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Diamond films, chemical vapor deposition

MehtaMenon, P., Edwards, A., Feigerle, C. S., Shaw, R. W., Coffey, D. W., Heatherly, L., Clausing, R. E., Robinson, L. and Glasgow, D. C. (1999), Filament metal contamination and Raman spectra of hot filament chemical vapor deposited diamond films. Diam. Relat. Mater., 8(1) 101-109. [Pg.93]

Peptide microarrays are prepared by immobilizing many peptide molecules on the surface of a solid support in a small area in an addressable fashion. The immobilization can be achieved via in situ synthesis or chemical ligation through a covalent bond. A hydrophihc linker between the sohd surface and the peptide usually is added to minimize steric hinderance caused by the sohd support. The most commonly used solid support for microarray printing is a standard microscope glass slide. Other solid supports also have been used such as polystyrene, nitrocellulose membranes, PVDF membranes, Hybond ECL membranes, gold surfaces, and chemical vapor deposited diamond films. [Pg.1430]

Bormett RW, Asher SA, Witowski RE, Partlow WD, Lizewski R, Pettit F (1995) Ultraviolet Raman spectroscopy characterizes chemical vapor deposition diamond film growth and oxidation. J Appl Phys 77 5916... [Pg.622]

Joshi A, Nimmagadda R, Herrington J (1990) Oxidation kinetics of diamond, graphite, and chemical vapor deposited diamond films by thermal gravimetry. J Vac Sci Technol A 8 2137... [Pg.307]

Obtaining and interpreting Raman spectra of gemstones and related materials are popular experimental topics. Diamond is a favorite because it fascinates students and because the spectrum is easy to obtain. O Brien and co-workers used diamond as a device to introduce students to the more general topic of carbon Raman spectroscopy [6]. Once obtained, the diamond spectrum is compared to the spectrum of diamondlike carbon. Voor and co-workers looked at chemical-vapor-deposited diamond film using a homemade Raman microprobe [5]. [Pg.1011]

A. Ctisd, B. Saubat-Marcus, M. Mermoux, Deep ultraviolet Raman imaging with micron resolution application to chemical-vapor-deposited diamond films. Jpn. J. Appl. Phys. 47, 8868-8870 (2008)... [Pg.143]

Boron-doped chemical-vapor-deposited diamond is an exceptionally inert carbon electrode with a very wide potential window and very low voltammetric background current. [A. E. Fischer, Y. Show, and G. M. Swain, Electrochemical Performance of Diamond Thin-Film Electrodes from Different Commercial Sources, Anal. Chem. 2004, 76, 2553.]... [Pg.675]

Barber ZH, Clyne TW (2002) Ag nanoparticle induced surface enhanced Raman spectroscopy of chemical vapor deposition diamond thin films prepared by hot filament chemical vapor deposition. J Appl Phys 91 6085-6088... [Pg.132]

C. R. Eddy, Jr., D. L. Youchison, and B. D. Sartwell, Comparison of (CH4-02)-H2 and CO-H2 plasmas for low temperature diamond film deposition by electron cyclotron resonance plasma-assisted chemical vapor deposition. Diamond Relal Mjter., 3(1-2) 105-1H (1994)... [Pg.167]

D. N. Belton, and S. J. Schmieg, Nucleation of chemically vapor deposited diamond on platinum and nickel substrates. Thin Solid Films, 212(l-2) 68-80 (1992)... [Pg.174]

P. E. Pehrsson, J. Glesener, and A. Morrish, Chemical vapor deposition diamond nucleation induced by sp carbon on unscratched silicon. Thin Solid Films, 212(1-... [Pg.176]

W. E. Brower, R. A. Bauer, and N. M. Sbrockey, Catalytic effects on diamond film formation by plasma-assisted chemical vapor deposition. Diamond Relat Mater., l(8) 859-864 (1992)... [Pg.180]

K. Lee, and S. Harris, Boron carbide films grown from microwave plasma chemical vapor deposition. Diamond Relat. Mater, 7[10], 1539-1543(1998). [Pg.386]

In Volume 2 ceramic hard materials are highlighted in the light of their applications. Chapter 1 of Part III concisely reviews the history of diamond and diamondlike super abrasive tools while Chapter 2 and 3 are concerned with the application of chemical vapor deposited diamond and diamond-like carbon films. These sections... [Pg.1035]

