Total Reflection X-ray Fluorescence Spectroscopy

Acronyms TXRF or TRXRF total reflection X-ray fluorescence. [Pg.580]

An X-ray beam hits a flat sample at a highly grazing angle so that total external reflection occurs. As a result the X-rays only penetrate the top few atomic layers, where they cause X-ray fluorescence emission. Thus this technique combines high surface sensitivity with the high atomic sensitivity of the (otherwise normally bulk sensitive) fluorescence technique. [Pg.580]

The sample need not be conducting but must be very flat due to the grazing incidence of the beam, and TXRF is often used on silicon wafers. [Pg.581]

Quantitative element specific and surface specific measurement of extremely low atomic concentrations on flat surfaces. [Pg.581]

In addition to the electrochemical techniques, many surface analytical techniques are constantly in use, such as ellipsome-try for the surface thin oxide thickness, multiple reflection infrared spectroscopy (MIR), and X-ray photoelectron spectroscopy (XPS) for surface layer composition, total reflection X-ray fluorescence spectroscopy (TXRFS) for the metal surface contaminants, and naturally atomic force microscopy (AFM) for the surface roughness profile. [Pg.309]

TXRF Total-reflection x-ray fluorescence spectroscopy X-ray Fluorescent x-ray... [Pg.62]

Klockenkamper et al. (1992) provide a review dedicated to Total-reflection X-ray fluorescence spectroscopy (TXRF). [Pg.1593]

Energy dispersive and total reflection X-ray fluorescence spectroscopy Link Analytical Ltd. Oxford Systems Philips Electronic Instruments Richard Seifert Sc Co. Traor Europa BV... [Pg.660]

Energy Dispersive and Total Reflection X-ray Fluorescence Spectroscopy... [Pg.200]

XRF is closely related to the EPMA, energy-dispersive X-Ray Spectroscopy (EDS), and total reflection X-Ray Fluorescence (TRXF), which are described elsewhere in this encyclopedia. Brief comparisons between XRF and each of these three techniques are given below. [Pg.346]

GPC (total radioactive strontium) = beta gas proportional counter Bq = Becquerel dpm = disintegrations per minute EDTA = ethylenediamine tetraacetic acid GFAAS (total strontium) = graphite furnace atomic absorption spectroscopy ICP-AES (total strontium) = inductively coupled plasma atomic emission spectroscopy ICP-MS (isotopic strontium composition) = inductively coupled plasma-mass spectrometry LSC (isotopic quanitification of 89Srand 90Sr) = liquid scintillation counting pCi = pico curies (10-12 curies) PIXE (total strontium) = proton induced x-ray emission TMAH = tetramethylammonium hydroxide TNA (total strontium) = thermal neutron activation and radiometric measurement TRXF (total strontium) = total-reflection x-ray fluorescence... [Pg.286]

Hegde RI, Tobin J, Fiordalice RW, Travis EO (1993) Nucleation and growth of chemical vapor deposition TiN films on Si (100) as studied by total reflection X-ray fluorescence, atomic force microscopy, and Auger electron spectroscopy. J Vac Sci Technol A 11 1692-1695 Henderson MA (2002) The interaction of water with sohd surfaces fundamental aspects revisited. Surf. Sci. Rep. 46 1-308... [Pg.313]

Hettl P, Angloher G, Feilitzsch F, Hohne J, Jochum J, Kraus H, Mossbauer RL (1999) High-resolution X-ray spectroscopy with superconducting tunnel junctions. X-ray Spectrom 28 309-311 Injuk J, Van Grieken R, Klockenkamper R, von Bohlen A, Kump P (1997) Performance and Characteristics of two total-reflection X-ray fluorescence and a particle induced X-ray emission setup for aerosol analysis. Spectrochim Acta 52 977-984... [Pg.313]

Schwenke H, Beaven PA, Knoth J (1999) Applications of total reflection X-ray fluorescence spectrometry in trace element and surface analysis. Fresenius J Anal Chem 365 19-27 Towle SN, Brown GE, Parks GA (1999a) Sorption of Co(II) on metal oxide surfaces I. Identification of specific binding sites of Co(II) on (110) and (001) surfaces of Ti02 (rutile) by grazing-incidence XAFS spectroscopy. J Coll Interface Sci 217 299-311... [Pg.314]

