Uniform Controlled

A microchannel reactor for CO preferential oxidation was developed. The reactor was consisted of microchannel patterned stainless steel plates which were coated by R11/AI2O3 catalyst. The reactor completely removed 1% CO contained in the Ha-rich reformed gas and controlled CO outlet concentration less than Ippm at 130 200°C and 50,000h. However, CH4 was produced from 180"C and CO selectivity was about 50%. For high performance of present PrOx reactor, reaction temperature should be carefully and uniformly controlled to reach high CO conversion and selectivity, and low CH4 production. It seems that the present microchaimel reactor is promising as a CO removal reactor for PEMFC systems. 

Wu, Y. P. and Holze, R., Anode materials for lithium ion batteries obtained by mild and uniformly controlled oxidation of natural graphite, J. Solid State Electrochem. (2003) 8 73-78. 

Calcium carbonate (70%) and sorbitol (30%) Formaxx CaC03 70 Merck KGaA, Darmstadt, Germany High compressibility, excellent taste masking, free flow, superior content uniformity, controlled particle size distribution... 

The glass bubbler [3] (Fig. 59) contains a small amount of cone. H2S04, through which the air or 0 is passed. By uniform control of the bubble rate, regular combustion of the material can be ensured. 

The Uniform Controlled Substance Act of 1970, drafted by the National Conference of Commissioners on Uniform State Laws, was designed to make state laws more compatible with the new federal law. Like the federal act, the Uniform Act recommended reducing penalties for marijuana possession... 

Where still used, cold drawing consists essentially of removing the yam from the package prepared in the melt spinning operation and feeding it forward at a uniformly controlled rate under low tension. It is passed around a godet or roller that determines the supply rate and prevents slippage for nylon 66, it then is wrapped several times around a stationary... 

Kneaders are effective mixers for making color concentrates because they are excellent for both dispersive and distributive mixing. The main attribute of a kneader is uniform control of heat and dwell since there is no localized high-shear zone to overmix or overheat sensitive polymer like polyvinyl chloride (PVC). 

Sputtered TiW and TiN are already in extensive use as barrier layers against Si diffusion in contacts. It is therefore fortunate that these layers show also good adhesion to CVD-W (i.e. no "new" adhesion material needs to be introduced). Sputtered TiN has some drawback in that, especially with the blanket H2/WF6 chemistry, substantial initiation times (of the order of 10 minutes) can be observed [Rana et al.8, Iwasaki et al.9]. This will be exhibited by apparent lower deposition rates and thickness or uniformity control problems. The reason for the nucleation problem atop TiN is not... 

Milojevic, K. Multi-color powder application with internal charging guns spray pattern and thickness uniformity control. In 21st International Conference on Automobile Body Einishing SURCAR, Cannes, June 26-27, 2003 165-174. 

Remove and replace Soil excavated, replaced with competent material or improved by drying or admixture and recompacted MISCELLANEOUS Inorganic soil <30 Uniform controlled when replaced may require large area dewatering... 

Ordered polymer films made from poly benzthiazole (PBZT) and poly benzoxazole (PBO) can be used as substrates for multilayer printed circuit boards and advanced interconnects to fill the current need for high speed, high density packaging. Foster-Miller, Inc. has made thin substrates (0.002 in.) using biaxially oriented liquid crystal polymer films processed from nematic solutions. PBZT films were processed and laminated to make a substrate with dielectric constant of 2.8 at 1 MHz, and a controllable CTE of 3 to 7 ppm/°C. The films were evaluated for use in multilayer boards (MLBs) which require thin interconnect substrates with uniform controllable coefficient of thermal expansion (CTE), excellent dielectric properties, low moisture absorption, high temperature capability, and simple reliable processing methods. We found that ordered polymer films surpass the limitations of fiber reinforced resins and meet the requirements of future chip-to-chip interconnection. 

