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MOST devices

In addition, most devices provide operator control of settings for temperature and/or response slope, isopotential point, zero or standardization, and function (pH, mV, or monovalent—bivalent cation—anion). Microprocessors are incorporated in advanced-design meters to faciHtate caHbration, calculation of measurement parameters, and automatic temperature compensation. Furthermore, pH meters are provided with output connectors for continuous readout via a strip-chart recorder and often with binary-coded decimal output for computer interconnections or connection to a printer. Although the accuracy of the measurement is not increased by the use of a recorder, the readabiHty of the displayed pH (on analogue models) can be expanded, and recording provides a permanent record and also information on response and equiHbrium times during measurement (5). [Pg.467]

Most devices are designed for a constant potential and, as a result, power is usually distributed to loads at constant potential. Two possible configurations for delivering a constant potential to multiple loads are illustrated in Figure 2-73. In the parallel circuit, the potential across the load decreases as the distance from the source increases. For the loop circuit, potentials are more nearly equal along the length of the circuit. [Pg.294]

Because there is no depletion layer between the substrate and the conducting channel, the equations of the current-voltage curves are in fact simpler in the TFT than in the MISFET, provided the mobility can still be assumed constant (which is not actually the case in most devices, as will be seen below). Under such circumstances, the charge induced in the channel is given, in the case of an /l-channel, by Eq. (14.23). In the accumulation regime, the surface potential Vs(x) is the sum of two contributions (i) the ohmic drop in the accumulation layer, and (ii) a term V(x) that accounts for the drain bias. The first term can be estimated from Eqs. (14.15), (14.16) and (14.19). In the accumulation regime, and provided Vx>kT/q, the exponential term prevails in Eq. (14.16), so that Eq. (14.15) reduces to... [Pg.563]

The purpose of all the conformity assessment procedures is to ensure that the device as designed and as subsequently manufactured will meet the essential requirements. For most devices where Notified Body involvement is required, the manufacturer may choose between the strategies of relying on the application of appropriate quality systems or independent testing to demonstrate this. [Pg.196]

In most devices the liquid crystal molecules are confined between two thin walls which act as capacitor plates. This allows the determination of the dielectric properties of the liquid crystalline material through the simple relations... [Pg.13]

There are commercially available in-line or on-line viscometer devices. In-line devices are installed directly in the process while on-line devices are used to analyze a side stream of the process. Most devices are based on measuring the pressure drop and flow rate through a capillary. The viscosity is either determined at a single shear rate or, at most, a few shear rates. Complex fluids, on the other hand, exhibit a viscosity that cannot be so easily characterized. In order to capture enough information that allows, for example, a molecular weight distribution to be inferred, it is necessary to determine the shear viscosity over reasonably wide ranges of shear rates. [Pg.384]

C Linewidth Control, This parameter refers to the necessity of maintaining the correct features size across an entire substrate and from one substrate to another. This is important since the successful performance of most devices depends upon control of the size of critical structures, as for example in the gate electrode structure in an MOS device. As feature size is decreased and circuit elements packed closer together, the margin of error on feature size control is reduced. The allowable size variation on structures is generally a fixed fraction of the nominal feature size. A rule of thumb is that the dimensions must be controlled to tolerances of at least 1/5 the minimum feature size. Linewidth control is affected by a variety of parame-... [Pg.172]

Figure 8 Device chip yield as a function of mask defects (using the defect parameter x) for 1, 5 and 10 mask levels. Most devices use 7-10 levels. Figure 8 Device chip yield as a function of mask defects (using the defect parameter x) for 1, 5 and 10 mask levels. Most devices use 7-10 levels.
Although several hepatocyte-based Ever support systems have been proposed, there is no current consensus on its eventual design configuration. The most devices used currently are based on conventional hollow fiber membranes, and there are many opportunities for bioengineers to design new bioreactors that will optimize device function, particularly with regard to oxygen and nutrient provision. [Pg.108]

Unfortunately, where the power is used is not where the bulk of power devices are sold. Most devices that are sold are for low-voltage (below 300V) and low-current applications in markets where SiC is not competitive. [Pg.24]

In addition, most devices provide operator control of settings for temperature and/or response slope, i.sopolential point, zero or standardization, and function (pH. mV. or monovalent-bivalent cation-nrioni Microprocessors are incorporated in advanced-design meters to facilitate calibration, calculation of measurement parameters, and automatic temperature compensation. [Pg.805]

The LPE growth system must provide a driving force for nucleation of the solid film, a physical means of contacting a liquid solution to the substrate, an efficient way of removing the solution from the substrate after growth, and, for most device applications, a method of repeating the growth process from a solution of different composition. [Pg.117]

If we analyze different mechanical emulsification techniques and relate the pressure gradient to the work required W (energy input) we find that for most devices the mean radius of drops R scales with... [Pg.262]

There are many pitfalls in measuring the properties of aerosols. One of the most critical is sampling of particulate matter without disturbing the aerial suspension. There are some optical devices that make measurements of an aerosol in situ without disturbance. However, most devices requires that a small sample be taken from the gas-particle suspension. Because of inertial forces acting on particles, it can be deduced readily that siphoning part of the fluid... [Pg.68]

Major improvements have been achieved by modification of the insulator-semiconductor interface. Most devices are grown by vapor deposition on silicon oxide. Because of the different physical and chemical nature of both materials, their association may lead to highly disordered interfaces, thus leading to poor performance. Heating the substrate [27, 78, 79] and depositing at a low rate [30, 78]... [Pg.24]

Fig. 3. Diffusion length as a function of exposure time to simulated 1-sun illumination ( 100 mW cm-2). Most device-quality films exhibit behavior intermediate to the curves shown here. Fig. 3. Diffusion length as a function of exposure time to simulated 1-sun illumination ( 100 mW cm-2). Most device-quality films exhibit behavior intermediate to the curves shown here.
Most devices rely on the use of disposable one-use-only test strips , and a droplet of blood from a needle-prick is drawn, for example, from the thumb, onto the strip by capillary action. The strip represents the recognition element, and the blood sample undergoes an enzymatic chemical reaction followed by another reaction. After the blood is added to the test strip it is inserted into the hand-held device (transducer) and sufficient time allowed for the reactions to occur, most often automatically determined by the device itself. [Pg.94]


See other pages where MOST devices is mentioned: [Pg.2046]    [Pg.441]    [Pg.21]    [Pg.252]    [Pg.316]    [Pg.57]    [Pg.936]    [Pg.386]    [Pg.134]    [Pg.488]    [Pg.107]    [Pg.216]    [Pg.101]    [Pg.81]    [Pg.40]    [Pg.362]    [Pg.22]    [Pg.148]    [Pg.4]    [Pg.245]    [Pg.78]    [Pg.30]    [Pg.45]    [Pg.131]    [Pg.235]    [Pg.388]    [Pg.4]    [Pg.131]    [Pg.21]    [Pg.2]    [Pg.614]    [Pg.504]    [Pg.1804]    [Pg.148]   


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