Chemical vapor deposition diamond

P. Mahalingam, D. S. Dandy. Simulation of morphological instabilities during diamond chemical vapor deposition. Diamond Rel Mater d 1759, 1997. 

CHEMISTRY OF SUPERCONDUCTOR MATERIALS edited by Terrell A. Vanderah CONTACTS TO SEMICONDUCTORS edited by Leonard J. Brillson DIAMOND CHEMICAL VAPOR DEPOSITION by Huimin Liu and David S. Dandy DIAMOND FILMS AND COATINGS edited by Robert F. Davis... 

E. Meeks, R.J. Kee, D.S. Dandy, and M.E. Coltrin. Computational Simulation of Diamond Chemical Vapor Deposition in Premixed C2H2/O2/H2 and CH4/02-Strained Flames. Combust. Flame, 92 144—160,1993. 

M.R. Pederson, K.A. Jackson, and W.E. Pickett. Local-Density-Approximation-Based Simulations of Hydrocarbon Interactions with Applications to Diamond Chemical Vapor Deposition. Phys. Rev., B44(8) 3891-3899,1991. 

In addition to silicon and metals, a third important element being deposited as thin films is diamond (Celii and Butler, 1991 May, 2000). For many years, diamonds were synthesized by a high pressure/high temperature technique that produced bulk diamonds. More recently, the interest in diamonds has expanded to thin films. Diamond has a slew of properties that make it a desired material in thin-film form hardness, thermal conductivity, optical transparency, chemical resistance, electrical insulation, and susceptibility to doping. Thin film diamond is prepared using chemical vapor deposition, and we examine the process in some detail as a prototypical chemical vapor example. Despite its importance and the intensity of research focused on diamond chemical vapor deposition, there remains uncertainty about the exact mechanism. 

Hwang N.M., Evidence of nanometer-sized charged carbon clusters in the gas phase of the diamond chemical vapor deposition (CVD) process. J. Crystal Growth, 204 (1999) 85-90. 

E. J. Corat and D.G. Goodwin, Temperature Dependence of Species Concentrations Near the Substrate During Diamond Chemical Vapor Deposition, Journal of Applied Physics, Vol.74, 1993, pp.2021-2028. 

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