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Vapor deposition method

Metallization layers are generally deposited either by CVD or by physical vapor deposition methods such as evaporation (qv) or sputtering. In recent years sputter deposition has become the predominant technique for aluminum metallization. Energetic ions are used to bombard a target such as soHd aluminum to release atoms that subsequentiy condense on the desired substrate surface. The quaUty of the deposited layers depends on the cleanliness and efficiency of the vacuum systems used in the process. The mass deposited per unit area can be calculated using the cosine law of deposition ... [Pg.348]

The vapor deposition method at variable substrate temperature provides additional insight into the structure and wetting properties of 8CB in its various phases. If the substrate temperature is between 41 and 33°C, fiat islands 32 A thick are formed if only a small amount of 8CB is condensed on the surface. The size of these fiat islands increases with deposition time while their height remains constant until a uniform layer is formed. If more 8CB is deposited, droplets form on top of the film. This is shown in the image of Figure 14. [Pg.262]

Guerin S, Hayden BE. 2006. Physical vapor deposition method for the high-throughput synthesis of solid-state material libraries. J Comb Chem 8 66-73. [Pg.588]

Carbon coated Si-based anode materials were successfully synthesized by chemical vapor deposition methods. Coated materials performed well during the coin cell testing. Future work on this section... [Pg.342]

J. Yu and H.X. Ju, Preparation of porous titania sol-gel matrix for immobilization of horseradish peroxidase by a vapor deposition method. Anal. Chem. 74, 3579-3583 (2002). [Pg.548]

J. Yu, S. Liu, and H.X. Ju, Mediator-free phenol sensor based on titania sol-gel encapsulation matrix for immobilization of tyrosinase by a vapor deposition method. Biosens. Bioelectron. 19, 509-514 (2003). [Pg.550]

Anode materials are most typically deposited by evaporation, sputtering, or chemical vapor deposition methods. Other methods such as screen printing, laser ablation, electrochemical deposition, etc., have also been used. [Pg.302]

Liu J, Czerw R, Carroll DL (2005a) Large-scale synthesis of highly aligned nitrogen doped carbon nanotubes by injection chemical vapor deposition methods. Journal of Materials Research 20 538-543. [Pg.262]

Hi) Chemical Vapor Deposition Method All commercial production of MWCNTs is based on catalytic CVD processes. The CVD processes are basically of two types the catalyst is either deposited on a substrate or the catalyst precursor is continuously fed with the gas stream. [Pg.393]

John Angus (CWRU) has suggested Dial an alternative route for growing gem-size diamonds may develop from the vapor deposition methods now used for growing diamond films. [Pg.485]

Chapter 10 deals with composite films synthesized by the physical vapor deposition method. These films consist of dielectric matrix containing metal or semiconductor (M/SC) nanoparticles. The film structure is considered and discussed in relation to the mechanism of their formation. Some models of nucleation and growth of M/SC nanoparticles in dielectric matrix are presented. The properties of films including dark and photo-induced conductivity, conductometric sensor properties, dielectric characteristics, and catalytic activity as well as their dependence on film structure are discussed. There is special focus on the physical and chemical effects caused by the interaction of M/SC nanoparticles with the environment and charge transfer between nanoparticles in the matrix. [Pg.7]

Vapor deposition methods include physical vapor deposition (PVD) (Heremans et al., 2000) and chemical vapor deposition (CVD) (Cheng et al., 2000) or metallorganic chemical vapor deposition (MOCVD) (Berry et al., 1996). Vapor deposition and electrochemical deposition are capable of... [Pg.179]

Field emission cathodes described in this paper were produced by means of low temperature chemical vapor deposition method of carbon nanotubes from ethanol vapor. The substrate temperature during the deposition was 500 °C. This paper summarizes research results of prepared field emission cathodes. [Pg.265]

Our experiment has demonstrated the possibility of the carbon nanotubes synthesis by low temperature (substrate temperature was 500°C) vapor deposition method from the ethanol vapor. Field emission samples were produced with different catalyst distribution on the substrate surface. [Pg.268]

Guo, L. and Chen, G. (2007a), High-quality diamond film deposition on a titanium substrate using the hot-filament chemical vapor deposition method. Diam. Relat. Mater., 16(8) 10. [Pg.90]

Chemical vapor deposition method is used as an alternative to circumvent the limitations of the other synthetic methods. In chemical vapor deposition method, a substrate is prepared with a layer of metal catalyst particles, most commonly nickel, cobalt, iron, or a combination of these materials. The diameter of the grown nanotubes is related to the size of the metal particles. The substrate is heated to approximately 700°C. To initiate the growth of nanotubes, two gases are bled into the reactor a process gas (such as ammonia, nitrogen, hydrogen, etc.) and... [Pg.8]


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See also in sourсe #XX -- [ Pg.513 , Pg.520 ]

See also in sourсe #XX -- [ Pg.513 , Pg.520 ]

See also in sourсe #XX -- [ Pg.513 , Pg.520 ]




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