Ion beam enhanced deposition

Two principal classes of diamond film deposition have been developed (I) PACVD (plasma-assisted chemical vapor deposition) and (2) IBED (ion-beam-enhanced deposition). 

Materials. Biaxially oriented polypropylene (PP) films of 50 um thickness were obtained from 3M and have been described (2). PMDA-ODA (PI) was Kapton H polyimide from Dupont. Copper-plated PTFE films were obtained from Spire Corporation (Bedford, MA). They were prepared using the Ion Beam Enhanced Deposition (IBED) process in which a 100 nm thick Cu film was vapor-deposited onto a PTFE substrate in the presence of a beam of 400 eV Ar+ ions of 25 uA/cm2 (IQ). Shortly before SIMS analysis, the Cu film was removed slowly by peeling at 90° in ambient conditions. Metal-coated PI films were prepared by sputtering 50 nm Cr and 1 um Cu onto a 50 um thick Kapton film on both sides. Thermal annealing was performed in a vacuum chamber at 2xl0 6 torr using a quartz lamp as the heating source. The samples were held for 15 min at the desired temperature and then cooled down to ambient temperature inside the chamber for about 2 hours. Just prior to SIMS analysis, the metal films were peeled slowly at 90° and then immediately introduced into the vacuum chamber of the instrument. 

Tanabe N., Haysshi T., Iwaki M., Deposition of cubic boron nitride thin films by ion-beam-enhanced deposition, DiamondRelat. Mater., 1 (1992) pp. 883-890. 

An excellent oxidation resistance was obtained when TiAl specimens were coated with an Si3N4 film of 0.5 p.m thickness prepared by ion-beam enhanced deposition as shown in Fig. 8 [49].The mass gain due to 30 cycle (600h) oxidation with temperature... 

Fig.8. Cyclic oxidation curves of TiAl coupons coated with Si3N4 films by ion-beam-enhanced deposition, film thicknesses (1) 0.5, (2) 1 and (3) 2 p.m. (4) is for an uncoated TiAl specimen.

Zhou, J., Fink, D., Biersack, J. et.al. 1991. Simple model calculation for ion-beam-enhanced deposition. 

Fu,Y.,Zhu,X., Tang, B.etal. 1998. Development and characterization of CrN films by ion beam enhanced deposition for improved resistance. Wear 217 159-164. 

Ion beam-assisted deposition (IBAD) (film deposition) A special case of ion plating where the deposition is done in a high vacuum and the concurrent or periodic bombardment is provided by gaseous ions accelerated from an ion gun or plasma source. Also called Vacuum-based ion plating, Ion beam-enhanced deposition, and Ion-assisted deposition (lAD). 

Ion beam-enhanced deposition Ion beam surface treatinent Integrated circuit Ionized cluster beam (deposition)... 

In order to verify this simple model, interfaces between vapor-deposited copper films and PTFE with and without ion beam enhancement were prepared and analyzed. Also, the PTFE substrate was treated in an AC argon plasma for 1-5 minutes and analyzed. The Cu-PTFE interface was identical to that between Au and PTFE and the increase of the higher mass ions was observed here, too. In these series of experiments reproduc-... 

Ikeda T., Cubic boron nitride films synthesized by low-energy ion-beam-enhanced vapor deposition, Appl. Phys. Lett., 61 (1992) pp. 786-788. 

There are many physical deposition (PD) processes which can be used to deposit lubricating films on surfaces, and several of them have been used, either separately or in combination, for depositing molybdenum disulphide. They include Ion Beam Enhanced (or Assisted) Deposition (IBED or IBAD), and Pulsed Laser Deposition (PLD), but the most important so far is sputtering, or more precisely sputter-coating. 

Ramaswamy N, Arruda TM, Wen W, Hakim N, Saha M, Gulla A, Mukcrjee S (2009) Enhanced activity and interfacial durability study of ultra low Pt based electrocatalysts prepared by ion beam assisted deposition (IBAD) method. Electrochim Acta 54 6756-6766 Wu J, Yuan XZ, Martin JJ, Wang H, Zhang J, Shen J, Wu S, Merida W (2008) A review of PEM fuel cell durability degradation mechanisms and mitigation strategies. J Power Sources 184 104-119... 

Several attempts have been made to synthesize thin film C3N4, be it cubic or hexagonal. These include reactive magnetron sputtering [184-187], laser ablation [188] ion beam assisted deposition (IBAD) [189], plasma [191, 192] and plasma-enhanced chemical vapour deposition [190]. 

More recent efforts involving nitrogen ion beam assisted deposition [203, 206, 211], hot filament CVD with or without rf plasma [204, 205, 209], or microwave plasma enhanced CVD [213, 214], with bias assistance [207, 208, 212] were able to produce thin films containing C3N4, some with the PC3N4 structure and some with the cubic or a-structure. 

The chemical stability of phosphate glasses can be improved through the incorporation of nitrogen into the structure. In nitrided amorphous Li3P04 thin films (LiPON), the exceptional stability and enhanced Li conductivity make them attractive for microbattery applications. Reported here are Li, P, and solid-state NMR studies of LiPON thin films fabricated by an ion beam-assisted deposition process. ... 

Abstract The principles of coatings to either enhance reflectivity of mirrors or to enhance transmission of glass optics are described. Then the ion assisted deposition and ion beam sputtering techniques are addressed. Performances of these technique-sand their limitations are illustrated with the characteristics of the VIRGO mirrors coated at LMA. The importance of metrology is emphasized. 

DEC coating was first prepared by Aisenberg and Chabot using ion beam deposition in 1971 [2]. At present, PVD, such as ion beam deposition, sputtering deposition, cathodic vacuum arc deposition, pulsed laser deposition, and CVD, like plasma enhanced chemical vapor deposition are the most popular methods to be selected to fabricate DEC coatings. 

These specialized forms of CVD, referred to as nontraditional techniques for the purpose of this review, include laser (LCVD), aerosol (ACVD), hot filament (HFCVD), and ion beam (IBGVD) chemical vapor deposition. In such enhanced CVD technologies, a thermal CVD reaction occurs simultaneously with another driving force, which results... 

In the case of the n-heptyl viologen deposition, nucleation rates of the first molecular layers of this molecule control the deposition rates of subsequent layers. The nucleation reaction follows the instantaneous nucleation model — and is found to be highly sensitive to the chemical and physical nature of the electrode surface prior to deposition. RF-plasma of ion-beam etched surfaces generally show greatly enhanced nucleation and bulk deposition rates. 

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