Bottom Antireflection Coatings

Title Positive-Working Photoimageable Bottom Antireflective Coating... 

The absorption parameter, k, and the refractive index, n, were measured using variable angle spectrophotometric ellipsometry. The bottom antireflective coating of test solutions were spin coated onto primed silicon wafers and baked to get selected film thickness. The coated wafers were then measured using an ellipsometer to obtain and n values. 

The bottom antireflective coating solution test consisted of the step 1 product, poly(4-hydroxystyrene-9-anthracenyl-methacrylate) (1.5 g), 55/45 molar ratio, respectively, oxalic acid/triethylamine (0.075 g) 1 1, triphenylsulfonium triflate (0.06 g), and Vectomer 5015 (0.225 g) dissolved in ethyl lactate (98.5 g) and then filtered through... 

The resist formulation was spin-coated onto a silicone wafer on which a bottom antireflective coating had been previously applied and then soft-baked for 60 seconds at 90°C on a hot plate to obtain a film thickness of 1000 nm. The resist film was then exposed to i-line radiation of 365 nm through a narrowband interference filter using a high-pressure mercury lamp and a mask aligner. Experimental samples were then baked for 60 seconds at 90°C on a hot plate and developed. The dose to clear, E0, which is the dose just sufficient to completely remove the resist film after 60 seconds immersion development in 2.38% aqueous tetramethyl ammonium hydroxide, was then determined from the measured contrast curve. Testing results are provided in Table 1. 

Antireflection coatings can be applied at the resist-substrate interface, in which case they are called bottom antireflection coatings (BARCs), or they can be applied at the surface of the resist, in which case they are called top antireflection coatings. The effect of top antireflection coatings on the swing amplitude S of resist materials is fairly well described by Brunner s formula ... 

Design approaches to organic bottom antireflection coatings... 

Figure 9.11 Bottom antireflection coating-resist interactions on different substrates BARC, Si OyN, TiN. (After R. Dammel...

Lithographic modeling has found widespread applications in the development of new lithographic processes and equipment. Such applications include the optimization of dye loadings in resists, the simulation of substrate reflectivity, the applicability and optimization of top and bottom antireflection coatings, and the simulation of the effect of bandwidth on swing curve amplitude. " ... 

Major Applications Bottom antireflective coatings, semiconductor devices, inks, hair dyes, cosmetics,treatment of chronic inflammatory diseases, depression ... 

Major Applications Nanoparticles,n liquid crystal displays,chemical mechanical polishing, bottom antireflective coatings, electrochromic materials,i5 inks,i6 rubber,hair dyes, cosmetics,treatment of virus skin infection o... 

Another methodology to obtain antireflective coatings is the superposition of films with different refraction index according to the so called bottom antireflective coating technique. In these cases, the coating design is made in such a way that the refraction index gradually decreases from the layer closest to the substrate towards the outer layer. 

For organic chemicals such as bottom antireflective coating and photoresist, matrix elimination using open-focused microwave digestion has been applied successfully."" Recoveries for 13 elements were in the 80-120% range, except for Ca, for which the results were affected by the CO2+ interference. 

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