Toelg, G., Klockenkaemper, R., 1993. The role of total-reflection X-ray fluorescence in atomic spectroscopy. Spectrochim. Acta 488, 111-127. [Pg.184]

See also Asbestos. Color Measurement. Forensic Sciences Thin-Layer Chromatography. Gas Chromatography Pyrolysis Mass Spectrometry Fourier Transform Infrared Spectroscopy. Microscopy Applications Forensic. Spectrophotometry Diode Array. Textiles Natural Synthetic. X-Ray Absorption and Diffraction X-Ray Diffraction - Powder. X-Ray Fluorescence and Emission X-Ray Fluorescence Theory Energy Dispersive X-Ray Fluorescence Total Reflection X-Ray Fluorescence. [Pg.1672]

Neumann, C., Eichinger, P. (1991) Ultra-trace analysis of metaUic contaminations on silicon wafer surfaces by vapour phase decomposition/total reflection X-ray fluorescence (VPD/TXRF). Spectrochimica Acta Part B Atomic Spectroscopy, 46,1369-1377. [Pg.928]

Funahashi, M., Matsuo, M., Kawada, N., Yamagami, M., Wilson, R. (1999) Enhanced analysis of particles and vapor phase decomposition droplets by total-reflection X-ray fluorescence. Spectrochimica Acta Part B Atomic Spectroscopy, 54,1409-1426. [Pg.928]

Frost, M.R., Harrington, W.L., Downey, D.F., Walther, S.R. (1996) Surface metal contamination during ion implantation comparison of measurements by secondary ion mass spectroscopy, total reflection x-ray fluorescence spectrometry, and vapor phase decomposition used in conjunction with graphite furnace atomic absorption spectrometry and inductively coupled plasma mass spectrometry. Journal of Vacuum Science Technology B Microelectronics and Nanometer Structures, 14, 329— 335. [Pg.929]

N.L. Misra, K.D. Singh Mudher, V.C. Adya, B. Rajeswari, and V. Venugopal. Determination of trace elements in uranium oxide by total reflection X-ray fluorescence spectrometry. Spectro-chimica Acta Part B—Atomic Spectroscopy 60 834-840, 2005. [Pg.308]

Thermal scanning microscopy Temperature-time profile Time/temperature resolved pyrolysis mass spectrometry Thermal ultraviolet Thermal volatilisation analysis Thermal wave infrared imaging Transmission X-ray microscopy Total-reflection X-ray fluorescence (c/r. TRXRF) Ultrasonic force microscopy Ultraviolet photoelectron spectroscopy Ultrasound... [Pg.778]

Important to quality control are the comparison and confirmation of drug substance identity, excipients, and packaging components. Techniques such as Fourier transform IR (FTIR), attenuated total reflectance (ATR), NIR, Raman spectroscopy are used with increased regularity. The detection of foreign metal contaminants is essential with inductively coupled plasma spectroscopy (ICP), atomic absorption (AA), and X-ray fluorescence. Also notable is the increased attention to analysis of chiral compounds, as in the synthesis of drug substances. Optical rotation, ORD, and CD are currently the preferred instruments for this practice. The analytical techniques commonly used in the preformulation study are discussed in the following. [Pg.215]

Reus U, Markeit B, Hoffmeister C, Spott D, Guhr H (1993) Determination of trace metals in river water and suspended solids by TXRF spectroscopy A methodical study on analytical performance and sample homgeneity. Fresenius J Anal Chem 347 430-435 Sanchez HJ. (2001) Detection limit calculations for the total reflection techniques of X-ray fluorescence analysis. Spectrochimica Acta 56 2027-2036... [Pg.314]

X-ray photoelectron spectroscopy Surface plasmon resonance Quartz crystal microbalance Waveguide interfaometry (Spectroscopic) eUipsometry Fluorescence spectroscopy and microscopy (including immunofluorescence, total internal reflection fluorescence)... [Pg.168]