CHEMISTRY OF SUPERCONDUCTOR MATERIALS edited by Terrell A. Vanderah CONTACTS TO SEMICONDUCTORS edited by Leonard J. Brillson DIAMOND CHEMICAL VAPOR DEPOSITION by Huimin Liu and David S. Dandy DIAMOND FILMS AND COATINGS edited by Robert F. Davis... [Pg.1]

Ohtake, N., and Yashikawa, M., Diamond Film Preparation by Arc Discharge Plasma Jet Chemical Vapor Deposition in the Methane Atmosphere, / Electrochem. Soc., 137(2) 717-722(1990)... [Pg.146]

After lapping, the sliders will be cleaned, and then a passivation film of diamond-like carbon (DLC) will be deposited on the surfaces of sliders through chemical vapor deposition (CVD) to protect the pole area from chemical-physical corrosion and electrostatic discharge attack. Corrosion in pole areas will result in loss of read/write functions. A corrosion test was taken to examine the ability of the sliders polished by different slurries as shown in Table 6. It can be seen that the MRR change rate of the sliders polished by UFD slurry is much less than that polished by the slurry T5qre III, that is, the capability of anti-corrosion of the former is much better than that of the latter. [Pg.263]

V. Anita, T. Butuda, T. Maeda, K. Takizawa, N.Saito, 0. Takai, Effect of N doping on properties of diamond-like carbon thin films produced by RF capacitively coupled chemical vapor deposition from different precursors., Diamond and Related Materials, vol. 13, pp. 1993-1996, 2004. [Pg.116]

Two principal classes of diamond film deposition have been developed (I) PACVD (plasma-assisted chemical vapor deposition) and (2) IBED (ion-beam-enhanced deposition). [Pg.485]

Process of chemical vapor deposition (CVD) is one of the most effective methods for preparation of flat emission cathodes. This method allows to produce different carbon structures on the cathode substrate. Depending on conditions of deposition, derivable carbon surface can be diamond-like films [1], amorphous graphite [2], various carbon constitutions, including carbon nanotubes [3], Investigation results of field emission properties produced cathodes have shown this is a promising technology for production Field Emission Display (FED). [Pg.265]

In addition to silicon and metals, a third important element being deposited as thin films is diamond (Celii and Butler, 1991 May, 2000). For many years, diamonds were synthesized by a high pressure/high temperature technique that produced bulk diamonds. More recently, the interest in diamonds has expanded to thin films. Diamond has a slew of properties that make it a desired material in thin-film form hardness, thermal conductivity, optical transparency, chemical resistance, electrical insulation, and susceptibility to doping. Thin film diamond is prepared using chemical vapor deposition, and we examine the process in some detail as a prototypical chemical vapor example. Despite its importance and the intensity of research focused on diamond chemical vapor deposition, there remains uncertainty about the exact mechanism. [Pg.131]

Silicon, diamond, and metal deposition are all examples of elemental deposition. Compounds, particularly oxides, are also deposited by chemical vapor deposition. Some of the important oxides deposited as thin films include SiC>2, BaTiC>3, LiNbC>3, YBa2Cu30,. indium-doped SnC>2, and LiCoC>2. These materials have properties such as superconductivity or lithium ionic conductivity that make their production as thin films a much-studied area of research. If the oxide is to be deposited on the bare metal (e.g., depositing SiC>2 onto Si), chemical vapor deposition is not really needed. Controlling the oxygen partial pressure and temperature of the substrate will produce the oxide film Whether the film sticks to the substrate is another question The production of SiC>2 films on Si is an advanced technology that the integrated-circuit industry has relied on for many years. Oxide films on metals have been used to produce beautiful colored coatings as a result of interference effects (Eerden et al., 2005). [Pg.132]

The adsorption of hydrocarbon molecules on Si surfaces is an interesting topic of study under various viewpoints. For example, a thin hydrocarbon film coating Si may be applied as a low dielectric in microelectronics and may passivate the surface if covalent bonds are formed between Si atoms and the adsorbate species. Further, unsaturated hydrocarbons play an important role as precursor species for chemical vapor deposition (CVD) of diamond - like films on the Si surface, and of silicon carbide (SiC). [Pg.508]

Baranauskas, V., Ceragioli, H. 1., Peterlevitz, A. C., Tosin, M. C. and Durrant, S. F. (2000), Effects of argon dilution of an ethanol/hydrogen gas feed on the growth of diamond by hot-filament chemical vapor deposition. Thin Solid Films, 377-378 303-308. [Pg.86]


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See also in sourсe #XX -- [ Pg.298 ]




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