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Silica thermal

Many commercial split flow capillary LC systems incorporate a nano flow sensor mounted online to the capillary channel. The split flow system can be easily modified from a conventional system and performs satisfactorily for capillary LC applications. However, the split flow system may require thermal control and the LC solvent requires continuous degassing. In addition, the system may not work reliably at a high flow split ratios and at pressures above 6000 psi due to technical limitations of the fused silica thermal conductivity flow sensor. The split flow system based on conventional check valve design may not be compatible with splitless nano LC applications. The conventional ball-and-seat check valve is not capable of delivering nano flow rates and is not reliable for 7/24 operation at low flow. [Pg.374]

The authors evidenced, using a methoxylated silica as a substrate, that at these temperatures no reaction occurs of the halogenosilanes with the siloxane bridges of the silica. No pretreatment temperature was mentioned, however. Therefore we cannot exclude a small reaction of the bromo- or iodosilanes with the siloxane bridges of the silica, thermally pretreated at high temperatures. [Pg.288]

Names fumed silica, pyrogenic silica, thermal silica... [Pg.132]

Water/wastewater Purge at ambient temperature, trap in Tenax/silica, thermally desorb. GC-MS(EPA Method 624) 5.0pg/L 101-104% EPA 1982a... [Pg.77]

NON-REACnVE SILICA - Is a polymeric form of silica thermally unstable which reverts to normal silica when heated. Difficult to detect, but may be present when boiler feedwater shows none, but boiler water reads silica. [Pg.107]

FIGURE 32.12 Change in the peak position of the unassociated silanol band for Davisil and Zorbax silicas thermally treated at 200-400°C. [Pg.392]

FIGURE 32.13 Second order kinetic plot for the desorption of pyridine from Davisil silica thermally pretreated at different temperatures. [Pg.392]

Holm, J.L., Kleppa, O.J., and Westrum, E.F. (1967) Thermodynamics of polymorphic transformations in silica Thermal properties from 5-1070 K and pressure-temperature stability fields for coesite and stishovite, Geomchim. Cosmochim. Acta, 31, 2289-2307. [Pg.37]

Silica Thermal release of highly volatile Stabilization, retention, and release of... [Pg.715]

Hazardous Decomp. Prods. Combustion may produce fomtaldehyde, CO2, cryst. silica thermal decomp, prods. dlmethylcydoslloxanes, methylphen cydosllox-anes... [Pg.995]

Silicon is prepared commercially by heating silica and carbon in an electric furnace, using carbon electrodes. Several other methods can be used for preparing the element. Amorphous silicon can be prepared as a brown powder, which can be easily melted or vaporized. The Gzochralski process is commonly used to produce single crystals of silicon used for solid-state or semiconductor devices. Hyperpure silicon can be prepared by the thermal decomposition of ultra-pure trichlorosilane in a hydrogen atmosphere, and by a vacuum float zone process. [Pg.33]

The evidence obtained in compaction experiments is of particular interest in the present context. Figure 3.22 shows the results obtained by Avery and Ramsay for the isotherms of nitrogen on compacts of silica powder. The hysteresis loop moved progressively to the left as the compacting pressure increased, but the lower closure point did not fall below a relative pressure of 0-40. Similar results were obtained in the compaction of zirconia powder both by Avery and Ramsay (cf. Fig. 4.5), and by Gregg and Langford, where the lower closure point moved down to 0-42-0-45p° but not below. With a mesoporous magnesia (prepared by thermal decomposition of the hydrated carbonate) the position of the closure point... [Pg.154]

Caffeine is extracted from beverages by a solid-phase microextraction using an uncoated fused silica fiber. The fiber is suspended in the sample for 5 min and the sample stirred to assist the mass transfer of analyte to the fiber. Immediately after removing the fiber from the sample it is transferred to the gas chromatograph s injection port where the analyte is thermally desorbed. Quantitation is accomplished by using a C3 caffeine solution as an internal standard. [Pg.226]

Some silica-containing additives such as glass and titanium dioxide lower the thermal stabkity of PVDE and should be used with caution. Processors should consult the resin producer about safe processing practice. [Pg.388]

