Mass selected ion beam deposition

The methods mostly used for nano-cBN deposition are ion-beam-assisted deposition (IBAD) [199] mass selected ion beam deposition (IBD) [200] ion plating [201] RF- or magnetron sputtering [202] and laser deposition [203] (Fig. 13). 

Interestingly, a similar nucleation effect as found for the ion impact seems to exist in the case of the substrate temperature. As has been found by several authors [34,36] a minimum substrate temperature of 150°C is necessary in order to nucleate cubic BN in ion-assisted deposition. However, very recently Feldermann et al. [71] have found for mass selected ion beam deposition that switching off the substrate heating after cBN nucleation and allowing the substrate to cool down to room temperature, does not interrupt cBN growth. 

Mass selected ion beam deposition is a special method with well defined conditions concerning ion masses and energies. Hofsass et al. [21] for example used C " ions, in the most cases with deposition energies of 100 eV. This method is interesting for basic research, but seems to have no perspectives for industrial uses. 

Boyd KJ, Lapicki A, Aizawa M, Anderson SL (1998) A phase-space-compressing, mass-selecting beamline for hyperthermal, focused ion beam deposition. Rev Sci Instrum 69 4106... 

The technique of MSIB deposition allows deposition of single ion species by passing the ion beam through a magnetic mass analyzer for e/ m selection. Figure 15 shows the general layout of the MSIB technique used for the deposition of... 

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