200]    [Pg.200]    [Pg.201]    [Pg.201]    [Pg.204]    [Pg.210]    [Pg.212]    [Pg.213]    [Pg.214]    [Pg.214]    [Pg.236]    [Pg.238]    [Pg.624]    [Pg.299]    [Pg.842]    [Pg.356]    [Pg.1118]    [Pg.7]    [Pg.8]    [Pg.185]    [Pg.185]    [Pg.186]   
See also in sourсe #XX -- [ Pg.310 ]




SEARCH



Beam techniques

Focused ion beam technique

Guided ion beam technique

Hydrogen in Semiconductors Ion Beam Techniques

Ion beams

© 2024 chempedia.info