The initial development of either volume-based or injection metering dose-control systems aimed at achieving a uniform controlled dose across a treatment area that was independent of machine variables, particularly forward speed. However, there is substantial evidence to show that the target requirements for many plant-protection products are not uniform across a field, and that there is the... 

To fabricate creation of membranes of uniform, controllable thickness, an n-type epitaxial layer on top of a p-substrait is usually used to achieve an ECES against the resulting pn junction. This approach, however, has several limitations (1) the fabricated membrane is always rectangular (2) its lateral dimensions and position can vary significantly due to wafer thickness and the surface and flat-orientation tolerances (3) the well known sharp transition from the 111 to the 100 crystal plane results in fragile clampings and suspensions and (4) all released structures exhibit the same thickness. 

High compressibility, excellent taste masking, free flow, superior content uniformity, controlled particle size distribution... 

The disks of a single-runner mill are 250 to 1400 mm (10 to 54 in.) in diameter, turning at 350 to 700 r/min. Disks in double-runner mills turn faster, at 1200 to 7000 r/min. The feed is precrushed to a maximum particle size of about 12 mm (I in.) and must enter at a uniform controlled rate. Attrition mills grind from I to 8 ton/h to products that will pass a 200-mesh screen. The energy required depends strongly on the nature of the feed and the degree of reduction accomplished and is much higher than in the mills and crushers described so far. Typical values are between 8 and 80 kWh (10 and 1(K) hp-h) per ton of product. 

The spacer double-patterning approach has some issues, the main one of which concerns placement accuracy of the features, which requires excellent dose and etch uniformity control. Equally problematic is the fact that the spacers may not stay in place at the proper location after the material to which they are attached (the HM pattern) is removed. Forming acceptable uniform spacer profiles that will yield uniform CDs is not a trivial exercise. In addition, the etch pattern transfer steps, often involving delicate removal of materials adjacent to the spacers, place unusually tight etch process tolerance on this technique, in order to have a successful outcome. 

Runners are the ehannels through which the polymer melt is fed into the mold cavities from the eyhnder nozzle. In a multicavity mold, it is necessary to fill all the mold cavities simultaneously and uniformly. Control of the size of the runners provides a means of controlling the flow resistance and balaneing the flow into the mold cavities. In most multicavity molds, the runners form part of the mold flame. Consequently, the ejected part is accompanied by the runner system, which must be removed and, in the ease of thermoplastics, reground for reuse. The use of the hot runner mold whereby the runner ehannels are heated to keep the polymer in the molten state, eliminates this need for plastic runner separation and avoids possible generation of scrap material. With proper machine operation, a hot rurmer mold requires a smaller amoimt of melt per shot than an equivalent cold runner mold, leading to redueed injeetion time and faster cycles. 

Ocusert provides uniform controlled release (20 or 40 pg/h for 7 days) of pilocarpine as an ocular hypotensive drug and has been commercialized in 1974. Ocusert consists of two outer layers of ethylene-vinyl acetate copolymer (EVA) and an inner layer of pilocarpine in alginate gel within di-(ethylhexyl) phthalate for a release enhancer, sandwiched between EVA layers. ... 

Fig. 3.26. Batch fu rnace for good uniformity control, with top backwall fired by adjustable thermal profile burners and bottoms of sidewalls fired by hlgh-velodty burners multiple T-sensors on both sides. Flow lines show the sweeps of gases of the ATP burners spinning short mode flames, medium length flames, and long mode flames. (See also figs. 2.21,6.1, and 6.23.)...

All variations of the previous paragraph are reasons for careful attention to (a) zoning for temperature uniformity control (this chapter) and (b) burner locations, burner flame types, and furnace flow patterns (chap. 7). (See fig. 6.8 showing soak temperature variations between three and five lengthwise zones at minimum firing rates (top set of curves) and at moderate firing rates ([bottom set of curves]). 

UNIFORMITY CONTROL IN FORGE FURNACES (for forging small steel pieces, see sec. 3.8.7)... 

Fig. 5-6. Forming with a billow snapback is recommended for parts requiring a uniform, controllable wall thickness.

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