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Ellipsometry reflection coefficient

Reference electrode, 1104, 1108, 1113 potential, 819, 874 Refractive index, determination with ellipsometry, 1148. 1151 Reflection coefficient, 1151 Residence time, definition, 1310 Reversal techniques, determination of intermediate radicals, 1416 Reversible adsorption of organic molecules, 969, 970... [Pg.48]

Finally, n was determined by spectroscopic ellipsometry. The main drawback with this technique when applied to anisotropic samples is that the measured ellipsometric functions tanlF and cos A are related both to the incidence angle and the anisotropic reflectance coefficient for polarizations parallel and perpendicular to the incidence plane. The parameters thus have to be deconvolved from a set of measurements performed with different orientations of the sample [see (2.15) and (2.16)]. The complex refractive index determined by ellipsometry is reliable only in the spectral region where the sample can be considered as a bulk material. In fact, below the absorption... [Pg.68]

Ellipsometry grants the independent determination of two results per resolution element without changing the experimental geometry this technique is described in Sec. 6.4.4.2. More often however, the information on the phase shift is abandoned and just the reflectance is determined. Usually it is measured by comparing the signal caused by the reflected intensity with the one obtained when the sample is replaced by a mirror. Even without correcting for its reflectance such results can often be used for further mathematical evaluation. The Fresnel reflection coefficient r in the form given by Eq. [Pg.585]

Ellipsometry is an attractive non-destructive technique for monitoring surface coverage and can be applied to any surface with a significant reflection coefficient [199]. It is based on changes in the optical properties of a reflecting surface and has been specifically developed by Bootsma et al. [200] for coverage measurements. [Pg.24]

Growth of multilayer periodic Z nS/ZnSe h eterostructures b y m etallorganic c hemical vapor deposition, their optical properties examined by ellipsometry and traditional spectroscopy are described. The results obtained evidence that the structures proposed are promising as efficient Bragg reflectors for blue semiconductor lasers. Reflection coefficient higher than 90% in the blue-green spectral range have been obtained. [Pg.103]

The basic measurements in ellipsometry involve measuring the reflection coefficients for parallel R, and perpendicularly polarized light Rj (sometimes called. V- and p-polarizcd light, respectively). The ratio of these values, which is a complex number, gives the elliptical angle and the phase shift A according to... [Pg.606]

Infrared Imaging and Mapping for Biosensors, Fig. 3 (a) Principle of IR synchrotron mapping ellipsometry. Due to reflection at the sample, the polarization of the radiation is changed. For example, the incident linearly polarized radiation becomes elliptically polarized. The sample Is moved by a two-dimensional mapping table, and a spectrum Is taken for every probed spot. The elllpsometiic parameters defined by the quantity p, which is the ratio of the complex reflection coefficients Tp and r, are measured for every spot. A is the phase shift... [Pg.1399]

An optical reflection technique in more widespread use is ellipsometry. In this technique one does not measure the reflection coefficient directly instead one effectively measures the (complex) ratio of the reflectances of light polarised in a direction parallel to the plane of the interface (the s-wave ) and the light polarised in a direction in the plane defined by the incident and reflected beam (the p-wave ). The geometry is illustrated in figure 3.13. [Pg.76]

If the polarization of the reflected light is also measured, the technique is known as ellipsometry. Measurements are usually carried out at the Brewster angle, where the parallel polarized, reflected light is at its minimum value. The measured quantity is the ellip-ticity—the ratio of the reflection coefficients of the parallel and perpendicularly polarized light ... [Pg.85]

In ellipsometry, the quantity measured is the ratio (p) between the complex reflection coefficients with polarization parallel (Rp) and perpendicular (Rs) to the plane formed by the incident and reflected light beams. [Pg.75]

The Ip and A measured from ellipsometry are defined from the ratio (p) of reflection coefficients for p- and s-polarization (tp, Tj) ... [Pg.299]

This is the principal equation of ellipsometry, where the reflection coefficients are a function of the complex refractive indices (N) of the materials, the film... [Pg.299]

Where, y/ and A are also called ellipsometry parameters. The ratio of the modulus of the amplitude reflection coefficients is given by tan y/, and the phase difference between p- and s-polarized reflected light is given by A. The two ellipsometry parameters y/ and A are obtained directly from the measurement of ellipsometry. [Pg.50]

When three phases of media are involved in the reflection of light, as with a film-covered metal immersed in a liquid or in air, two interfaces need to be considered for the reflection of light (Fig. 3). For most electrochemists using ellipsometry, medium 1 will be the ambient medium, e.g., the electrolyte solution medium 2, the film material and medium 3, the electrode or the substrate. The reflection coefficients at individual interfaces are given by Eqs. (2a) and (2b). Multiple reflections and transmissions at and between the two boundaries occur as depicted in Fig. 3. [Pg.197]

In ellipsometry, the usual practice is to measure the ratio of reflection coefficient for the p polarization to that of the s polarization, This complex ratio can be expressed by its magnitude (modulus, tan ) and its relative phase. A, as in Eq. (4), resulting in the classical ellipsometry equation... [Pg.198]

