Chloride cupric

The next example was a post on the Hive by a bee named TaRa (Could be an alias of TDK. Strike ain t sure.). It is essentially the same old song except this girl proved that CuCl2 (cupric chloride) can indeed be used in place of CuCl (cuprous chloride). It also gives you more examples of technique. The more of this one has the more confident they will be in their understanding of the method. 

During the reaction, the palladium catalyst is reduced. It is reoxidized by a co-catalyst system such as cupric chloride and oxygen. The products are acryhc acid in a carboxyUc acid-anhydride mixture or acryUc esters in an alcohoHc solvent. Reaction products also include significant amounts of 3-acryloxypropionic acid [24615-84-7] and alkyl 3-alkoxypropionates, which can be converted thermally to the corresponding acrylates (23,98). The overall reaction may be represented by ... 

Loaded Adsorbents. Where highly efficient removal of a trace impurity is required it is sometimes effective to use an adsorbent preloaded with a reactant rather than rely on the forces of adsorption. Examples include the use of 2eohtes preloaded with bromine to trap traces of olefins as their more easily condensible bromides 2eohtes preloaded with iodine to trap mercury vapor, and activated carbon loaded with cupric chloride for removal of mercaptans. 

The direct oxidation of ethylene is used to produce acetaldehyde (qv) ia the Wacker-Hoechst process. The catalyst system is an aqueous solution of palladium chloride and cupric chloride. Under appropriate conditions an olefin can be oxidized to form an unsaturated aldehyde such as the production of acroleia [107-02-8] from propjiene (see Acrolein and derivatives). 

Tantalum and 2kconium exhibit the highest corrosion resistance to HCl. However, the corrosion resistance of 2ironium is severely impaHed by the presence of ferric or cupric chlorides. Tantalum—molybdenum alloys containing more than 50% tantalum are reported to have exceUent corrosion resistance (see Molybdenumand molybdenum alloys) (69). Pure molybdenum and tungsten are corrosion resistant in hydrochloric acid at room temperature and also in 10% acid at 100°C but not in boiling 20% acid. 

A 90% yield of isoquinoline (>95% pure) was reported by treating a cmde fraction with hydrochloric acid followed by addition of an alcohoHc solution of cupric chloride in a mole ratio of 1 2 CUCI2/isoquinoline (40). A slighdy lower yield of 2-methylquinoline [91-63-4] (97.5% pure) was obtained from bituminous coal using 30% aqueous urea to form a clathrate (41). 

Vinyl chloride reacts with ammonium chloride [12125-02-9] and oxygen in the vapor phase at 325°C over a cupric chloride [7447-39-4] CuCl, catalyst to make 1,1,2-trichloroethane and ammonia (68). 

Addition Chlorination. Chlorination of olefins such as ethylene, by the addition of chlorine, is a commercially important process and can be carried out either as a catalytic vapor- or Hquid-phase process (16). The reaction is influenced by light, the walls of the reactor vessel, and inhibitors such as oxygen, and proceeds by a radical-chain mechanism. Ionic addition mechanisms can be maximized and accelerated by the use of a Lewis acid such as ferric chloride, aluminum chloride, antimony pentachloride, or cupric chloride. A typical commercial process for the preparation of 1,2-dichloroethane is the chlorination of ethylene at 40—50°C in the presence of ferric chloride (17). The introduction of 5% air to the chlorine feed prevents unwanted substitution chlorination of the 1,2-dichloroethane to generate by-product l,l,2-trichloroethane. The addition of chlorine to tetrachloroethylene using photochemical conditions has been investigated (18). This chlorination, which is strongly inhibited by oxygen, probably proceeds by a radical-chain mechanism as shown in equations 9—13. 

Oxychlorination. This is an important process for the production of 1,2-dichloroethane which is mainly produced as an intermediate for the production of vinyl chloride. The reaction consists of combining hydrogen chloride, ethylene, and oxygen (air) in the presence of a cupric chloride catalyst to produce 1,2-dichloroethane (eq. 24). The hydrogen chloride produced from thermal dehydrochlorination of 1,2-dichloroethane to produce vinyl chloride (eq. 25) is usually recycled back to the oxychlorination reactor. The oxychlorination process has been reviewed (31). 

