Ion cluster beam deposition

The talk will briefly review some of these developments ranging from high temperature equilibrium plasmas to cool plasmas, PECVD, ion implantation, ion beam mixing and ion assisted etching and deposition. Brief consideration will also be given to sputtering and ionised cluster beam deposition techniques in inorganic synthesis. 

Here we present some results concerning the role that ion irradiation has in 1. modifying cluster assembled carbon thin films obtained by low energy cluster beam deposition (LECBD) and containing a cabynoid component and 2. producing carbynoid-like materials after irradiation of solid frozen benzene and of asphaltite, a natural bitumen. 

Most of the time, metal/dielectric nanocomposites are studied in the form of solutions or thin solid films on a substrate Colloids, doped and annealed glasses, sol-gels, surfactant-stabilized nanoparticles, micelles, two- or three-dimension self-assembled nanocomposites, self-organized mesoporous oxides filled with metals, electrochemically-loaded template membranes, metal-ion implanted crystals, nanocomposite films elaborated by laser ablation, cluster-beam deposition, radio-frequency sputtering, or nanolithography. 

The low-energy cluster beam deposition setup at the Universitat Karlsruhe consists of three differential pumping stages as shown in Figure 3.20. Their source produces ions through electron impact induced ionization/desorption of powder in a... 

Nason et al. [20] reported that polycrystalline thin films (1-10 /am) of the nonlinear material 2-methyl-4-nitroaniline were deposited on Ag, Cu, and Si by conventional and ionized cluster beam deposition. The use of ions was found to promote a highly oriented film, with only a single x-ray diffraction orientation (112) being observed at reduced temperatures (-50 C). The effect of the ions on the physical microstructure of the films was to densify the film and reduce the size of the microcrystals. The films had powder-like optical properties and displayed a strong second harmonic from an N YAG laser. 

Ion cluster beam (ICB) deposition (PVD technology) A deposition process in which clusters of atoms (thousands of atoms) are electrically charged and accelerated to the substrate to deposit with greater than thermal energy. 

Ion beam-enhanced deposition Ion beam surface treatinent Integrated circuit Ionized cluster beam (deposition)... 

Chemical alternation of the surface layer and deposition of a new layer on top of the silicone mbber can be achieved by physical techniques. For the inert surface of silicone rubber, the former requires the generation of high-energy species, such as radicals, ions, or molecules in excited electronic states. In the latter case, coatings of atoms or atomic clusters are deposited on polymer surfaces using technique such as plasma (sputtering and plasma polymerization) or energy-induced sublimation, like thermal or electron beam-induced evaporation. 

Alternative vacuum deposition processes that have recently been developed offer potential advantages such as higher deposition rates, improved adhesion, or better control of film stress or morphology. These processes include ion-beam sputtering (134), ion-cluster evaporation (135, 136), and cathodic-arc deposition (137). 

When a surface is exposed to a beam of ions, energy is deposited in the surface region of the sample by a collision cascade. Some of the energy will return to the surface and stimulate the ejection of atoms, ions, and multi atomic clusters (Fig. 4.1). In SIMS, secondary ions (positive or negative) are detected directly with a... 

Zhou, J. K., Takeuchi, M., Zhao, X. S., Ray, A. K. and Anpo, M. (2006). Photocatalytic decomposition of formic acid under visible light irradiation over V-ion-implanted Ti02 thin film photocatalysts prepared on quartz substrate by ionized cluster beam (ICB) deposition method. Catal. Lett. 106(1-2), 67-70. 

For the FEM experiments described below, the cluster beam was directed through a small collimation capillary into a separately pumped deposition chamber, which is kept at 1 x 10 8 Torr. A transfer cell equipped with a 2 1/s ion pump enabled a tungsten FEM tip to be 1. inserted into the deposition chamber and positioned with its apex in the cluster beam, 2. withdrawn and transported at 2 x 10 7 Torr to a UHV field emission microscope, and 3. inserted into the field emission apparatus and positioned properly for field emission measurements (6). 

Evaporation-condensation, evaporation (reactive evaporation, molecular beam deposition, sputtering), ion beam [ionized cluster beam (ICB), ion plating, electron cyclotron resonance (ECR)]... 

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