Chemical vapor deposition diamond film morphology

Clark, M. M., Raff, L. M., and Scott, H. L., Kinetic Monte Carlo studies of early surface morphology in diamond film growth by chemical vapor deposition of methyl radical. Phys. Rev. B 54, 5914-5919 (1996a). 

S. Matsumoto, and K. Okada, Modified thermal-plasma chemical vapor deposition of diamond films and the observation of surface morphology, OyoButuri, 61(7) 726-730 (1992)... 

S. S. Jiang, C. Z. Ge, and N. B. Ming, Morphologic study of (100) single crystal diamond films epitaxially grown by chemical vapor deposition, J. Cryst. Growth, 132(l-2) 200-204 (1993)... 

Figure 8.1 shows a series of ESEM micrographs taken immediately after an in situ chemical vapor deposition experiment. These pictures clearly indicate how the morphology of the deposited films of diamond on silicon depends upon the experimental conditions. A gas stream, at 15-20 torr, of 1% methane in hydrogen was flowed over a heated filament (2000 °C) to break down the methane into atomic carbon prior to deposition on the heated substrate (850 °C). This process was continued for 30 min to form films with a thickness of about 5 flm. The total pressure was then reduced to 4.3 torr for these pictures. 

C. C. Battaile, D. J. Srolovitz, and J. E. Butler, Diam. Relat. Mater., 6, 1198 (1997). Morphologies of Diamond Films from Atomic-Scale Simulations of Chemical Vapor Deposition. 

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