The first large-scale commercial oxychlorination process for vinyl chloride was put on-stream in 1958 by The Dow Chemical Company. This plant, employing a fixed-tube reactor containing a catalyst of cupric chloride on an active carrier, produced 1,2-dichloroethane from ethylene. The high temperatures involved in the reaction were moderated by a suitable diluent. The average heat output from the reaction is 116 kJ/mol (50,000 Btu/lb mol). 

Feeding 1,2-dichloroethane, hydrogen chloride, and oxygen onto a fluidized bed at 400°C produces trichloroethylene and tetrachloroethylene. The catalyst bed consists of cupric chloride and potassium chloride on graphite. A modified oxychlorination technique known as the Transcat process has been developed by the Lummus Co. (32). The feedstock can be a saturated hydrocarbon or chlorohydrocarbon and the process is suited to the production of and chlorohydrocarbons. 

Dichloroethane is produced by the vapor- (28) or Hquid-phase chlorination of ethylene. Most Hquid-phase processes use small amounts of ferric chloride as the catalyst. Other catalysts claimed in the patent Hterature include aluminum chloride, antimony pentachloride, and cupric chloride and an ammonium, alkaU, or alkaline-earth tetrachloroferrate (29). The chlorination is carried out at 40—50°C with 5% air or other free-radical inhibitors (30) added to prevent substitution chlorination of the product. Selectivities under these conditions are nearly stoichiometric to the desired product. The exothermic heat of reaction vapori2es the 1,2-dichloroethane product, which is purified by distillation. 

Dichloroethylene can be produced by direct chlorination of acetylene at 40°C. It is often produced as a by-product ia the chlorination of chloriaated compounds (2) and recycled as an iatermediate for the synthesis of more useful chloriaated ethylenes (3). 1,2-Dichloroethylene can be formed by contiauous oxychloriaation of ethylene by use of a cupric chloride—potassium chloride catalyst, as the first step ia the manufacture of vinyl chloride [75-01-4] (4). 

Oxychlorination of Ethylene or Dichloroethane. Ethylene or dichloroethane can be chlorinated to a mixture of tetrachoroethylene and trichloroethylene in the presence of oxygen and catalysts. The reaction is carried out in a fluidized-bed reactor at 425°C and 138—207 kPa (20—30 psi). The most common catalysts ate mixtures of potassium and cupric chlorides. Conversion to chlotocatbons ranges from 85—90%, with 10—15% lost as carbon monoxide and carbon dioxide (24). Temperature control is critical. Below 425°C, tetrachloroethane becomes the dominant product, 57.3 wt % of cmde product at 330°C (30). Above 480°C, excessive burning and decomposition reactions occur. Product ratios can be controlled but less readily than in the chlorination process. Reaction vessels must be constmcted of corrosion-resistant alloys. 

Cupric chloride or copper(II) chloride [7447-39 ], CUCI2, is usually prepared by dehydration of the dihydrate at 120°C. The anhydrous product is a dehquescent, monoclinic yellow crystal that forms the blue-green orthohombic, bipyramidal dihydrate in moist air. Both products are available commercially. The dihydrate can be prepared by reaction of copper carbonate, hydroxide, or oxide and hydrochloric acid followed by crystallization. The commercial preparation uses a tower packed with copper. An aqueous solution of copper(II) chloride is circulated through the tower and chlorine gas is sparged into the bottom of the tower to effect oxidation of the copper metal. Hydrochloric acid or hydrogen chloride is used to prevent hydrolysis of the copper(II) (11,12). Copper(II) chloride is very soluble in water and soluble in methanol, ethanol, and acetone. 

Copper etchants do not directly influence the electroless plating process, but are used merely to remove unwanted copper, and should not affect the deposit properties. The costs of waste treatment and disposal have led to disuse of throw-away systems such as chromic—sulfuric acid, ferric chloride, and ammonium persulfate. Newer types of regenerable etchants include cupric chloride, stabilized peroxide, and proprietary ammoniacal etchant baths. 

