Chemical vapor deposition applications

C. C. Battaille, D. J. Srolvitz, J. E. Butler. A kinetic Monte Carlo method for the atomic-scale simulation of chemical vapor deposition application to diamond. J App Phys 52 6293, 1997. 

Lackey, W., Hanigofsky, J., and Freeman, G., Experimental Whisker Growth and Thermodynamic Study of the Hafnium-Carbon System for Chemical Vapor Deposition Applications, 7] Amer. Ceram. Soc., 73(6) 1593-98 (1990)... 

Metal aUcoxides and alkyls are useful starting materials, particularly for the preparation of some unsolvated P-diketones that require anhydrous conditions (see Section 3.3). Addition of /3-diketonate ligands to metal alkoxides has also been used to produce heteroleptic metal complexes that are less reactive than the homoleptic metal alkoxides this simplifies the use of such complexes in chemical vapor deposition applications. ... 

Chemical vapor deposition applications range from the semiconductor-microelectronics industry, to the coatings industry for wear resistance. A significant portion of the precursors are made by nucleophilic substitution reactions with Grignard reagents. The organic... 

C. C. Battaile, D. J. Srolovitz, and J. E. Butler,/. Appl. Phys., 82, 6293 (1997). A Kinetic Monte Carlo Method for the Atomic-Scale Simulation of Chemical Vapor Deposition Application to Diamond. 

J. E. J. Schmit2, Chemical Vapor Deposition of Tungsten andTungsten Silicidesfor VESI FJESI Applications, Noyes PubHcations, Park Ridge, N.J., 1992. 

The growing interest in volatile silyl-metal complexes for chemical vapor deposition reactions should also be mentioned. This technique is extremely useful for the preparation of silicide films in microelectronic devices. Further examples of applications of silicon-metal compounds are given in the appropriate sections. 

Chemical vapor deposition (CVD) has grown very rapidly in the last twenty years and applications of this fabrication process are now key elements in many industrial products, such as semiconductors, optoelectronics, optics, cutting tools, refractory fibers, filters and many others. CVD is no longer a laboratory curiosity but a maj or technology on par with other maj or technological disciplines such as electrodeposition, powder metallurgy, or conventional ceramic processing. 

Since the publication of the first edition of the Handbook of Chemical Vapor Deposition in early 1992, the technology has developed at a rapid rate and the number and scope of its applications and their impact of the market have increased considerably. The size of the CVD market today (1998) is estimated to be at least double that of the market six years ago. These factors led to the need to revise and expand the first edition of the Handbook. 

Chemical vapor deposition (C VD) is a versatile process suitable for the manufacturing of coatings, powders, fibers, and monolithic components. With CVD, it is possible to produce most metals, many nonmetallic elements such as carbon and silicon as well as a large number of compounds including carbides, nitrides, oxides, intermetallics, and many others. This technology is now an essential factor in the manufacture of semiconductors and other electronic components, in the coating of tools, bearings, and other wear-resistant parts and in many optical, optoelectronic and corrosion applications. The market for CVD products in the U.S. and abroad is expected to reach several billions dollars by the end of the century. 

Green, M. L., and Levy, R. A., Chemical Vapor Deposition of Metals for Integrated Circuit Applications, /. ofMetals, pp. 62-71 (June 1985)... 

Pickrell, D. J., and Hoover, D. S., Chemical Vapor Deposition of Diamond for Electronic Packaging Applications, Inside ISHM, pp. 11-15 (July/Aug. 1991)... 

Smith, P. M., et al., Chemical Vapor Deposition of Ternary Refractory Nitrides for Difiusion Barrier Applications, Proc. 13th. Int. Conf. on VLSI Multilevel Interconnections, Sandia National Labs., Albuquerque, NM (1996)... 

Chemical vapor deposition competes directly with other coating processes which, in many cases, are more suitable for the application under consideration. These competing processes comprise the physical vapor deposition (PVD) processes of evaporation, sputtering, and ion plating, as well as the molten-material process of thermal spray and the liquid-phase process of solgel. A short description of each process follows. For greater detail, the listed references should be consulted. 

Mg(THF), when the stoichiometry was 1 2. Monomeric and dimeric amidinate complexes of magnesium have been studied in detail with respect to potential applications of these compounds in the chemical vapor deposition of magnesium-doped Group 13 compound semiconductor films. The reactions and products are summarized in Scheme 16. ... 

Hitchman, M. L. and Jensen, K. F., Chemical Vapor Deposition Principles and Applications, Academic Press, New York, 1997. 

Application of Supercomputers To Model Fluid Itansport and Chemical Kinetics in Chemical Vapor Deposition Reactors... 

Consider Equations (6-10) that represent the CVD reactor problem. This is a boundary value problem in which the dependent variables are velocities (u,V,W), temperature T, and mass fractions Y. The mathematical software is a stand-alone boundary value solver whose first application was to compute the structure of premixed flames.Subsequently, we have applied it to the simulation of well stirred reactors,and now chemical vapor deposition reactors. The user interface to the mathematical software requires that, given an estimate of the dependent variable vector, the user can return the residuals of the governing equations. That is, for arbitrary values of velocity, temperature, and mass fraction, by how much do the left hand sides of Equations (6-10) differ from zero ... 

Zinc sulfide, with its wide band gap of 3.66 eV, has been considered as an excellent electroluminescent (EL) material. The electroluminescence of ZnS has been used as a probe for unraveling the energetics at the ZnS/electrolyte interface and for possible application to display devices. Fan and Bard [127] examined the effect of temperature on EL of Al-doped self-activated ZnS single crystals in a persulfate-butyronitrile solution, as well as the time-resolved photoluminescence (PL) of the compound. Further [128], they investigated the PL and EL from single-crystal Mn-doped ZnS (ZnS Mn) centered at 580 nm. The PL was quenched by surface modification with U-treated poly(vinylferrocene). The effect of pH and temperature on the EL of ZnS Mn in aqueous and butyronitrile solutions upon reduction of per-oxydisulfate ion was also studied. EL of polycrystalline chemical vapor deposited (CVD) ZnS doped with Al, Cu-Al, and Mn was also observed with peaks at 430, 475, and 565 nm, respectively. High EL efficiency, comparable to that of singlecrystal ZnS, was found for the doped CVD polycrystalline ZnS. In all cases, the EL efficiency was about 0.2-0.3%. 

The GRADEIS listed are named for the usage to which they are applied, and are usually minimum purities required for the particular application. Fiber optic materials are currently prepared by chemical vapor deposition techniques because any handling of materials introduces impurities. 

The most intensive development of the nanoparticle area concerns the synthesis of metal particles for applications in physics or in micro/nano-electronics generally. Besides the use of physical techniques such as atom evaporation, synthetic techniques based on salt reduction or compound precipitation (oxides, sulfides, selenides, etc.) have been developed, and associated, in general, to a kinetic control of the reaction using high temperatures, slow addition of reactants, or use of micelles as nanoreactors [15-20]. Organometallic compounds have also previously been used as material precursors in high temperature decomposition processes, for example in chemical vapor deposition [21]. Metal carbonyls have been widely used as precursors of metals either in the gas phase (OMCVD for the deposition of films or nanoparticles) or in solution for the synthesis after thermal treatment [22], UV irradiation or sonolysis [23,24] of fine powders or metal nanoparticles. 

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