Deep ultraviolet

The iaterpretation of the spectroscopy of SBSL is much less clear. At this writing, SBSL has been observed primarily ia aqueous fluids, and the spectra obtained are surprisiagly featureless. Some very interesting effects are observed when the gas contents of the bubble are changed (39,42). Furthermore, the spectra show practically no evidence of OH emissions, and when He and Ar bubbles are considered, continue to iacrease ia iatensity even iato the deep ultraviolet. These spectra are reminiscent of blackbody emission with temperatures considerably ia excess of 5000 K and lend some support to the concept of an imploding shock wave (41). Several other alternative explanations for SBSL have been presented, and there exists considerable theoretical activity ia this particular aspect of SBSL. 

Optical Properties. The optical transmission of vitreous siUca is influenced by impurities and the forming process. Ultrapure vitreous siUca has the abihty to transmit from the deep ultraviolet, through the visible, and into the near-infrared spectral range. 

Collier, D., and Pantley, W., Deep Ultraviolet Coatings Resist Optical Damage, Laser Focus World, pp. 77-82 (Sept. 1997)... 

Broad optical transparency from the deep ultraviolet to the far infrared... 

Radiance A process for removing organic contaminants from the surfaces of semiconductors by irradiation with deep ultraviolet light while simultaneously passing an inert gas over the surface in laminar flow. Invented by A. Englesberg in 1987 and developed by Radiance Services Company, Bethesda, MD. 

Acid—base reactions, anhydrous hydrazine, 13 567-568 Acid Black 63, 6 559 Acid blue, herbicide/algicide for aquaculture in U.S., 3 214t Acid catalysis, deep-ultraviolet chemically amplified resists based on, 15 163-181 Acid catalysts, 10 493. See also Acidic catalysts... 

Deep-ultraviolet chemically amplified resists, 15 163-181 Deepwater barges, 25 327 Deep-well turbine pumps, 21 68 Deesterification, of aspartame, 24 227 DEET, 2 549t Defaunation, 10 871 D,E,F color scale, 7 310 Defect Action Levels (DALs), 23 160 Defects, in silicon-based semiconductors, 22 232... 

Films of polyphthalaldehyde, sensitized by cationic photoinitiators, have been imaged at 2-5-mJ/cm in the deep ultraviolet (DUV) (see Section 3.10), at 1 pC/cm (20 kV) electron beam radiation and at an unspecified dose of Al-A x-ray radiation. The ultimate utility of this "self-developing" resist system will depend upon its efficacy as an etch barrier. It seems clear that such materials would not serve as adequate etch masks for... 

P. Vitta, N. Kurilcik, S. Jursenas, et al., Fluorescence-lifetime identification of biological agents using deep ultraviolet light-emitting diodes, in Proc. SPIE-Int. Soc. Opt. Eng., 2005. 

Figure 6.1. The Jovian moon lo deep ultraviolet (UV) photolysis of its methane atmosphere proceeds with electron ejection, generating the molecular ion of methane (see color insert). NASA JPL Galileo program image from Voyager 1, http //www.jpl.nasa.gov/galileo/io/...

Nguyen, C.V., R.M.D. Stevens, J. Barber, J. Han, and M. Meyyappan. 2002. Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns. Appl. Phys. Lett. 81 901-903. 

Since the atmosphere shields us from most deep ultraviolet radiation and from infrared radiation, the bulk of visible light (the solar spectrum) ranges from 350 to 750 nm. The 25,000 Frauenhofer15 "dark" lines are interruptions (in the range 295 to 1000 nm) in the continuous solar emission spectrum, due to absorption by the chemical elements present in the sun s atmosphere. Ultraviolet radiation was discovered by Ritter16 in 1801. Some radio waves do penetrate the earth s atmosphere, and they are most intense during solar storms. Infrared radiation also penetrates to some extent. 

One of the methods under development at AT T Bell Laboratories for submicron lithography is deep ultraviolet projection photolithography. (O Fine line definition is obtained by use of 248 nm light and a lens of large numerical aperture. Because of the large chromatic aberration of the quartz lens a spectrally line-narrowed krypton fluoride excimer laser is used as a light source. 

Firtion, V. A. Jewell, T. E. Wilcomb, B. E. Clemens, J. T. Excimer Laser-Based Lithography A Deep Ultraviolet Wafer Stepper SPIE Conf. on Microlithography, March 13, 1986. 

Nakashima S-I, Okumura H, Yamamoto T, Shimidzu R (2004) Deep-ultraviolet Raman microspectroscopy characterization of wide-gap semiconductors. Appl Spectrosc 58 224... 

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