The CASS Test. In the copper-accelerated acetic acid salt spray (CASS) test (42), the positioning of the test surface is restricted to 15 2°, and the salt fog corrosivity is increased by increasing temperature and acidity, pH about 3.2, along with the addition of cupric chloride dihydrate. The CASS test is used extensively by the U.S. automobile industry for decorative nickel—chromium deposits, but is not common for other deposits or industries. Exposure cycle requirements are usually 22 hours, rarely more than 44 hours. Another corrosion test, now decreasing in use, for decorative nickel—chromium finishes is the Corrodkote test (43). This test utilizes a specific corrosive paste combined with a warm humidity cabinet test. Test cycles are usually 20 hours. 

The reaction is carried out ia a bubble column at 120—130°C and 0.3 MPa (3 bar). Palladium chloride is reduced to palladium duriag the reaction, and then is reoxidized by cupric chloride. Oxygen converts the reduced cuprous chloride to cupric chloride. 

Another process where good temperature control is essential is the synthesis of vinyl chloride by chlorination of ethylene at 200 to 300°C (392 to 572°F), 2 to 10 atm (29.4 to 147 psi), with supported cupric chloride, but a process with multitubular fixed beds is a strong competitor. 

Cupric chloride can be used, but it tends to chlorinate the products and cuprous chloride is preferable reagent grade dimethylformamide (DMF) was distilled before use. 

Cupric chloride [7447-39-4] M 134.4, m 498 , 630 (dec). Crystd from hot dilute aq HCl (0.6mL/g) by cooling in a CaCl2-ice bath. Dehydrated by heating on a steam-bath under vacuum. It is deliquescent in moist air but efflorescent in dry air. 

A one-stage process for producing vinyl acetate directly from ethylene has also been disclosed. In this process ethylene is passed through a substantially anhydrous suspension or solution of acetic acid containing cupric chloride and copper or sodium acetate together with a palladium catalyst to yield vinyl acetate. 

CUPRIC CHLORATE CUPRIC CHLORIDE CUPRIC NITRATE CUPRIC OXALATE CUPRIC SULFATE... 

Chemical Designations - Synonyms Cupric Chloride Dehydrate Eriochalcite (anhydrous) Chemical Formula CuCljHjO. 

Cupri-. cupric, copper(II). -azetst, n. cupric acetate, copper(II) acetate, -carbonat, n. cupric carbonate, copper(II) carbonate, -chlorid, n. cupric chloride, copper(II) chloride. -hydroxyd, n. cupric hydroxide, cop-per(II) hydroxide. -ion, n. cupric ion, copper(II) ion. -ozalat, n. cupric oxalate, copper(II) oxalate, -oxyd, n. cupric oxide, copper(II) oxide. -salz, n. cupric salt, copper(II) salt, -suifat, n. cupric sulfate. copper(II) sulfate, -sulfid, n. cupric sulfide, copper(II) sulfide, -verbihdung, /. cupric compound, copper(II) compound, -wein-saure, /. cupritartaric acid. 

Kupfer-bromid, n. copper bromide, specif, cupric bromide, copper(II) bromide, -bro-mtir, n. cuprous bromide, copper(I) bromide, -chlorid, n. copper chloride, specif, cupric chloride, copper(II) chloride, -chloriir, n. cuprous chloride, copper(I) chloride, -cyamd, Ti. copper cyanide, specif, cupric cyanide, copper(II) cyanide, -cyaniir, n. cuprous cyanide, copper(I) cyanide, -dom, m. slag from liquated copper, -draht, m. copper wire, -drahtnetz, n. copper gauze, -drehspane,... 

After the addition had been completed, the acidic solution containing p-acetylphenyldiazo-nium chloride formed in the above reaction was added dropwise with stirring to a mixture of 530 ml of glacial acetic acid and 530 ml of benzene which had been previously cooled, and the cooled solution saturated with sulfur dioxide and to which had been added 34 g of cupric chloride dihydrate. After the addition had been completed, the reaction mixture was stirred at about 40°C for three hours, and was then poured into 3,000 ml of an ice-water mixture. 

Both R and MMA radicals are found to be responsible for the photoinitiation process. Chaturvedi and coworkers [54,55] introduced phenyl dimethyl sulfonium-ylide cupric chloride and chromium thiophene carboxylate as the photoinitiator of styrene and MMA. No reaction mechanism was given for these systems. 

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