The combined ellipsometry-reflectance method—three-parameter ellipsometry—has been subject to error analysis. Cahan showed that, while it is possible in principle to obtain an unambiguous solution for the optical constants and thickness of a film by three-parameter ellipsometry, the method does not guarantee that a solution can be obtained in practice. He also pointed out, by working with sample data from electrochemically produced films, that the numbers obtained as the solution are not necessarily physically real when the three-layer model is inadequate for the particular system. Chung, Lee, and Paik" studied the forward and reverse sensitivity analyses for three-parameter ellipsometry to obtain the forward sensitivity coefficients (dMldoi) > and the reverse sensitivity coefficients for a passive film on nickel (here... [Pg.219]

Derivation of the reflection coefficient expressions and the ellipsometry equations for film-covered surfaces employing matrix operations will be shown here. The treatment is similar to Heavens and Hayfield and White. This matrix method is less cumbersome, especially when multiple films are involved, compared to another frequently used method of deriving the reflection coefficients, in which amplitudes of individual beams resulting from multiple reflections and transmissions at the interfaces are summed. [Pg.239]

Tp, Tj, etc. = complex reflection coefficients 5 = sin(2 /) sin(A) 5 = Stokes vector V = voltage, element of Stokes vector z = vector of fitted parameters (Eqn [14]) a = absorption coefficient 8c = constant phase shift A = ellipsometry angle 0 = azimuthal angle X = wavelength p = complex reflection ratio ( ) = angle of incidence ( )f, = complex... [Pg.411]

For a general situation of optical anisotropy and sample orientation, the simple definition of p in Equation 13 is no longer a complete description, and the generalized ellipsometry approach is needed. In such instances. Equation 13 depends on the polarization state of the incident plane wave. The generalized elKpsometry parameters are then described by three ratios of the polarized-light reflection coefficients among the four available complex-valued elements of the Jones reflection matrix r [15, 36] ... [Pg.231]

In general, Ss f Sp, and therefore if the incident linearly polarized wave, has both s- and p-components, the reflected wave is elliptically polarized. The parameters of the polarization ellipse are determined by the optical constants of both media and can be measured with high accuracy. This principle forms the basis of reflection ellipsometry (see Section 5.1). For historical reasons one often represents the ratio of the reflection coefficients, p, in terms of the ellip-sometric angles, Y and A, as... [Pg.62]

As we have seen in Section 3.1.1, the ratio of the reflection coefficients in p-and s-polarizations, p, can be represented in terms of the ellipsometric angles Y and A (Eq. (3.33)). These quantities are determined by the sample properties and being measured as a function of the incident radiation frequency provide spectroscopic information about the sample. This is the basic idea of spectroscopic ellipsometry or, in the IR region, infrared spectroscopic ellipsometry (IRSE). [Pg.94]

The detailed examination of the behavior of light passing through or reflected by an interface can, in principle, allow the determination of the monolayer thickness, its index of refiraction and absorption coefficient as a function of wavelength. The subjects of ellipsometry, spectroscopy, and x-ray reflection deal with this goal we sketch these techniques here. [Pg.126]

Ellipsometry. Determination of h(u>) by KK analysis and coupled measurements of 1Z and T are affected, respectively, by the problem of the tails added to the experimental R(u>) spectra and by the need to perform 7Z and T measurements separately These problems, which introduce some uncertainty, can be solved by spectroscopic ellipsometry. The technique involves analyzing the polarization of a light beam reflected by a surface. The incident beam must be linearly polarized and its polarization should be allowed to rotate. A second linear polarizer then analyzes the reflected beam. The roles of polarizer and analyzer can be exchanged. The amplitudes of the s and p components of the reflected radiation are affected in a different way by reflection at the surface. The important function describing the process is the ellipsometric ratio p, which is defined as the polarization of the reflected wave with respect to the incident wave, expressed as the ratio between the Fresnel coefficients for p and s polarizations ... [Pg.64]

The state of polarization of light, reflected from an interface, depends strongly on the profile of the dielectric constant across that interface. This simple principle is used in the Brewster angle reflection ellipsometry (BAE), where one measures the ellipticity coefficient of light, reflected from an interface. The method is sensitive enough to detect extremely small changes in the structure of liquid crystalline-solid interfaces. Subnanometer resolution of the adsorption parameter is routinely achieved. The method is therefore very useful for the study of liquid crystal interfaces, where the surface-induced variation of the order can be observed [5,25,33-41]. [Pg.204]

Optical Constants. The real part (ei) and imaginary part ( 2) of the dielectric constant at optical frequencies were measured by spectroscopic ellipsometry. The refractive index n, the extinction coefficient k. the absorption coefficient K, and the reflectivity R have been calculated from 1 and 2- The frequency dependences of 1, 2, n, and K are shown in Figs. 4.1-48 and 4.1-47. [Pg.601]


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See also in sourсe #XX -- [ Pg.188 , Pg.189 ]




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