Polymeric materials/polymers photoresists

The sulfonic acid moiety has been iacorporated iato a variety of nonfluofinated polymeric materials (111). Chain-end sulfonated polymers are produced by the reaction of sultones with polymeric organolithiums (112). Polymeric sulfonic acids such as these are iacorporated ia positive-working photoresist compositions (113). 

Polymers and polymerization—Congresses. 2. Photoresists—Congresses. 3. Microlithography—Materials—Congresses. 

All near-UV positive photoresists are two-component systems the polymeric material is a low molecular weight novolac polymer (Figure 6.5) and the sensitiser is a derivative of a 1,2-diazonaphthoquinone (DNQ) (20%-50% by weight). DNQ forms a complex with the phenol groups of the novolac resin and prevents the dissolution of the latter in an aqueous base. 

Polymeric materials are used as the basis of photoresists for making metal patterns on printed circuit boards, and also on the individual integrated circuit devices themselves. The circuit boards are made of various glass-fibre filled epoxides and polyesters, and are usually coated with other polymeric materials to prevent tarnishing and to improve solderability. The devices that are mounted on the completed printed circuit boards may have been manufactured using polymeric photoresists or have plastics such as polypropylene and polyester films in capacitors or epoxide resins in integrated circuits and transistors. The completed boards containing various devices are often then coated in another protective polymer. Finally, electrical connections are made... 

Electronic components are one of the few groups of products in which the real cost performance function has declined significantly over the years, and part of the reason can be directly attributed to the availability and performance of new polymeric materials. The evolution of the personal computer is a specific example, where improvements in polymer-based photoresists and plastic encapsulation techniques have allowed the mass production of high-density memories and microprocessors at a cost which yields machines more powerful than mainframe computers of 30 years ago for little more than the price of a toy. 

A fundamental difference of laterally structured thin layers of grafted (collapsed) polymer chains compared to the normal spin-coated and hence only phy-sisorbed photoresist films is their remarkable stability even after extended exposure to good solvents the burned-in pattern remains on the substrate with excellent fidelity while the spin-cast film can be washed away completely. However, the high doses of UV photons needed to etch away the polymeric material makes this a rather uneconomic process. 

During the past few decades, processes based on the interaction of visible and ultraviolet (Vis/UV) light with polymers have become important for various technical applications. The latter include the use of polymeric photoresists in the production of computer chips, and the use of nonlinear optical polymeric materials as core materials for optical wave guides. Polymers are employed in... 

Photochemical reactions in organic solids are important in practical fields as diverse as photography, biology, photoresist technology, polymerization, and the decomposition and stabilization of dyes, energetic materials, pharmaceuticals, and polymers [1], They have been equally important in basic research, particularly for preparing matrix-isolated reactive intermediates for spectroscopic investigation [2]. 

Polysilane high polymers possessing fully saturated all-silicon backbone have attracted remarkable attention recently because of their unique optoelectronic properties and their importance in possible applications as photoresists, photoconductors, polymerization initiators, nonlinear optical materials etc. A number of review articles have been published on this topic4-9. The studies in this field have stimulated both experimental and theoretical chemists to elaborate on understanding the excited state nature of polysilanes and oligosilanes and of their mechanistic photochemistry. 

A photoresist is used which is sensitive to radiation. The radiation polymerizes the spin-coated material locally (light can easily be focussed on a desired spot by masks) and stabilizes it against the following etching step. After radiation a washing step is included to remove the unpolymerized part (the hole in this case). Afterwards the gold and chromium layers are chemically etched and the polymer mask is removed completely, chemically. 

CARS microscopy has emerged as a highly sensitive analytical tool for vibrational bioimaging, predominantly, of lipids in membrane model systems [69, 81-84], live unstained cells [85-95, 43], and both ex vivo and in vivo tissues [26, 96-103, 43]. Examples of CARS imaging applications in the physical and material sciences include the study of fracture dynamics in drying silica nanoparticle suspensions [104], patterned polymeric photoresist film [105], drug molecules in a polymer matrix [106], and liquid crystals [107, 108],... 

---