Thermal Conductivity. Thermal conductivity data for transparent vitreous silica are listed below (150) ... [Pg.506]

The method for preparing (-)-menthol (73) from (+)-citroneUal (68), which can be fractionally distilled from citroneUa oU, is cyclization by the ene-reaction. The reaction can be done thermally or using alumina and silica catalysts (145—147). [Pg.422]

Methane, chlorine, and recycled chloromethanes are fed to a tubular reactor at a reactor temperature of 490—530°C to yield all four chlorinated methane derivatives (14). Similarly, chlorination of ethane produces ethyl chloride and higher chlorinated ethanes. The process is employed commercially to produce l,l,l-trichloroethane. l,l,l-Trichloroethane is also produced via chlorination of 1,1-dichloroethane with l,l,2-trichloroethane as a coproduct (15). Hexachlorocyclopentadiene is formed by a complex series of chlorination, cyclization, and dechlorination reactions. First, substitutive chlorination of pentanes is carried out by either photochemical or thermal methods to give a product with 6—7 atoms of chlorine per mole of pentane. The polychloropentane product mixed with excess chlorine is then passed through a porous bed of Fuller s earth or silica at 350—500°C to give hexachlorocyclopentadiene. Cyclopentadiene is another possible feedstock for the production of hexachlorocyclopentadiene. [Pg.508]

Because of the possibility of focusing laser beams, tlrin films can be produced at precisely defined locations. Using a microscope train of lenses to focus a laser beam makes possible tire production of microregions suitable for application in computer chip production. The photolytic process produces islands of product nuclei, which act as preferential nucleation sites for further deposition, and tlrus to some unevenness in tire product film. This is because the subsuate is relatively cool, and therefore tire surface mobility of the deposited atoms is low. In pyrolytic decomposition, the region over which deposition occurs depends on the drermal conductivity of the substrate, being wider the lower the thermal conductivity. For example, the surface area of a deposit of silicon on silicon is nanower dran the deposition of silicon on silica, or on a surface-oxidized silicon sample, using the same beam geomeU y. [Pg.83]

The viscosity of liquid silicates such as drose containing barium oxide and silica show a rapid fall between pure silica and 20 mole per cent of metal oxide of nearly an order of magnitude at 2000 K, followed by a slower decrease as more metal oxide is added. The viscosity then decreases by a factor of two between 20 and 40 mole per cent. The activation energy for viscous flow decreases from 560 kJ in pure silica to 160-180kJmol as the network is broken up by metal oxide addition. The introduction of CaFa into a silicate melt reduces the viscosity markedly, typically by about a factor of drree. There is a rapid increase in the thermal expansivity coefficient as the network is dispersed, from practically zero in solid silica to around 40 cm moP in a typical soda-lime glass. [Pg.309]

Methods for removing water from solids depends on the thermal stability of the solids or the time available. The safest way is to dry in a vacuum desiccator over concentrated sulfuric acid, phosphorus pentoxide, silica gel, calcium chloride, or some other desiccant. Where substances are stable in air and melt above 100°, drying in an air oven may be adequate. In other cases, use of an Abderhalden pistol may be satisfactory. [Pg.26]


See other pages where Silica thermal is mentioned: [Pg.651]    [Pg.42]    [Pg.625]    [Pg.651]    [Pg.801]    [Pg.651]    [Pg.42]    [Pg.625]    [Pg.651]    [Pg.801]    [Pg.34]    [Pg.284]    [Pg.200]    [Pg.7]    [Pg.7]    [Pg.224]    [Pg.288]    [Pg.314]    [Pg.25]    [Pg.476]    [Pg.480]    [Pg.525]    [Pg.535]    [Pg.344]    [Pg.978]    [Pg.1547]    [Pg.248]    [Pg.440]    [Pg.313]    [Pg.314]    [Pg.339]    [Pg.172]    [Pg.837]    [Pg.410]   
See also in sourсe #XX -- [ Pg.15 , Pg.64 ]




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