Coating methods chemical vapor deposition

Typical processing methods - chemical vapor deposition polymerization electrospinning spin coating ... 

DEC coating was first prepared by Aisenberg and Chabot using ion beam deposition in 1971 [2]. At present, PVD, such as ion beam deposition, sputtering deposition, cathodic vacuum arc deposition, pulsed laser deposition, and CVD, like plasma enhanced chemical vapor deposition are the most popular methods to be selected to fabricate DEC coatings. 

This is comparable to or slightly higher than the values reported for single crystal (11) and polycrystalline Ti02 (12), and much higher than those for the TiC>2 film electrode prepared by other methods such as chemical vapor deposition (13) and oxidation (14) and anodization (15) of Ti metal. The high efficiency of the dip-coated Ti(>2 film may be attributed to the porous nature of the film as described below. 

Carbon coated Si-based anode materials were successfully synthesized by chemical vapor deposition methods. Coated materials performed well during the coin cell testing. Future work on this section... 

In all vacuum coating methods layers are formed by deposition of material from the gas phase. The coating material may be formed by physical processes such as evaporation and sputtering, or by chemical reaction. Therefore, a distinction is made between physical and chemical vapor deposition ... 

Before we focus on chemical vapor deposition let us briefly mention other methods for thin film deposition. Films with thicknesses from 1 /zm to several 10 /zm play a fundamental role in everyday life, for example as paints and coatings. Processes during film formation are complex and a discussion would exceed the scope of this book. Introductions are Refs. [407,408],... 

Control of pore sizes of known catalysts like zeolites has been known for some time although the use of chemical vapor deposition (CVD) of organosilanes to control pore sizes has been the focus of recent research.7 Other catalysts like silica have been treated with methods like CVD and sol-gel in order to deposit thin films. Monolayer coatings of titanium oxide prepared by sol-gel methods have been recently used to coat silica and such films are active in alcohol dehydrogenation reactions.8... 

Ceramic and semiconductor thin films have been prepared by a number of methods including chemical vapor deposition (CVD), spray-coating, and sol-gel techniques. In the present work, the sol-gel method was chosen to prepare uniform, thin films of titanium oxides on palladium Titanium oxide was chosen because of its versatility as a support material and also because the sol-gel synthesis of titania films has been clearly described by Takahashi and co-workers (22). The procedure utilized herein follows the work of Takahashi, but is modified to take advantage of the hydrogen permeability of the palladium substrate. Our objective was to develop a reliable procedure for the fabrication of thin titania films on palladium, and then to evaluate the performance of the resulting metalloceramic membranes for hydrogen transport and ethylene hydrogenation for comparison to the pure palladium membrane results. 

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