Characterization, film

Vol. 144. Surface-Launched Acoustic Wave Sensors Chemical Sensing and Thin-Film Characterization. By Michael Thompson and David Stone... 

Ham D, Mishra KK, Rajeshwar K (1991) Anodic electrosynthesis of cadmium selenide thin films. Characterization and comparison with the passive/transpassive behavior of the CdX (X = S, Te) counterparts. J Electrochem Soc 138 100-108 Stimming U (1985) Photoelectrochemical studies of passive films (Review Article). Electrochim Acta 31 ... 

Dona JM, Herrero J (1994) Process and film characterization of chemical-bath-deposited ZnS thin films. J Electrochem Soc 141 205-210... 

Macrocyclic Compounds in Analytical Chemistry. Edited by Yury A. Zolotov Surface-Launched Acoustic Wave Sensors Chemical Sensing and Thin-Film Characterization. By Michael Thompson and David Stone Modern Isotope Ratio Mass Spectrometry. Edited by T. J. Platzner High Performance Capillary Electrophoresis Theory, Techniques, and Applications. Edited by Morteza G. Khaledi... 

Oligomer and Film Characterization. Brookfield viscosity measurements were taken on a Model RVTD digital readout viscometer. Samples for Instron testing were prepared on glass plates using 25 or 75 pm (1.0 or 3.0 mil) Byrd film applicator. Coatings for cure speed and MEK double rub (MEKDR) studies were prepared on aluminum Q-Panels using a 40 wire wound rod (100 pm or 4.0 mil). 

W. Husinsky and G. Betz. Fundamental Aspects of SNMS for Thin Film Characterization Experimental Studies and Computer Simulations. Thin Solid Films, 272(1996) 289-309. 

Time-resolved techniques are very powerful for examining structures where the useful information is contained in the normally reflected signal. Frequency analysis of a reflected broadband signal can also be used for film characterization (Wang and Tsai 1984 Lee et al. 1985). But in many other problems, especially in materials science, there is a great deal of information contained in the way that the coefficient of reflection changes with angle of incidence. It is therefore important to understand the behaviour of the reflectance function R(d) of a layered structure. 

Kushibiki, J., Chubachi, N., and Tejima, E. (1989). Quantitative evaluation of materials by directional acoustic microscope. Ultrasonics Int. 89, 736-43. [56, 149, 250] Kushibiki, J., Ishikawa, T., and Chubachi, N. (1990). Cut-off characteristics of leaky Sezawa and pseudo-Sezawa wave modes for thin-film characterization. Appl. Phys. Lett. 57,1967-9. [216]... 

Thompson M, Stone DC (1997) Surface-launched acoustic wave sensors chemical sensing and thin-film characterization. Wiley, New York... 

Although CVD and plasma deposited films offer excellent properties as a passivation layer, the inability to reproduce chemical and physical properties has been a problem. Depending on gas flow rates and deposition conditions, free Si, H, C and 0 may be Incorporated into the films. Characterization of these films has been restricted almost exclusively to surface analytical techniques and ellipsometry. AES and XPS have been used to determine the C, N, 0, and Si content of CVD silicon nitride. 

Pyroelectric Ceramics and Thin Films Characterization, Properties and Selection... 

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